Abstract: The present disclosure generally relates to ensuring a plasma plume or cloud that forms during a laser cutting process does not lead to undesired re-deposition of material onto the substrate. At least one electrode is biased to draw the electrons of the plasma plume or cloud towards the electrode and away from the substrate. A vacuum port and/or a blower may be strategically located to ensure proper gas flow away from the substrate and hence, directing of the electrons away from the substrate. In so doing, material re-deposition is less likely to occur.

Abstract: A semiconductor wafer includes semiconductor dies and laser grooves formed in the scribe lines along the long edges of the semiconductor dies. A laser groove extends between the long edges of two adjacent semiconductor dies to encompass the corners of the two adjacent semiconductor dies. This prevents die cracking, for example during backgrind of the wafer. Moreover, the absence of laser grooves along the short edges of the semiconductor dies prevents die cracking, for example along short edges of dies overhanging empty space that are stressed during portions of the packaging process.