Patents by Inventor Dorel L. Toma

Dorel L. Toma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi-step system and method for curing a dielectric film
    Patent number: 9184047
    Abstract: A multi-step system and method for curing a dielectric film in which the system includes a drying system configured to reduce the amount of contaminants, such as moisture, in the dielectric film. The system further includes a curing system coupled to the drying system, and configured to treat the dielectric film with ultraviolet (UV) radiation and infrared (IR) radiation in order to cure the dielectric film.
    Type: Grant
    Filed: December 27, 2013
    Date of Patent: November 10, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Junjun Liu, Eric M. Lee, Dorel L. Toma
  • MULTI-STEP SYSTEM AND METHOD FOR CURING A DIELECTRIC FILM
    Publication number: 20140109432
    Abstract: A multi-step system and method for curing a dielectric film in which the system includes a drying system configured to reduce the amount of contaminants, such as moisture, in the dielectric film. The system further includes a curing system coupled to the drying system, and configured to treat the dielectric film with ultraviolet (UV) radiation and infrared (IR) radiation in order to cure the dielectric film.
    Type: Application
    Filed: December 27, 2013
    Publication date: April 24, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Junjun LIU, Eric M. LEE, Dorel L. TOMA
  • Multi-step system and method for curing a dielectric film
    Patent number: 8642488
    Abstract: A multi-step system and method for curing a dielectric film in which the system includes a drying system configured to reduce the amount of contaminants, such as moisture, in the dielectric film. The system further includes a curing system coupled to the drying system, and configured to treat the dielectric film with ultraviolet (UV) radiation and infrared (IR) radiation in order to cure the dielectric film.
    Type: Grant
    Filed: October 26, 2009
    Date of Patent: February 4, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Junjun Liu, Eric M. Lee, Dorel L. Toma
  • MULTI-STEP SYSTEM AND METHOD FOR CURING A DIELECTRIC FILM
    Publication number: 20100041248
    Abstract: A multi-step system and method for curing a dielectric film in which the system includes a drying system configured to reduce the amount of contaminants, such as moisture, in the dielectric film. The system further includes a curing system coupled to the drying system, and configured to treat the dielectric film with ultraviolet (UV) radiation and infrared (IR) radiation in order to cure the dielectric film.
    Type: Application
    Filed: October 26, 2009
    Publication date: February 18, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Junjun LIU, Eric M. Lee, Dorel L. Toma
  • Multi-step system and method for curing a dielectric film
    Patent number: 7622378
    Abstract: A multi-step system and method for curing a dielectric film in which the system includes a drying system configured to reduce the amount of contaminants, such as moisture, in the dielectric film. The system further includes a curing system coupled to the drying system, and configured to treat the dielectric film with ultraviolet (UV) radiation and infrared (IR) radiation in order to cure the dielectric film.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: November 24, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Junjun Liu, Eric M. Lee, Dorel L. Toma