Patents by Inventor Doug K. Masnaghetti
Doug K. Masnaghetti has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11120969Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.Type: GrantFiled: March 27, 2020Date of Patent: September 14, 2021Assignee: KLA CorporationInventors: Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Grace Hsiu-Ling Chen, Rainer Knippelmeyer
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Patent number: 10861671Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.Type: GrantFiled: January 21, 2019Date of Patent: December 8, 2020Assignee: KLA CorporationInventors: Doug K. Masnaghetti, Richard R. Simmons, Scott A. Young, Mark A. McCord, Rainer Knippelmeyer
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Publication number: 20200227232Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.Type: ApplicationFiled: March 27, 2020Publication date: July 16, 2020Inventors: Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Grace Hsiu-Ling Chen, Rainer Knippelmeyer
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Patent number: 10643819Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.Type: GrantFiled: March 24, 2016Date of Patent: May 5, 2020Assignee: KLA-Tencor CorporationInventors: Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Grace Hsiu-Ling Chen, Rainer Knippelmeyer
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Patent number: 10460905Abstract: Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.Type: GrantFiled: August 24, 2016Date of Patent: October 29, 2019Assignee: KLA-Tencor CorporationInventors: Mark A. McCord, Richard R. Simmons, Doug K. Masnaghetti, Rainer Knippelmeyer
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Patent number: 10366862Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.Type: GrantFiled: September 16, 2016Date of Patent: July 30, 2019Assignee: KLA-Tencor CorporatonInventors: Doug K. Masnaghetti, Richard R. Simmons, Mark A. McCord, Rainer Knippelmeyer
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Patent number: 10325753Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.Type: GrantFiled: September 21, 2016Date of Patent: June 18, 2019Assignee: KLA Tencor CorporationInventors: Doug K. Masnaghetti, Richard R. Simmons, Scott A. Young, Mark A. McCord, Rainer Knippelmeyer
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Publication number: 20190172675Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.Type: ApplicationFiled: January 21, 2019Publication date: June 6, 2019Inventors: Doug K. Masnaghetti, Richard R. Simmons, Scott A. Young, Mark A. McCord, Rainer Knippelmeyer
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Patent number: 10192716Abstract: Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.Type: GrantFiled: August 24, 2016Date of Patent: January 29, 2019Assignee: KLA-Tencor CorporationInventors: Doug K. Masnaghetti, Mark A. McCord, Richard R. Simmons, Rainer Knippelmeyer
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Patent number: 10186396Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.Type: GrantFiled: September 21, 2016Date of Patent: January 22, 2019Assignee: KLA Tencor CorporationInventors: Doug K. Masnaghetti, Richard R. Simmons, Scott A. Young, Mark A. McCord, Rainer Knippelmeyer
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Publication number: 20170084423Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.Type: ApplicationFiled: September 16, 2016Publication date: March 23, 2017Inventors: Doug K. Masnaghetti, Richard R. Simmons, Mark A. McCord, Rainer Knippelmeyer
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Publication number: 20170084424Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.Type: ApplicationFiled: September 21, 2016Publication date: March 23, 2017Inventors: Doug K. Masnaghetti, Richard R. Simmons, Scott A. Young, Mark A. McCord, Rainer Knippelmeyer
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Publication number: 20170084422Abstract: Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.Type: ApplicationFiled: August 24, 2016Publication date: March 23, 2017Inventors: Doug K. Masnaghetti, Mark A. McCord, Richard R. Simmons, Rainer Knippelmeyer
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Publication number: 20170084421Abstract: Multi-beam scanning electron microscope inspection systems are disclosed. A multi-beam scanning electron microscope inspection system may include an electron source and a beamlet control mechanism. The beamlet control mechanism may be configured to produce a plurality of beamlets utilizing electrons provided by the electron source and deliver one of the plurality of beamlets toward a target at a time instance. The multi-beam scanning electron microscope inspection system may also include a detector configured to produce an image of the target at least partially based on electrons backscattered out of the target.Type: ApplicationFiled: August 24, 2016Publication date: March 23, 2017Inventors: Mark A. McCord, Richard R. Simmons, Doug K. Masnaghetti, Rainer Knippelmeyer
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Publication number: 20160372304Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.Type: ApplicationFiled: March 24, 2016Publication date: December 22, 2016Inventors: Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Grace Hsiu-Ling Chen, Rainer Knippelmeyer