Patents by Inventor Dong-seok Baek

Dong-seok Baek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240129725
    Abstract: A service identifying and processing method using a wireless terminal message according to an exemplary embodiment of the present invention includes (a) receiving a wireless terminal message by a first entity which is a mobile device; and (b) expressing, by a first agent which is an information processing application program installed on the first entity, entity information of second entity based on the wireless terminal message and service confirmation information related to service provided by the second entity, through an application screen by the first agent.
    Type: Application
    Filed: December 23, 2021
    Publication date: April 18, 2024
    Applicant: ESTORM CO., LTD.
    Inventors: Jong Hyun WOO, Tae Il LEE, Il Jin JUNG, Hee Jun SHIN, Hyung Seok JANG, Min Jae SON, Sang Heon BAEK, Seo Bin PARK, Hyo Sang KWON, Mi Ju KIM, Jung Hoon SONG, Rakhmanov DILSHOD, Dong Hee KIM, Jeon Gjin KIM
  • Publication number: 20180366358
    Abstract: An apparatus for determining alignment of semiconductor processing equipment includes a sensing unit comprising a light emitting unit configured to irradiate a reflection substrate positioned opposite the apparatus and a light accepting unit configured to receive reflected light from the reflection substrate, a control unit configured to determine a gap between the sensing unit and the reflection substrate based on the received reflected light, and a wireless communication unit configured to transmit data regarding the determined gap to an electronic device. Methods of aligning semiconductor processing equipment and methods of fabricating semiconductor devices are also disclosed.
    Type: Application
    Filed: October 20, 2017
    Publication date: December 20, 2018
    Inventors: Jin Shin, Seung Jae Lee, Sang Geun Park, Dong Seok Baek
  • Patent number: 9329504
    Abstract: An origin of a reference coordinate system is assigned to one of a plurality of center points, and center point coordinates according to the reference coordinate system are assigned to remaining center points, so that reference marks successively correspond to center points of a plurality of microscopes fixed to a base. Beam position detection marks disposed between the reference marks with exposure points of exposure heads fixed to the base are crossed to assign beam coordinates according to the reference coordinate system to the exposure points. Thus, alignment may be easily and accurately performed, and is effective for increasingly larger apparatuses.
    Type: Grant
    Filed: November 19, 2012
    Date of Patent: May 3, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-Hyun Park, Sang-Don Jang, Dong-Seok Baek, Ki-Hyun Kim, Sang-Min Lee, Dong-Min Kim
  • Patent number: 8994922
    Abstract: Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel, a rotation guide on a first end of the guide frame, the rotation guide being ring shaped and configured attach the lens barrel to the guide frame, and a ring-shaped tilting frame configured to support a second end of the guide frame and tilt the guide frame, wherein the guide frame, the rotation guide, and the tilting frame are configured to allow the lens barrel to pass therethrough.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: March 31, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang Hyun Park, Sang Joon Hong, Sang Don Jang, Oui Serg Kim, Dong Seok Baek
  • Patent number: 8804098
    Abstract: Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical unit, and a control method thereof. The maskless exposure apparatus includes the measurement optical unit including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical unit.
    Type: Grant
    Filed: December 17, 2010
    Date of Patent: August 12, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong Seok Baek, Sang Don Jang, Ho Seok Choi, Hi Kuk Lee, Oui Serg Kim
  • Patent number: 8427712
    Abstract: A method to compress exposure data may include converting image data into a plurality of exposure data, generating new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and compressing the new exposure data. An exposure apparatus may include a conversion unit that converts image data into a plurality of exposure data, a control unit that generates new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and a compression unit that compresses the new exposure data.
    Type: Grant
    Filed: October 29, 2009
    Date of Patent: April 23, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ho Seok Choi, Sang Don Jang, Dong Seok Baek, Sang Geun Park, Myung Ho Kim, Duke Kimm, Jung Hyeon Kim, Sang-il Hong
  • Patent number: 8327534
    Abstract: Disclosed herein is a method for fabricating a printed circuit board assembly by adhering an element to a printed circuit board without using any solder. The printed circuit board may be fabricated by sequentially applying a conductor-containing first ink and an insulator-containing second ink onto a base substrate by ink-jet printing to form a printed circuit board, mounting an element on the printed circuit board such that an electrode of the element contacts a conductive layer and curing the conductive layer at a high temperature.
