Patents by Inventor Doria W. Fan

Doria W. Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vented lower liner for heating exhaust gas from a single substrate reactor
    Patent number: 6254686
    Abstract: The present invention is a single wafer reactor having a vented lower liner for heating exhaust gas. The apparatus of the present invention includes a reaction chamber. A wafer support member which divides the chamber into an upper and lower portion is positioned within the chamber. A gas outlet for exhausting gas from the chamber has a vent to exhaust gas from the lower portion of the chamber and an exhaust passage opening to exhaust gas from the upper portion of the chamber. Heated inert purge gas is fed from the lower chamber portion through the vent at a rate so as to prevent the deposition gas from condensing in the exhaust passage.
    Type: Grant
    Filed: August 25, 2000
    Date of Patent: July 3, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Paul B. Comita, David K. Carlson, Norma B. Riley, Doria W. Fan, Rekha Ranganathan
  • Method for heating exhaust gas in a substrate reactor
    Patent number: 6153260
    Abstract: The present invention is a single wafer reactor having a vented lower liner for heating exhaust gas. The apparatus of the present invention includes a reaction chamber. A wafer support member which divides the chamber into an upper and lower portion is positioned within the chamber. A gas outlet for exhausting gas from the chamber has a vent to exhaust gas from the lower portion of the chamber and an exhaust passage opening to exhaust gas from the upper portion of the chamber. Heated inert purge gas is fed from the lower chamber portion through the vent at a rate so as to prevent the deposition gas from condensing in the exhaust passage.
    Type: Grant
    Filed: April 11, 1997
    Date of Patent: November 28, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Paul B. Comita, David K. Carlson, Norma B. Riley, Doria W. Fan, Rekha Ranganathan