Abstract: An electrical component comprising an electrical component having an exterior protective layer on at least a portion of a surface. The layer is a cured copolymer of a reaction between at least one oligomer having a terminal ethylenically unsaturated group and at least one monomer having a terminal ethylenically unsaturated group. Alternatively, the layer is a cured copolymer of a reaction between at least two oligomers having a terminal ethylenically unsaturated group. The copolymerization reaction is preferably in the presence of a free radical initiator curing agent and a transition metal catalyst.

Abstract: An electrical component comprising an electrical component having an exterior protective layer on at least a portion of a surface. The layer is a cured copolymer of a reaction between at least one oligomer having a terminal ethylenically unsaturated group and at least one monomer having a terminal ethylenically unsaturated group. Alternatively, the layer is a cured copolymer of a reaction between at least two oligomers having a terminal ethylenically unsaturated group. The copolymerization reaction is preferably in the presence of a free radical initiator curing agent and a transition metal catalyst.

Abstract: UV curable adhesive compositions which provide improved bonding to substrates such as carbonates and metals is provided. The compositions are formed as the reaction product of a urethane methacrylate and reactive diluents such as N-vinyl caprolactam and isobornyl acrylate, a photoinitiator compound, and adhesion promoting additives. Urethane methacrylates which may be employed include ester-based urethane methacrylates as well as ether based urethane methacrylates. Also, methods of bonding substrates using their compositions and the articles produced by the methods.

Abstract: UV curable adhesive compositions which provide improved bonding to substrates such as carbonates and metals is provided. The compositions are formed as the reaction product of a urethane methacrylate and reactive diluents such as N-vinyl caprolactam and isobornyl acrylate, a photoinitiator compound, and adhesion promoting additives. Urethane methacrylates which may be employed include ester-based urethane methacrylates as well as ether based urethane methacrylates. Also, methods of bonding substrates using their compositions and the articles produced by the methods.

Abstract: UV curable adhesive compositions which provide improved bonding to substrates such as carbonates and metals is provided. The compositions are formed as the reaction product of a urethane methacrylate and reactive diluents such as N-vinyl caprolactam and isobornyl acrylate, a photoinitiator compound, and adhesion promoting additives. Urethane methacrylates which may be employed include ester-based urethane methacrylates as well as ether based urethane methacrylates. Also, methods of bonding substrates using their compositions and the articles produced by the methods.

Abstract: The invention relates to polyurethane compositions that can be formulated as a two component systems of a first component of a polyol and an amine of formula (I): ##STR1## and a second component of isocyanate. This invention further relates to methods of formulating those polyurethanes, and to use of those polyurethanes in separatory devices.

Abstract: A photolithographic resist with sensitivity for actinic radiation in the short wavelength, ultraviolet region is produced from (1) an organic film-forming material, and (2) an oxime carboxylate ester which releases a carboxylic acid on exposure to deep ultraviolet radiation, thereby rendering the composition more soluble in a developer in the exposed regions than in the unexposed regions. A process for the formation of an image is also disclosed comprising (1) exposing the above composition to actinic radiation in a pre-determined pattern and (2) treating the composition with aqueous base developer to remove the exposed areas. The image-forming process may be used in the production of printing plates and microelectronic circuits.

Abstract: A method for producing a negative image by coating a substrate with a photosensitive layer containing a blocked hydrophobic polymer capable of deblocking in the presence of an acid, and an oxime sulfonate ester or o-quinone-4-sulfonyl-containing diazide, then imagewise exposing, treating with a gaseous base, removing excess base, overall flood exposing, baking and developing with an aqueous alkaline solution.