Patents by Inventor Doohee KIM

Doohee KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260143686
    Abstract: A semiconductor device includes: a substrate; an active region in the substrate; a device isolation layer defining the active region; a gate structure in the substrate and extending across the active region in a first horizontal direction; bit line structures on the substrate, extending in a second horizontal direction intersecting the first horizontal direction, and crossing the gate structure; and a contact structure between the bit line structures, wherein the contact structure includes: a first contact plug in contact with the active region; a second contact plug on the first contact plug; and a third contact plug on the second contact plug, and wherein a first vertical central axis of the active region, a second vertical central axis of the first contact plug, and a third vertical central axis of the third contact plug are offset from each other in a cross-sectional view.
    Type: Application
    Filed: November 14, 2025
    Publication date: May 21, 2026
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yoongoo KANG, Namgun KIM, Doohee KIM, Cheolho KIM, Jaehong PARK, Seojin AHN, Seokjae WON, Hyeryeong LEE
  • Publication number: 20250338473
    Abstract: A method of manufacturing an integrated circuit device includes providing a substrate including a cell array area and a peripheral circuit area; forming a conductive layer in the cell array area and the peripheral circuit area; forming a capping insulating layer on the conductive layer; forming, in the cell array area, a direct contact and a bit line by using the capping insulating layer as a first etching mask; forming a spacer structure on side walls of the direct contact and on side walls of the bit line; forming a buried contact that is between the direct contact and the bit line and a first side wall of the side walls of the bit line; forming an insulating spacer on the cell array area and the peripheral circuit area; and forming, in the peripheral circuit area, a gate structure by using the insulating spacer as a second etching mask.
    Type: Application
    Filed: January 3, 2025
    Publication date: October 30, 2025
    Inventors: Seokjae Won, Yoongoo Kang, Jaehong Park, Doohee Kim, Yeeju Kim, Cheolho Kim, Seojin Ahn
  • Patent number: 8786805
    Abstract: A backlight unit according to embodiment comprise of a frame, a light emitting device module disposed on a side of the frame and a plurality of light guide members disposed in the direction of the light irradiated from the light emitting device, wherein the light guide members have light transmissivity and reflectivity different from each other.
    Type: Grant
    Filed: March 14, 2012
    Date of Patent: July 22, 2014
    Assignee: LG Innotek Co., Ltd.
    Inventor: Doohee Kim
  • Publication number: 20120293745
    Abstract: A backlight unit according to embodiment comprise of a frame, a light emitting device module disposed on a side of the frame and a plurality of light guide members disposed in the direction of the light irradiated from the light emitting device, wherein the light guide members have light transmissivity and reflectivity different from each other.
    Type: Application
    Filed: March 14, 2012
    Publication date: November 22, 2012
    Inventor: Doohee KIM