Abstract: A data storage device comprises a storage medium for storing data in the form of marks and at least one probe for scanning the storage medium. The storage medium may be comprised in a substrate. The probe comprises a cantilever that comprises terminals serving as electrical contacts an being during operation of the probe mechanically fixed to a probe-holding structure, which may be a common frame of the data storage device. A probe further comprises a supporting structure, to which the terminals are mechanically directly coupled or coupled via hinges and which extends away from the terminals. A tip with a nanoscale apex is provided. A beam structure comprises a heating resistor and is attached at ends to the supporting structure. The beam structure is thinned at least in a direction parallel to an axis of the tip compared to an area of the supporting structure abutting the beam structure.

Abstract: A data storage device comprises a storage medium, at least one probe designed for creating indentation marks in the storage medium, a control unit designed for creating a control parameter (CTRL) acting on the probe resulting in the creation of one indentation mark. The control unit is further designed for modifying the control parameter (CTRL), if at least a given number of consecutive indentation marks with a given minimum distance between each other should be created. According to the method the control parameter (CTRL) is modified if at least a given number of consecutive marks with a given minimum distance between each other should be created.

Abstract: A data storage device comprises a storage medium, at least one probe designed for creating indentation marks in the storage medium, a control unit designed for creating a control parameter (CTRL) acting on the probe resulting in the creation of one indentation mark. The control unit is further designed for modifying the control parameter (CTRL), if at least a given number of consecutive indentation marks with a given minimum distance between each other should be created. According to the method the control parameter (CTRL) is modified if at least a given number of consecutive marks with a given minimum distance between each other should be created.

Abstract: A method is provided for determining the topography of an object. A micro-cantilever with a scanning tip is provided. The micro-cantilever includes a thermal sensor. A biased voltage is applied across the thermal sensor. A resistance change of the thermal sensor is then identified. The bias voltage is then modulated, based on the resistance change to enhance the bandwidth and the sensitivity of the thermal sensor. Responsive to the scanning tip traversing a topographical variation on an object, the thermal sensor is vertically displaced with respect to the object, which induces a temperature change of the thermal sensor. A subsequent electrical resistance change of the thermal sensor is then identified, the subsequent electrical resistance change corresponding to a subsequent temperature change. The position of the object relative to the thermal sensor is then identified based on a difference between the initial electrical resistance and the subsequent electrical resistance.

Abstract: A data storage device comprises a storage medium for storing data in the form of marks and at least one probe for scanning the storage medium. The storage medium may be comprised in a substrate. The probe comprises a cantilever that comprises terminals serving as electrical contacts an being during operation of the probe mechanically fixed to a probe-holding structure, which may be a common frame of the data storage device. A probe further comprises a supporting structure, to which the terminals are mechanically directly coupled or coupled via hinges and which extends away from the terminals. A tip with a nanoscale apex is provided. A beam structure comprises a heating resistor and is attached at ends to the supporting structure. The beam structure is thinned at least in a direction parallel to an axis of the tip compared to an area of the supporting structure abutting the beam structure.

Abstract: A data storage device comprises a storage medium for storing data in the form of marks and at least one probe for scanning the storage medium. The storage medium may be comprised in a substrate. The probe comprises a cantilever that comprises terminals serving as electrical contacts an being during operation of the probe mechanically fixed to a probe-holding structure, which may be a common frame of the data storage device. A probe further comprises a supporting structure, to which the terminals are mechanically directly coupled or coupled via hinges and which extends away from the terminals. A tip with a nanoscale apex is provided. A beam structure comprises a heating resistor and is attached at ends to the supporting structure. The beam structure is thinned at least in a direction parallel to an axis of the tip compared to an area of the supporting structure abutting the beam structure.

Abstract: Provides surface treatment devices, surface scanning devices, methods of operating a surface treatment device and methods of operating a surface scanning device. An area within a medium comprises at least one sharpening location for sharpening a tip of a probe mechanically. The tip is conically shaped with a radius of an apex smaller than 100 nm. In the case of the surface treatment device the probe is designed for altering the surface of the medium. In the case of the surface scanning device the probe is designed for scanning the medium. The sharpening location is suited for sharpening the tip mechanically. For that purpose the probe and the medium are being moved relative to each other such that the tip is located in the sharpening location. Then the probe and/or the medium are moved relative to each other such, that the tip is mechanically sharpened.

