Abstract: The invention relates to unique applications for the novel high melt flow, low viscosity, selectively hydrogenated styrene-butadiene-styrene (hSBS) or selectively hydrogenated controlled distribution styrene-butadiene/styrene-styrene (hSBSS) block copolymers, wherein the melt flow rate of said block copolymer is at least 100 g/10 min at 230° C. under 2.16 kg mass according to ASTM D1238. These block copolymers are novel and have the highest melt flow rate of any styrenic block copolymer also possessing high strength and elasticity. It has applications that prior to the present invention were not normally possible due to the normal low melt flow rate of styrenic block copolymers. The present invention also encompasses various fields of use such as a fiberglass hSBS or hSBSS reinforced mat, low viscosity hSBS or hSBSS coatings for industrial uses, hot melt adhesives prepared from hSBS or hSBSS blended with polyalpha-olefins, and elastic film, fiber, and nonwoven constructions using hSBS or hSBSS.

Abstract: The invention relates to unique applications for the novel high melt flow, low viscosity, selectively hydrogenated styrene-butadiene-styrene (hSBS) or selectively hydrogenated controlled distribution styrene-butadiene/styrene-styrene (hSBSS) block copolymers, wherein the melt flow rate of said block copolymer is at least 100 g/10 min at 230° C. under 2.16 kg mass according to ASTM D1238. These block copolymers are novel and have the highest melt flow rate of any styrenic block copolymer also possessing high strength and elasticity. It has applications that prior to the present invention were not normally possible due to the normal low melt flow rate of styrenic block copolymers. The present invention also encompasses various fields of use such as a fiberglass hSBS or hSBSS reinforced mat, low viscosity hSBS or hSBSS coatings for industrial uses, hot melt adhesives prepared from hSBS or hSBSS blended with polyalpha-olefins, and elastic film, fiber, and nonwoven constructions using hSBS or hSBSS.

Abstract: The present invention relates to various end use applications prepared from certain block copolymers. The block copolymers include one or more A or A? blocks or B blocks plus one or more terminal M blocks. Each A and A? is a block or segment comprising predominantly a polymerized alkenyl aromatic compound, each B is a block or segment comprising predominantly a polymerized conjugated alkadiene, and each M is a six membered anhydride ring and/or acid group. The anhydride rings are prepared by thermally decomposing adjacent units of (1-methyl-1-alkyl)alkyl acrylic esters such as t-butylmethylacrylate. A wide variety of polymers are disclosed having the stable anhydride rings in the polymer backbone. The invention relates specifically to various end uses prepared from the reaction product of such block copolymers with various reactive resins, reactive monomers and metal derivatives.

Abstract: The present invention relates to various end use applications prepared from certain block copolymers. The block copolymers include one or more A or A? blocks or B blocks plus one or more terminal M blocks. Each A and A? is a block or segment comprising predominantly a polymerized alkenyl aromatic compound, each B is a block or segment comprising predominantly a polymerized conjugated alkadiene, and each M is a six membered anhydride ring and/or acid group. The anhydride rings are prepared by thermally decomposing adjacent units of (1-methyl-1-alkyl)alkyl acrylic esters such as t-butylmethylacrylate. A wide variety of polymers are disclosed having the stable anhydride rings in the polymer backbone. The invention relates specifically to various end uses prepared from the reaction product of such block copolymers with various reactive resins, reactive monomers and metal derivatives.

Abstract: The present invention relates to a photopolymerizable composition, which comprises: (a) a block copolymer component comprising an unhydrogenated styrene diene block copolymer and a hydrogenated controlled distribution styrene diene block copolymer (b) one or more photopolymerizable ethylenically unsaturated low molecular weight compounds, (c) one or more polymerization initiators, and optionally (d) from 0 to 40% by weight, based on the total photopolymerizable compositions, of one or more auxiliaries. The invention also includes flexographic printing plates derived from said photopolymerizable compositions, and flexographic printing relief forms prepared from said plates.

Abstract: The present invention relates to a photopolymerizable composition, which comprises:

Abstract: Disclosed is a method for selective carboxylation of naphthoic acid, or other aromatic mono-acids to form primarily 2,3-naphthalene dicarboxylic acid (2,3-NDA) or other aromatic diacids which comprises reacting said aromatic mono-acid in the presence of one or more metal oxide catalysts, alone, or in combination, and in the presence of about 0.2 to 0.8 moles excess of base over aromatic mono-acid, at a temperature of about 380° C. to about 420° C., and, in a second step, disproportionating the product of said selective carboxylation at a temperature above about 420° C. to form a product with a greatly improved yield of 2,6-naphthalene dicarboxylic acid, or other aromatic dicarboxylic acid.

