Patents by Inventor Doo Baik

Doo Baik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070134826
    Abstract: According to a method of manufacturing a vertical nitride light emitting device, a first conductivity type nitride layer, an active layer and a second conductivity type nitride layer are sequentially grown on a preliminary growth substrate to form a light emission structure. The light emission structure is cut according to a final size of light emitting devices, leaving a predetermined thickness of the first conductivity type nitride layer intact. A permanent conductive substrate is provided on the light emission structure and the preliminary substrate is diced into a plurality of units. Laser beam is irradiated to detach the preliminary substrate, thereby separating the light emission structure according to the size of the light emitting devices. First and second contacts are formed on the first conductivity type nitride layer and the permanent conductive substrate, respectively. The permanent conductive substrate is diced to complete individual light emitting devices.
    Type: Application
    Filed: October 23, 2006
    Publication date: June 14, 2007
    Inventors: Doo Baik, Bang Oh, Nam Kim
  • Publication number: 20070126022
    Abstract: A vertical GaN-based LED and a method of manufacturing the same are provided. The vertical GaN-based LED can prevent the damage of an n-type GaN layer contacting an n-type electrode, thereby stably securing the contact resistance of the n-electrode. The vertical GaN-based LED includes: a support layer; a p-electrode formed on the support layer; a p-type GaN layer formed on the p-electrode; an active layer formed on the p-type GaN layer; an n-type GaN layer for an n-type electrode contact, formed on the active layer; an etch stop layer formed on the n-type GaN layer to expose a portion of the n-type GaN layer; and an n-electrode formed on the n-type GaN layer exposed by the etch stop layer.
    Type: Application
    Filed: December 6, 2006
    Publication date: June 7, 2007
    Inventors: Doo Baik, Bang Oh, Seok Choi, Su Lee
  • Publication number: 20050093011
    Abstract: Disclosed are a light emitting diode (LED) with high luminance and a method for manufacturing the same. The LED comprises a substrate, a first conductive clad layer formed on the substrate, an active layer formed on the first conductive clad layer, a second conductive clad layer formed on the active layer, an alumina (Al2O3) layer formed on the lower surface of the substrate, and an aluminum layer formed on the lower surface of the alumina (Al2O3) layer. Otherwise, the substrate is removed, the aluminum layer and the alumina layer are formed directly on the lower surface of the first conductive clad layer. Compared to a single reflective layer made of a metal, a reflective layer including the aluminum layer and the alumina layer improves reflective characteristics of the LED.
    Type: Application
    Filed: December 16, 2004
    Publication date: May 5, 2005
    Applicant: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Doo Baik, Bang Oh, Hak Kim