Abstract: A method for producing a deep-nested embossed product is disclosed. The method comprises the steps of: a) providing an embossing apparatus having mating first and second embossing members; b) providing the first embossing member with a plurality of discrete embossing elements in a non-random pattern; c) providing the second embossing member with at least one linear embossing element; d) coordinating the at least one linear embossing element with the non-random pattern of first embossing elements; e) aligning the first embossing member and the second embossing member so that the non-random pattern of first embossing elements nest with the at least one linear embossing element to an engagement depth of greater than about 0.01 mm; f) providing one or more plies of material to the embossing apparatus; and, g) passing the one or more plies of the material between the first and second embossing members to produce the deep-nested embossed product.

Abstract: A brush, as well as a method for cleaning a process surface using the brush, having: a hollow cylinder having a closed first end, a closed second end, and a peripheral wall with an internal and external surface; with bristles arranged on the external surface of the peripheral wall thereof; wherein the hollow cylinder has a plurality of apertures formed in the peripheral wall for permitting a gas or liquid to emerge from the interior of the hollow cylinders to the vicinity of the bristles; wherein the apertures are arranged in a staggered multi helical pattern having from about 3 to about 15 helix; and wherein the peripheral wall has a surface area ratio of from about 6 to about 30.

Abstract: An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0.01 mm.

Abstract: An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0.01 mm.

Abstract: An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0.01 mm.

Abstract: An apparatus for embossing a web substrate is disclosed. The apparatus has a pattern roll having an embossing pattern disposed thereon, an anvil roll juxtaposed in an axially parallel relationship with the pattern roll, and an embossing roll juxtaposed in an axially parallel relationship with said pattern roll. The anvil roll has a hardness of less than about 40 P&J. The embossing roll has a hardness of greater than about 40 P&J.

Abstract: A process for manufacturing a multi-ply paper product is disclosed. The process includes the steps of: 1. Providing a web substrate; 2. Providing a pattern roll; 3. Providing an anvil roll having a hardness of less than about 40 P&J; 4. Providing an embossing roll having a hardness of greater than about 40 P&J; 5. Juxtaposing the anvil roll and the pattern roll in an axially parallel relationship to form a first nip therebetween; 6. Juxtaposing the embossing roll and the pattern roll in an axially parallel relationship to form a second nip therebetween; 7. Forwarding the web substrate through the first nip such that portions of the web substrate are embossed at the first nip to provide an embossed first paper web; and, 8. Forwarding the embossed first paper web through the second nip so that the embossed portions of the first paper web are further embossed in registration with the embossed portions of the first paper web.

Abstract: An embossed fibrous structure comprising a singly ply is disclosed. The embossments have a contrast ratio of greater than about 1.25 as measured according to the Reflected Light Intensity test method.

Abstract: A web substrate comprising a plurality of embossment regions and an embossment pattern for a web substrate are disclosed. Each of the embossment regions is bounded by a first axis and a second axis orthogonal thereto. Each of the first axis are collectively elongate and each of the second axis are collectively parallel and discontinuous.

Abstract: A web product including one or more plies, the web product having a first side and a second side, the web product including a plurality of discrete embossments extending from the first side to the second side; and at least one linear embossment extending from the second side to the first side, wherein the web product has an average embossment height of greater than about 650 ?m.

Abstract: A method for processing a web material having a machine direction and a cross-machine direction coplanar and perpendicular thereto is disclosed herein. The method incorporates the step of first directing a web material proximate to an air foil. Steam is then applied to the web material by the air foil. Finally, the web material is processed by any downstream web material processing operation.

Abstract: An apparatus for producing an embossed product including a first embossing member having a plurality of discrete embossing elements disposed in a first non-random pattern having at least one first single pattern unit. The total area of the distal ends of the discrete embossing elements in the first single pattern unit is less than about 5.0 cm2. The apparatus also includes a second embossing member having a plurality of linear embossing elements disposed in a second non-random pattern having at least one second single pattern unit. The total area of the second distal ends in the second single pattern unit is less than about 10 cm2. The second non-random pattern is coordinated with the first non-random pattern such that when engaged with each other the first single pattern unit and the second single pattern unit make up an embossing pattern single pattern unit.

Abstract: A method for producing a deep-nested embossed product is disclosed. The method comprises the steps of: a) providing an embossing apparatus having mating first and second embossing members; b) providing the first embossing member with a plurality of discrete embossing elements in a non-random pattern; c) providing the second embossing member with at least one linear embossing element; d) coordinating the at least one linear embossing element with the non-random pattern of first embossing elements; e) aligning the first embossing member and the second embossing member so that the non-random pattern of first embossing elements nest with the at least one linear embossing element to an engagement depth of greater than about 0.01 mm; f) providing one or more plies of material to the embossing apparatus; and, g) passing the one or more plies of the material between the first and second embossing members to produce the deep-nested embossed product.

Abstract: An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0.01 mm.

Abstract: An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0.01 mm.

Abstract: An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0.01 mm.

Abstract: An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0.01 mm.

Abstract: The present invention relates to an apparatus for producing a deep-nested embossed paper product comprising two embossing cylinders, each cylinder having a plurality of protrusions on its surface. The protrusions on each cylinder are disposed in a non-random pattern where the respective non-random patterns are coordinated to each other. The two embossing cylinders are aligned such that the respective coordinated non-random pattern of protrusions nest together such that the protrusions engage each other to a depth of greater than about 1.016 mm. The protrusions each comprise a top plane and sidewalls, with the top plane and sidewalls meeting at a protrusion corner. The protrusion corners of the protrusions of the embossing cylinders of the apparatus of the present invention have a radius of curvature ranging from about 0.076 mm to about 1.778 mm.