Abstract: Medical cable authentication apparatuses and methods are disclosed. Some embodiments herein provide a medical cable assembly for use in a patient monitoring system including authentication circuit. The authentication circuit can provide a signal indicative of whether the medical cable assembly is compatible, or desirable for use with a particular patient monitor and/or sensor. The authentication circuit can include a substantially constant current source that drives a capacitor, wherein a voltage signal provided by a patient monitor drives the current source, and the voltage across the capacitor is used to generate an authentication output signal.

Abstract: Medical cable authentication apparatuses and methods are disclosed. Some embodiments herein provide a medical cable assembly for use in a patient monitoring system including authentication circuit. The authentication circuit can provide a signal indicative of whether the medical cable assembly is compatible, or desirable for use with a particular patient monitor and/or sensor. The authentication circuit can include a substantially constant current source that drives a capacitor, wherein a voltage signal provided by a patient monitor drives the current source, and the voltage across the capacitor is used to generate an authentication output signal.

Abstract: A partition system includes an internally-open partition frame having permanent and removable frame members forming multiple vertical and horizontal wireways, with both lay-in and feed-through wire routing. Utility support brackets are attachable for good wire management. The partition frame supports a wide variety of customizable and functional surface components, including a markerboard wall surface, a slatwall, a colored/covered wall surface, a wall surface including utility outlets, a transparent window. The partition frame includes continuous horizontal and vertical rows of slots that flexibly and adjustably support furniture accessories, such as a worksurface, at selected heights and locations along the partition system. Covers are provided that maintain a very high-quality appearance with uniform lines and gaps. Some covers include adjustable edge-mounted light seals for eliminating light leaks and unsightly areas.

Abstract: A rowing exercise machine includes a resistance mechanism having a first coupling between first and second spaced disks and resiliently deformable and tensionable in a spiral therebetween to resist rotation, and a second coupling between one of the disks and a user handle to resist movement of the handle and concordant movement of the user on a seat along a track.

Abstract: Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the endpoint of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber.

Abstract: An office panel partition includes a panel frame having at least two uprights and a horizontal structural member rigidly interconnecting the uprights. The panel frame has a first side and a second opposite side, and the panel frame defines at least four apertures on the first side thereof. The partition also includes a cover member having a major planar surface defining an exterior surface of the partition. The cover member includes at least four projections that are removably insertable into the at least four apertures to removably secure the cover member to the frame. The apertures are arranged in at least two vertically spaced horizontal rows and at least two horizontally spaced vertical columns. The apertures in a first one of the columns have different horizontal dimensions than those of the apertures located in the other of the columns. Each of the projections has a range of lateral positions when inserted into a respective one of the apertures.

Abstract: The etching of a material in a vapor phase etchant is disclosed where a vapor phase etchant is provided to an etching chamber at a total gas pressure of 10 Torr or more, preferably 20 Torr or even 200 Torr or more. The vapor phase etchant can be gaseous acid etchant, a noble gas halide or an interhalogen. The sample/workpiece that is etched can be, for example, a semiconductor device or MEMS device, etc. The material that is etched/removed by the vapor phase etchant is preferably silicon and the vapor phase etchant is preferably provided along with one or more diluents. Another feature of the etching system includes the ability to accurately determine the end point of the etch step, such as by creating an impedance at the exit of the etching chamber (or downstream thereof) so that when the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined.

Abstract: Processes for the addition or removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the use of recirculation of the process gas. Recirculation is effected by a pump that has no sliding or abrading parts that contact the process gas, nor any wet (such as oil) seals or purge gas in the pump. Improved processing can be achieved by a process chamber that contains a baffle, a perforated plate, or both, appropriately situated in the chamber to deflect the incoming process gas and distribute it over the workpiece surface. In certain embodiments, a diluent gas is added to the recirculation loop and continuously circulated therein, followed by the bleeding of the process gas (such as an etchant gas) into the recirculation loop. Also, cooling of the process gas, etching chamber and/or sample platen can aid the etching process. The method is particularly useful for adding to or removing material from a sample of microscopic dimensions.

Abstract: The etching of a sacrificial silicon portion in a microstructure such as a microelectromechanical structure by the use of etchant gases that are noble gas fluorides or halogen fluorides is performed with greater selectivity toward the silicon portion relative to other portions of the microstructure by slowing the etch rate. The etch rate is preferably 30 um/hr or less, and can be 3 um/hr or even less. The selectivity is also improved by the addition of non-etchant gaseous additives to the etchant gas. Preferably the non-etchant gaseous additives that have a molar-averaged formula weight that is below that of molecular nitrogen offer significant advantages over gaseous additives of higher formula weights by causing completion of the etch in a shorter period of time while still achieving the same improvement in selectivity. The etch process is also enhanced by the ability to accurately determine the end point of the removal step.