    Type: Grant
    Filed: December 17, 2010
    Date of Patent: December 11, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Min Young Park, Young Jun Moon, Hyun Joo Han, Gyun Heo, Kyung Woon Jang, Sang il Hong, Dong Seok Baek
  • Patent number: 8314920
    Abstract: An origin of a reference coordinate system is assigned to one of a plurality of center points, and center point coordinates according to the reference coordinate system are assigned to remaining center points, so that reference marks successively correspond to center points of a plurality of microscopes fixed to a base. Beam position detection marks disposed between the reference marks with exposure points of exposure heads fixed to the base are crossed to assign beam coordinates according to the reference coordinate system to the exposure points. Thus, alignment may be easily and accurately performed, and is effective for increasingly larger apparatuses.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: November 20, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-Hyun Park, Sang-Don Jang, Dong-Seok Baek, Ki-Hyun Kim, Sang-Min Lee, Dong-Min Kim
  • Publication number: 20110181856
    Abstract: Example embodiments are directed to an auto-focusing device for use in a maskless exposure apparatus that performs a beam focus calibration and an auto-focusing method using the same. The auto-focusing device includes a projection optical unit, a focus calibration unit, and a controller. The projection optical unit includes a distance measurement sensor and a focus controller that generate a beam of light. The focus calibration unit includes a substrate having a reference mark on which the beam generated from the projection optical unit is illuminated, a measuring optical unit configured to obtain image information of the beam illuminated on the reference mark, and a stage configured to support the substrate and the measuring optical unit. The controller is configured to control the focus controller so that a beam of the beam generated from the measuring optical unit is located on the surface of an exposed member.
    Type: Application
    Filed: January 26, 2011
    Publication date: July 28, 2011
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sang Min Lee, Sang Don Jang, Sang Hyun Park, Dong Seok Baek
  • Publication number: 20110154661
    Abstract: Disclosed herein is a method for fabricating a printed circuit board assembly by adhering an element to a printed circuit board without using any solder. The printed circuit board may be fabricated by sequentially applying a conductor-containing first ink and an insulator-containing second ink onto a base substrate by ink-jet printing to form a printed circuit board, mounting an element on the printed circuit board such that an electrode of the element contacts a conductive layer and curing the conductive layer at a high temperature.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 30, 2011
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Min Young Park, Young Jun Moon, Hyun Joo Han, Gyun Heo, Kyung Woon Jang, Sang il Hong, Dong Seok Baek
  • Publication number: 20110157569
    Abstract: Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical system, and a control method thereof. The maskless exposure apparatus includes the measurement optical system including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical system.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 30, 2011
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Dong Seok Baek, Sang Don Jang, Ho Seok Choi, Hi Kuk Lee, Oui Serg Kim
  • Publication number: 20110149297
    Abstract: Example embodiments are directed to a mask-less exposure apparatus configured to expose a pattern on a substrate using a light modulation device and a multi-head alignment method thereof. According to example embodiments, a beam measurement device measures positions and focuses of at least three beams from among a plurality of beams emitted from multiple heads, the measurement enabling alignment of a position and an angle of a lens barrel deviated from a reference position according to an error in position and focus of the measured at least three beams.
    Type: Application
    Filed: December 15, 2010
    Publication date: June 23, 2011
    Inventors: Sang Hyun Park, Hi Kuk Lee, Sang Don Jang, Oui Serg Kim, Dong Seok Baek
  • Publication number: 20110149301
    Abstract: A beam position measuring apparatus and method using a beam expansion device may expand areas of beams irradiated onto a beam detection sensor. The beam expansion device is configured to expand areas of the beams onto the beam detection sensor is installed between a beam generator and the beam detection sensor. Central positions of the irradiated beams are detected using intensities of beams irradiated onto respective pixels of the beam detection sensor.
    Type: Application
    Filed: December 15, 2010
    Publication date: June 23, 2011
    Inventors: Oui Serg Kim, Vladimir Protopopov, Dong Seok Baek
  • Publication number: 20110090478
    Abstract: Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel, a rotation guide on a first end of the guide frame, the rotation guide being ring shaped and configured attach the lens barrel to the guide frame, and a ring-shaped tilting frame configured to support a second end of the guide frame and tilt the guide frame, wherein the guide frame, the rotation guide, and the tilting frame are configured to allow the lens barrel to pass therethrough.
