Abstract: The present invention relates to a graphene oxide material, a halogenated graphene material, preparation methods therefor, and an electrolysis system. A method for producing a graphene oxide material in an electrolysis system comprises the following steps: applying a voltage between a working electrode and a counter electrode, and exfoliating graphite and/or amorphous carbon under the action of electrolysis so as to generate the graphene oxide material, wherein before applying the voltage and/or in the process of applying the voltage, light irradiation is performed on the electrolysis system.

Abstract: The present invention relates to a graphene oxide material, a halogenated graphene material, preparation methods therefor, and an electrolysis system. A method for producing a graphene oxide material in an electrolysis system comprises the following steps: applying a voltage between a working electrode and a counter electrode, and exfoliating graphite and/or amorphous carbon under the action of electrolysis so as to generate the graphene oxide material, wherein before applying the voltage and/or in the process of applying the voltage, light irradiation is performed on the electrolysis system.

Abstract: The present invention provides a nano-presion photo/electrochemical planarization and polishing method and an apparatus therefor. The method comprises through electrochemical, photochemical or photoelectrochemical means, an etchant being generated on a surface of a tool electrode which has a nanometer-sized planeness; the generated etchant reacting with a scavenger contained in an working electrolyte solution, or decaying itself in the working electrolyte solution, such that a confined etchant liquid layer is generated on the tool electrode surface and having a confined thickness of nanoscale; and by a chemical reaction between the etchant contained in the confined etchant liquid layer and a surface of a workpiece, the surface of the workpiece being polished or planarized to a nanometer scaled profile precision and surface roughness, thereby, realizing the planarization and polishing in nano-precision for the workpiece.