Patents by Inventor Dong Su KO

Dong Su KO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11969011
    Abstract: A cigarette includes a tobacco rod, a front end plug positioned at a front end of the tobacco rod, a filter rod positioned at a rear end of the tobacco rod, and a wrapper surrounding the tobacco rod, the front end plug, and the filter rod and including at least one perforation formed in an area of the wrapper to allow air to flow to the inside of the wrapper.
    Type: Grant
    Filed: November 13, 2019
    Date of Patent: April 30, 2024
    Assignee: KT&G CORPORATION
    Inventors: Jung Seop Hwang, Dong Kyun Ko, Jae Sung Noh, Bong Su Cheong, Sang Won Choi
  • Patent number: 11944118
    Abstract: Provided is an aerosol-generating article including a wrapper which is discolored as the aerosol-generating material is heated, the aerosol-generating article including: a tobacco rod; a front-end plug arranged on a side of the tobacco rod; a filter rod arranged on the other side of the tobacco rod; and the wrapper surrounding the tobacco rod, the front-end plug, and the filter rod, wherein the wrapper includes a thermochromic material which is heated and discolored by an aerosol-generating device when the aerosol-generating article is inserted into the aerosol-generating device.
    Type: Grant
    Filed: November 13, 2019
    Date of Patent: April 2, 2024
    Assignee: KT&G CORPORATION
    Inventors: Bong Su Cheong, Dong Kyun Ko, Jae Sung Noh, Sang Won Choi, Jung Seop Hwang
  • Patent number: 11912102
    Abstract: An air conditioner for a vehicle including an air-conditioning case divided into a plurality of air passageways by a separation wall. A heating heat exchanger is disposed inside the air-conditioning case and exchanges heat with air to heat the interior of the vehicle. A perforated member is disposed at a downstream side of the heating heat exchanger and has a plurality of perforated holes through which the air passing the heating heat exchanger passes, and a partition wall is disposed between the heating heat exchanger and the perforated member to divide the air passageway of the air-conditioning case into a plurality of air passageways, wherein the partition wall is formed integrally with the perforated member.
    Type: Grant
    Filed: October 8, 2019
    Date of Patent: February 27, 2024
    Assignee: HANON SYSTEMS
    Inventors: Dong Won Lee, Jong Su Kim, Jae Woo Ko, Young Keun Kim, Chang Soo Bae, Jong Min Lee, Gyu Ik Han
  • Publication number: 20230352548
    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.
    Type: Application
    Filed: July 7, 2023
    Publication date: November 2, 2023
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eunae CHO, Dongjin LEE, Ji Eun LEE, Kyoung-Ho JUNG, Dong Su KO, Yongsu KIM, Jiho YOO, Sung HEO, Hyun PARK, Satoru YAMADA, Moonyoung JEONG, Sungjin KIM, Gyeongsu PARK, Han Jin LIM
  • Patent number: 11735637
    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.
    Type: Grant
    Filed: August 12, 2021
    Date of Patent: August 22, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eunae Cho, Dongjin Lee, Ji Eun Lee, Kyoung-Ho Jung, Dong Su Ko, Yongsu Kim, Jiho Yoo, Sung Heo, Hyun Park, Satoru Yamada, Moonyoung Jeong, Sungjin Kim, Gyeongsu Park, Han Jin Lim
  • Publication number: 20210376099
    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.
    Type: Application
    Filed: August 12, 2021
    Publication date: December 2, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Eunae Cho, Dongjin Lee, Ji Eun Lee, Kyoung-Ho Jung, Dong Su Ko, Yongsu Kim, Jiho Yoo, Sung Heo, Hyun Park, Satoru Yamada, Moonyoung Jeong, Sungjin Kim, Gyeongsu Park, Han Jin Lim
  • Patent number: 11127828
    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.
    Type: Grant
    Filed: June 5, 2019
    Date of Patent: September 21, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eunae Cho, Dongjin Lee, Ji Eun Lee, Kyoung-Ho Jung, Dong Su Ko, Yongsu Kim, Jiho Yoo, Sung Heo, Hyun Park, Satoru Yamada, Moonyoung Jeong, Sungjin Kim, Gyeongsu Park, Han Jin Lim
  • Patent number: 10930923
    Abstract: A topological quantum framework includes a plurality of one-dimensional nanostructures disposed in different directions and connected to each other, wherein a one-dimensional nanostructure of the plurality of one-dimensional nanostructures includes a first composition including a metal capable of incorporating and deincorporating lithium, and wherein the topological quantum framework is porous.
    Type: Grant
    Filed: January 3, 2018
    Date of Patent: February 23, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ken Ogata, Dong-Su Ko, Seongho Jeon, Koichi Takei, Sungsoo Han, Junho Lee
  • Patent number: 10709542
    Abstract: A stent with an improved anti-slip function. The stent includes: a cylindrical stent including a plurality of openings formed by weaving wires, and a plurality of peaks, the cylindrical stent being subjected to heat treatment, wherein the cylindrical stent has a PTFE-first artificial blood vessel layer being in entire contact with an inner surface thereof, and a plurality of PTFE-second artificial blood vessel layers being in partial contact with an outer surface thereof, and the first and second artificial blood vessel layers are heat-fused together to encompass the cylindrical stent, thereby forming a plurality of first sections having a plurality of openings obstructed and a plurality of seconds sections having the plurality of openings remaining unobstructed, wherein the first sections are inserted into a lesion while pressing against the lesion, thereby being caught in the lesion, and the second sections are caught in the lesion meshed with the openings.