    Type: Application
    Filed: October 15, 2010
    Publication date: April 21, 2011
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sang Hyun Park, Sang Joon Hong, Sang Don Jang, Oui Serg Kim, Dong Seok Baek
  • Publication number: 20100110214
    Abstract: A method to compress exposure data may include converting image data into a plurality of exposure data, generating new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and compressing the new exposure data. An exposure apparatus may include a conversion unit that converts image data into a plurality of exposure data, a control unit that generates new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and a compression unit that compresses the new exposure data.
    Type: Application
    Filed: October 29, 2009
    Publication date: May 6, 2010
    Inventors: Ho Seok Choi, Sang Don Jang, Dong Seok Baek, Sang Geun Park, Myung Ho Kim, Duke Kimm, Jung Hyeon Kim, Sang-il Hong
  • Publication number: 20100097591
    Abstract: An exposure apparatus may include: a stage configured to move a substrate; an optical unit configured to generate and project a plurality of laser beams; and a control unit configured to measure straightness of the stage by controlling the projection of the laser beams to an exposed surface of the substrate while moving the stage. A method to measure straightness of a stage in an exposure apparatus may include: placing a substrate on the stage; moving the stage and substrate; generating a plurality of laser beams; projecting the laser beams to the substrate on the stage; and measuring the straightness of the stage by projecting the laser beams to an exposed surface of the substrate.
    Type: Application
    Filed: October 14, 2009
    Publication date: April 22, 2010
    Inventors: Eul Tae Kim, Sang Don Jang, Hi Kuk Lee, Sang Hyun Park, Dong Seok Baek
  • Publication number: 20090268179
    Abstract: An origin of a reference coordinate system is assigned to one of a plurality of center points, and center point coordinates according to the reference coordinate system are assigned to remaining center points, so that reference marks successively correspond to center points of a plurality of microscopes fixed to a base. Beam position detection marks disposed between the reference marks with exposure points of exposure heads fixed to the base are crossed to assign beam coordinates according to the reference coordinate system to the exposure points. Thus, alignment may be easily and accurately performed, and is effective for increasingly larger apparatuses.
    Type: Application
    Filed: March 11, 2009
    Publication date: October 29, 2009
    Inventors: Sang-Hyun Park, Sang-Don Jang, Dong-Seok Baek, Ki-Hyun Kim, Sang-Min Lee, Dong-Min Kim
  • Patent number: 7446555
    Abstract: An apparatus to inspect a TFT substrate including a gate line, a data line crossed with the gate line and insulated from the gate line, a TFT disposed at an intersection of the gate line and the data line, and a pixel electrode connected to the TFT includes a vacuum chamber, a stage disposed in the vacuum chamber and on which the TFT substrate is settled, an electron beam generator disposed over the stage, a gate driving part to apply a gate-on voltage to the gate line to turn on the TFT, a signal detector connected to the data line and to sense an electric signal from the pixel electrode, and a controller to control the gate driving part and the electron beam generator so that a electron beam is irradiated to the pixel electrode while the TFT is turned on.
    Type: Grant
    Filed: July 3, 2006
    Date of Patent: November 4, 2008
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Chang-hoon Choi, Hee-soo Pyun, Hwa-sub Shim, Ho-seok Choi, Dong-seok Baek
  • Publication number: 20080149830
    Abstract: A sample inspection apparatus to inspect a sample using a scanning electron microscope irradiates the sample with electron beams. The sample inspection apparatus includes a charge collecting unit that collects charges generated from a surface of the sample due to irradiation thereof by the electron beams. The cost required for sample inspection is reduced, and an image having high quality is provided by the sample inspection apparatus.
    Type: Application
    Filed: October 26, 2007
    Publication date: June 26, 2008
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Dong Seok BAEK, Chang Hoon CHOI, Jeong Woo HYUN, Hee Soo PYUN, Sung Wook KANG
  • Publication number: 20070153262
    Abstract: An inspecting apparatus and method of inspecting which provides an enhanced clearness. The inspecting apparatus includes a stage to support an article to be inspected, an optical microscope provided with an object lens to approach and withdraw from the stage to inspect the article, and a viewport lens interposed between the article and the object lens to have a predetermined radius of curvature.
    Type: Application
    Filed: December 13, 2006
    Publication date: July 5, 2007
    Inventors: Dong-seok BAEK, Je-wan Suh, Hee-soo Pyun, Byeong-hwan Jeon, Yong-ho Choi