Patents by Inventor Doug Holmes

Doug Holmes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • BEVERAGE CONTAINING NITROUS OXIDE AND CARBON DIOXIDE
    Publication number: 20100009052
    Abstract: Disclosed herein are beverage compositions containing dissolved gases. The beverage compositions generally contain a mixture of dissolved nitrous oxide and dissolved carbon dioxide.
    Type: Application
    Filed: September 21, 2009
    Publication date: January 14, 2010
    Applicant: DR. PEPPER/SEVEN UP, INC.
    Inventors: Carlos Alberto Canessa, Doug Holmes, Rein Hirs, Megha Ghandi
  • Thermally curable middle layer comprising polyhedral oligomeric silsesouioxanes for 193-nm trilayer resist process
    Patent number: 7507783
    Abstract: New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo-silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include —OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: March 24, 2009
    Assignee: Brewer Science Inc.
    Inventors: Jim D. Meador, Mariya Nagatkina, Doug Holmes
  • Thermally curable middle layer for 193-NM trilayer resist process
    Publication number: 20040229158
    Abstract: New lithographic compositions (e.g., for use as middle layers in trilayer processes) are provided. In one embodiment, the compositions comprise an organo-silicon polymer dispersed or dissolved in a solvent system, and preferably a crosslinking agent and a catalyst. In another embodiment, the organo-silicon polymer is replaced with a polyhedral oligomeric silsesquioxane-containing polymer and/or a polyhedral oligomeric silsesquioxane. In either embodiment, the polymer and/or compound should also include —OH groups for proper cross-linking of the composition. When used as middle layers, these compositions can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle layer plus photoresist) is still thin compared to prior art stacks.
    Type: Application
    Filed: February 20, 2004
    Publication date: November 18, 2004
    Inventors: Jim D. Meador, Mariya Nagatkina, Doug Holmes, Julie Wilson, Denise Gum