Patents by Inventor Dorman Raines

Dorman Raines has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma etching apparatus and method and apparatus for verifying a wafer
    Patent number: 6027605
    Abstract: Wafer verifying apparatus for receiving a wafer thereagainst and for verifying the wafer, wafer verifying apparatus comprising a fixture including a stage for receiving thereagainst a surface of the wafer, a vacuum assembly for effecting a vacuum coupling of the surface of the wafer to the stage, and sensor apparatus for accepting the wafer in the presence of a vacuum couple of the surface of the wafer against the stage and for rejecting the wafer absent a vacuum couple of the surface of the wafer against the stage.
    Type: Grant
    Filed: May 22, 1998
    Date of Patent: February 22, 2000
    Assignee: Raines Technologies, Inc.
    Inventors: Mark D. Lehmann, Dorman Raines, Charles A. Stamps