Abstract: The present invention provides a method for in-situ remediation of contaminated soil through multi-technology coupling. The remediation method comprises the following steps: preheating the soil at a contaminated site by using in-situ thermal conductive heating (TCH) technology, and then performing multi-phase extraction; and performing a cycle of injecting hot steam, multi-phase extraction, and injecting an oxidizing agent into the soil at the contaminated site. A system for in-situ remediation of an organically contaminated soil based on the aforementioned method for in-situ remediation of the organically contaminated soil includes a heating well, an injection well, and an extraction well. The heating well is connected to an in-situ thermal conductive heating system, and used for preheating of the soil at the contaminated site. The injection well is connected to an in-situ injection system, and used for injecting the hot steam and the oxidizing agent.

Abstract: A method for a voice interaction is provided according to embodiments of the disclosure, the method belonging to the field of smart devices. The method may include: receiving an external input; checking a current time in response to the external input; calling a voice program; and raising a question according to the current time and the called voice program, and playing the called voice program. The method and apparatus for a voice interaction may perform more immersive interaction with a user, thereby improving the user experience.

Abstract: A method for a voice interaction is provided according to embodiments of the disclosure, the method belonging to the field of smart devices. The method may include: receiving an external input; checking a current time in response to the external input; calling a voice program; and raising a question according to the current time and the called voice program, and playing the called voice program. The method and apparatus for a voice interaction may perform more immersive interaction with a user, thereby improving the user experience.

Abstract: The present invention relates to methods of electron beam lithography using ice resist to fabricate nanostructures on a substrate and, more particularly, to a method of fabricating desired three-dimensional nanostructures on a substrate. The method involves two main strategies: grayscale ice lithography and stacking layered structures. Moreover, these two strategies can be combined in one fabrication process to produce more complex 3D nanostructures.

Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.

Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.