Abstract: A method of inducing phase changes in a FIR filter is provided. The FIR filter consists of a concatenation of tunable couplers and tunable delay lines made of planar waveguides fabricated in SiON technology, forming a plurality of interferometers, at least one of which carries a heater on at least one of its waveguide arms. The method includes the step of exposing at least one of the arms of the interferometers to an irradiation at UV or a smaller wavelength, thereby inducing a change in the refractive index of the waveguide arms which induces the phase difference change. The method provides a procedure that will lead to temperature-stable changes of the refractive index of the waveguides. The resulting device is temperature-stable such that it can be afterwards be heated with chromium heaters to dynamically tune its spectral response without destroying the UV-induced changes.

Abstract: A method for manufacturing an optical device with a defined total device stress and a therefrom resulting defined birefringence and a therefrom resulting defined optical polarization dependence is disclosed. In a preferred embodiment, a lower cladding layer of an amorphous material with a first refractive index is provided and above that an upper cladding layer of an amorphous material with a second refractive index, which latter is manufactured from a material which is tunable in its stress. Between the lower and upper cladding layer an optical waveguide core is manufactured comprising an amorphous material having a third refractive index which is larger than the first and second refractive index. The optical waveguide core is thermally annealed, after which it has a defined waveguide core stress. The upper cladding layer is manufactured to have a cladding layer stress that together with the waveguide core stress results in the total device stress.

Abstract: A method for manufacturing an optical device with a defined total device stress, birefringence and optical polarization dependence is disclosed. The method comprises first providing a tower cladding layer of an amorphous material with a first refractive index and then providing above the lower cladding layer an upper cladding layer of an amorphous material with a second refractive index. An optical waveguide core comprising an amorphous material having a third refractive index (larger than the first refractive index and the second refractive index) is provided between the lower and the upper cladding layers. The upper cladding layer is thermally annealed by keeping the upper cladding layer at a first temperature, then raising the temperature to a second temperature, maintaining the second temperature for an annealing time period, and lowering the temperature to a third temperature, after which the temperature is lowered to a fourth temperature.

Abstract: A method of inducing phase changes in a FIR filter is provided. The FIR filter consists of a concatenation of tunable couplers and tunable delay lines made of planar waveguides fabricated in SiON technology, forming a plurality of interferometers, at least one of which carries a heater on at least one of its waveguide arms. The method includes the step of exposing at least one of the arms of the interferometers to an irradiation at UV or a smaller wavelength, thereby inducing a change in the refractive index of the waveguide arms which induces the phase difference change. The method provides a procedure that will lead to temperature-stable changes of the refractive index of the waveguides. The resulting device is temperature-stable such that it can be afterwards be heated with chromium heaters to dynamically tune its spectral response without destroying the UV-induced changes.

Abstract: An optical device with a defined total device stress (&sgr;10) and a therefrom resulting defined birefringence in order to obtain a well defined optical polarization dependence is proposed. It comprises a lower cladding layer (3) with a first refractive index (n3), thereon an upper cladding layer (5) with a second refractive index (n5) and between an optical waveguide core (4) with a third refractive index (n4) which is bigger than the first refractive index (n3) and the second refractive index (n5). The optical waveguide core (4) has a waveguide core stress (&sgr;4) resulting from the manufacturing process and the upper cladding layer (5) is manufactured to have an inherent cladding layer stress (&sgr;5) which together with the waveguide core stress (&sgr;4) results in the total device stress (&sgr;10).

Abstract: A method for manufacturing an optical device with a defined total device stress and a there-from resulting defined birefringence and a therefrom resulting defined optical polarization dependence is disclosed. The method comprises a first step of providing a lower cladding layer of an amorphous material, preferably based on SiO2, that may be doped with elements like Boron and/or Phosphorous with a first refractive index and a second step of providing above the lower cladding layer an upper cladding layer of an amorphous material, preferably based on SiO2, that may be doped with elements like Boron and/or Phosphorous with a second refractive index, and being manufactured from a material which is tunable in its stress.

Abstract: A method for manufacturing an optical device with a defined total device stress and a therefrom resulting defined birefringence and a therefrom resulting defined optical polarization dependence is disclosed. In a preferred embodiment, a lower cladding layer of an amorphous material with a first refractive index is provided and above that an upper cladding layer of an amorphous material with a second refractive index, which latter is manufactured from a material which is tunable in its stress. Between the lower and upper cladding layer an optical waveguide core is manufactured comprising an amorphous material having a third refractive index which is larger than the first and second refractive index. The optical waveguide core is thermally annealed, after which it has a defined waveguide core stress. The upper cladding layer is manufactured to have a cladding layer stress that together with the waveguide core stress results in the total device stress.