    Type: Grant
    Filed: July 6, 2016
    Date of Patent: July 14, 2020
    Assignees: TAEWOONG MEDICAL CO., LTD.
    Inventors: Kyong Min Shin, Sung Wook Park, Dong Su Ko
  • Publication number: 20200030079
    Abstract: A stent with an improved anti-slip function. The stent includes: a cylindrical stent including a plurality of openings formed by weaving wires, and a plurality of peaks, the cylindrical stent being subjected to heat treatment, wherein the cylindrical stent has a PTFE-first artificial blood vessel layer being in entire contact with an inner surface thereof, and a plurality of PTFE-second artificial blood vessel layers being in partial contact with an outer surface thereof, and the first and second artificial blood vessel layers are heat-fused together to encompass the cylindrical stent, thereby forming a plurality of first sections having a plurality of openings obstructed and a plurality of seconds sections having the plurality of openings remaining unobstructed, wherein the first sections are inserted into a lesion while pressing against the lesion, thereby being caught in the lesion, and the second sections are caught in the lesion meshed with the openings.
    Type: Application
    Filed: July 6, 2016
    Publication date: January 30, 2020
    Inventors: Kyong Min SHIN, Sung Wook PARK, Dong Su KO
  • Publication number: 20190312119
    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.
    Type: Application
    Filed: June 5, 2019
    Publication date: October 10, 2019
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eunae CHO, Dongjin Lee, Ji Eun Lee, Kyoung-Ho Jung, Dong Su Ko, Yongsu Kim, Jiho Yoo, Sung Heo, Hyun Park, Satoru Yamada, Moonyoung Jeong, Sungjin Kim, Gyeongsu Park, Han Jin Lim
  • Patent number: 10325992
    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: June 18, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eunae Cho, Dongjin Lee, Ji Eun Lee, Kyoung-Ho Jung, Dong Su Ko, Yongsu Kim, Jiho Yoo, Sung Heo, Hyun Park, Satoru Yamada, Moonyoung Jeong, Sungjin Kim, Gyeongsu Park, Han Jin Lim
  • Publication number: 20190044130
    Abstract: A topological quantum framework includes a plurality of one-dimensional nanostructures disposed in different directions and connected to each other, wherein a one-dimensional nanostructure of the plurality of one-dimensional nanostructures includes a first composition including a metal capable of incorporating and deincorporating lithium, and wherein the topological quantum framework is porous.
    Type: Application
    Filed: January 3, 2018
    Publication date: February 7, 2019
    Inventors: Ken Ogata, Dong-su Ko, Seongho Jeon, Koichi Takei, Sungsoo Han, Junho Lee
  • Patent number: 10088931
    Abstract: An electrical conductor includes a substrate; and a conductive layer disposed on the substrate and including a plurality of silver nanowires, wherein the silver nanowires exhibit a main peak assigned to a (111) crystal plane in an X-ray diffraction spectrum thereof, and a 2? full width at half maximum (FWHM) of the main peak after Gaussian fitting is less than about 0.40 degrees.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: October 2, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Mi Jeong Kim, Chan Kwak, Junghwa Kim, Dong Su Ko, Kwanghee Kim, Jiye Kim
  • Patent number: 10002927
    Abstract: A transparent electrode includes a substrate; a first layer disposed on the substrate, the first layer including a graphene mesh structure, the graphene mesh structure including graphene and a plurality of holes; and a second layer disposed on the first layer, wherein the second layer includes a plurality of conductive nanowires.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: June 19, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yun Sung Woo, Hiesang Sohn, Weonho Shin, Eun-Hyoung Cho, Chan Kwak, Hyeon Cheol Park, Youngjin Cho, Dong-Su Ko, Woong Ko, Kwanghee Kim
  • Publication number: 20170139514
    Abstract: An electrical conductor includes a substrate; and a conductive layer disposed on the substrate and including a plurality of silver nanowires, wherein the silver nanowires exhibit a main peak assigned to a (111) crystal plane in an X-ray diffraction spectrum thereof, and a 2? full width at half maximum (FWHM) of the main peak after Gaussian fitting is less than about 0.40 degrees.
    Type: Application
    Filed: November 15, 2016
    Publication date: May 18, 2017
    Inventors: Mi Jeong KIM, Chan KWAK, Junghwa KIM, Dong Su KO, Kwanghee KIM, Jiye KIM
  • Publication number: 20170133469
    Abstract: A transparent electrode including: a substrate; a first layer disposed on the substrate, the first layer including a graphene mesh structure, the graphene mesh structure including graphene and a plurality of holes; and a second layer disposed on the first layer, wherein the second layer includes a plurality of conductive nanowires.
    Type: Application
    Filed: August 15, 2016
    Publication date: May 11, 2017
    Inventors: Yun Sung WOO, Hiesang SOHN, Weonho SHIN, Eun-Hyoung CHO, Chan KWAK, Hyeon Cheol PARK, Youngjin CHO, Dong-Su KO, Woong KO, Kwanghee KIM
  • Publication number: 20160260813
    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.
    Type: Application
    Filed: September 15, 2015
    Publication date: September 8, 2016
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eunae CHO, Dongjin LEE, Ji Eun LEE, Kyoung-Ho JUNG, Dong Su KO, Yongsu KIM, Jiho YOO, Sung HEO, Hyun PARK, Satoru YAMADA, Moonyoung JEONG, Sungjin KIM, Gyeongsu PARK, Han Jin LIM