Patents by Inventor Dongchi YU

Dongchi YU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • VACUUM CHAMBER SYSTEM INCLUDING TEMPERATURE CONDITIONING PLATE
    Publication number: 20250191875
    Abstract: A vacuum chamber system comprises a supporting structure configured to support an object to be thermally stabilized, a plate, having a first surface facing the object, positioned such that the first surface is located within a predetermined distance from the object when the object is placed on the supporting structure, the plate being thermally coupled to a heat conduction source, and a chamber enclosing the supporting structure and the plate.
    Type: Application
    Filed: February 10, 2023
    Publication date: June 12, 2025
    Applicant: ASML Netherlands B.V.
    Inventors: Dongchi YU, Jun-li LIN, Shao-Wei FU, Yi-Chen LIN, Hongbo FAN
  • SYSTEMS AND STRUCTURES FOR VENTING AND FLOW CONDITIONING OPERATIONS IN INSPECTION SYSTEMS
    Publication number: 20250012855
    Abstract: Systems and structures for venting and flow conditioning operations in charged particle beam systems. In some embodiments, a system may include a chamber configured to provide a vacuum environment; a vent valve; and a mass flow controller coupled to the chamber on a first side of the mass flow controller and to the vent valve on a second side of the mass flow controller.
    Type: Application
    Filed: October 28, 2022
    Publication date: January 9, 2025
    Applicant: ASML Netherlands B.V.
    Inventors: Dongchi YU, Erheng WANG, Jun-li LIN, Shao-Wei FU, Yi-Chen LIN
  • CHARGED-PARTICLE INSPECTION APPARATUS
    Publication number: 20240014053
    Abstract: A load-lock system may include a chamber enclosing a supporting structure configured to support a wafer; a gas vent arranged at a ceiling of the chamber and configured to vent gas into the chamber with a flow rate of at least twenty normal liters per minute; and a plate fixed to the ceiling between the gas vent and the wafer.
    Type: Application
    Filed: August 16, 2021
    Publication date: January 11, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Dongchi YU, Erheng WANG