Abstract: Disclosed is a process for disproportionation of potassium naphthoate to the dipotassium salt of 2,6-NDA which gives reproducible improved yields of up to 40% which comprises: a) reacting naphthoic acid in the presence of excess base to produce a disproportionation feed comprising a finely dispersed disordered salt mixture of excess base salts and naphthoic acid salts, wherein the feed is prepared by the steps of: (1) Reacting naphthoic acid in the presence of excess base selected from the group consisting of carbonates and bicarbonates to form a salt; (2) Drying said salt mixture by a method which forms a highly mixed disordered salt mixture characterized by a differential scanning calorimeter(DSC) signature characterized by low melting peaks not previously observed in the salt; and b) Disproportionating said solid salts in the presence of a disproportionation catalyst to form the dipotassium salts of 2,6-NDA.

Abstract: Disclosed is an integrated process for producing 2,6-naphthalene dicarboxylicacid comprising oxidizing a methylnaphthalene feedstock, hydrodebrominating the crude naphthoic acid product under conditions different from any work known in the art, forming a potassium salt of the acid; disproportionating the potassium salt to produce 2,6 potassium salts of NDA; selectively precipitating K2NDA; selectively precipitating the monopotassium salt of 2,6 NDA(KHNDA); disproportionating the KHNDA into 2,6 NDA and K2NDA; further reacting the 2,6 NDA in a pipe reactor; and drying the product 2,6 NDA by conventional means or directly slurrying directly into a PEN process. The process can tolerate impurities in the economical methylnaphthalene feed and the resulting 2,6 NDA is of high quality with <50 ppm potassium.

Abstract: Disclosed are halide-free catalyst compositions for the disproportionation/isomerization of aromatic carboxylic acid salts. In one embodiment the catalyst comprises a mixed catalyst of compounds of copper, zinc, and zirconium; and, in a second embodiment, the catalyst comprises a copper compound treated with a base, optionally used with a promoter. Both halide-free catalysts provide advantages with respect to metallurgic problems, as well as good stability, activity and selectivity, and the later is faster kinetically at lower temperatures.

Abstract: Disclosed is a method for selective carboxylation of naphthoic acid, or other aromatic mono-acids to form primarily 2,3-naphthalene dicarboxylic acid (2,3-NDA) or other aromatic diacids which comprises reacting said aromatic mono-acid in the presence of one or more metal oxide catalysts, alone, or in combination, and in the presence of about 0.2 to 0.8 moles excess of base over aromatic mono-acid, at a temperature of about 380° C. to about 420° C., and, in a second step, disproportionating the product of said selective carboxylation at a temperature above about 420° C. to form a product with a greatly improved yield of 2,6-naphthalene dicarboxylic acid, or other aromatic dicarboxylic acid.

Abstract: A low molecular weight, telechelic polymer containing polar internal functionality is produced by (a) treating a copolymer of a polar alpha olefin and a conjugated diene with ozone to degrade the copolymer and form polymer segments which have aldehyde or ketone groups on the chain ends, wherein the copolymer has a random distribution of predominantly 1,4-diene double bonds and the pendant functional groups of the polar alpha olefin are stable to ozone, and (b) further reacting the aldehyde or ketone end groups to provide terminal functionality. The terminal functionality which can be provided includes carboxylic acid groups, primary hydroxyl groups, and amide groups.

Abstract: Disclosed is a method for selective carboxylation of naphthoic acid, or other aromatic mono-acids to form primarily 2,3-naphthalene dicarboxylic acid (2,3-NDA) or other aromatic diacids which comprises reacting said aromatic mono-acid in the presence of one or more metal oxide catalysts, alone, or in combination, and in the presence of about 0.2 to 0.8 moles excess of base over aromatic mono-acid, at a temperature of about 380° C. to about 420° C., and, in a second step, disproportionating the product of said selective carboxylation at a temperature above about 420° C. to form a product with a greatly improved yield of 2,6-naphthalene dicarboxylic acid, or other aromatic dicarboxylic acid.

Abstract: This invention relates to anionically polymerized block copolymers comprised of at least one block of polyethylene and at least one block of a polymerized cyclic siloxane monomer wherein said cyclic siloxane monomer contains at least one functional group containing a fluorocarbon substituent, e.g., 2,4,6-tris(3,3,3-trifluoropropyl)-1,3,5-trimethylcyclotrisiloxane. The fluoro-functionality may instead be introduced into the polymer by using said siloxane monomer to end cap the polymer. These copolymers can be used in extruded release coating films prepared by blending the copolymer with a film grade polymer. They can also be used to modify surface adhesion, promote flow in polymer processing or coat a polymeric surface to impart properties such as a barrier to water vapor transmission, or solvent resistance.