Abstract: A method is disclosed for securing a flexible covering about a frame having a peripheral edge and at least one corner. A portion of the flexible covering is folded over the peripheral edge of the frame at or about the corner and an excess portion of the covering is provided. Ultrasonic welding is used to create a seam of contacting portions of the flexible covering. In an embodiment, the excess portion of the flexible covering is removed in connection with the welding operation. An apparatus for securing a flexible covering about a frame is also provided.

Abstract: A clip for retaining a cover to a partition frame member of the type having openings on opposite side faces. The clip includes an elongated flexible member having a U-shape defining a base portion and a pair of arms extending therefrom. Each arm includes an end portion extending inwardly, and having a shape that permits reception of the end portions in openings of a partition frame member to thereby retain the clip on the partition frame in an orientation wherein the base portion is spaced-apart from the partition frame member to permit vertical routing of utility lines along the partition frame member and through the clip.

Abstract: An office panel partition includes a panel frame having at least two uprights and a horizontal structural member rigidly interconnecting the uprights. The panel frame has a first side and a second opposite side, and the panel frame defines at least four apertures on the first side thereof. The partition also includes a cover member having a major planar surface defining an exterior surface of the partition. The cover member includes at least four projections that are removably insertable into the at least four apertures to removably secure the cover member to the frame. The apertures are arranged in at least two vertically spaced horizontal rows and at least two horizontally spaced vertical columns. The apertures in a first one of the columns have different horizontal dimensions than those of the apertures located in the other of the columns. Each of the projections has a range of lateral positions when inserted into a respective one of the apertures.

Abstract: Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the endpoint of the removal process can be determined.

Abstract: A partition system includes an internally-open partition frame having permanent and removable frame members forming multiple vertical and horizontal wireways, with both lay-in and feed-through wire routing. Utility support brackets are attachable for good wire management. The partition frame supports a wide variety of customizable and functional surface components, including a markerboard wall surface, a slatwall, a colored/covered wall surface, a wall surface including utility outlets, a transparent window. The partition frame includes continuous horizontal and vertical rows of slots that flexibly and adjustably support furniture accessories, such as a worksurface, at selected heights and locations along the partition system. Covers are provided that maintain a very high-quality appearance with uniform lines and gaps. Some covers include adjustable edge-mounted light seals for eliminating light leaks and unsightly areas.

Abstract: An office panel partition includes a panel frame having at least two uprights and a horizontal structural member rigidly interconnecting the uprights. The panel frame has a first side and a second opposite side, and the panel frame defines at least four apertures on the first side thereof. The partition also includes a cover member having a major planar surface defining an exterior surface of the partition. The cover member includes at least four projections that are removably insertable into the at least four apertures to removably secure the cover member to the frame. The apertures are arranged in at least two vertically spaced horizontal rows and at least two horizontally spaced vertical columns. The apertures in a first one of the columns have different horizontal dimensions than those of the apertures located in the other of the columns. Each of the projections has a range of lateral positions when inserted into a respective one of the apertures.

Abstract: An office panel partition includes a panel frame having at least two uprights and a horizontal structural member rigidly interconnecting the uprights. The panel frame has a first side and a second opposite side, and the panel frame defines at least four apertures on the first side thereof. The partition also includes a cover member having a major planar surface defining an exterior surface of the partition. The cover member includes at least four projections that are removably insertable into the at least four apertures to removably secure the cover member to the frame. The apertures are arranged in at least two vertically spaced horizontal rows and at least two horizontally spaced vertical columns. The apertures in a first one of the columns have different horizontal dimensions than those of the apertures located in the other of the columns. Each of the projections has a range of lateral positions when inserted into a respective one of the apertures.

Abstract: A window assembly for installation across at least a portion of an opening through a partition frame. The window assembly includes a sheet of light-transmitting material defining opposite edges. Side members are disposed on the opposite side edges, and telescope relative to one another. At least one of the side members includes a connector for securing the window assembly to the partition frame. The connector engages the partition frame upon telescoping of the side members to secure the window to the partition frame.

Abstract: The etching of a material in a vapor phase etchant is disclosed where a vapor phase etchant is provided to an etching chamber at a total gas pressure of 10 Torr or more, preferably 20 Torr or even 200 Torr or more. The vapor phase etchant can be gaseous acid etchant, a noble gas halide or an interhalogen. The sample/workpiece that is etched can be, for example, a semiconductor device or MEMS device, etc. The material that is etched/removed by the vapor phase etchant is preferably silicon and the vapor phase etchant is preferably provided along with one or more diluents. Another feature of the etching system includes the ability to accurately determine the end point of the etch step, such as by creating an impedance at the exit of the etching chamber (or downstream thereof) so that when the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined.

Abstract: The etching of a sacrificial silicon portion in a microstructure such as a microelectromechanical structure by the use of etchant gases that are noble gas fluorides or halogen fluorides is performed with greater selectivity toward the silicon portion relative to other portions of the microstructure by slowing the etch rate. The etch rate is preferably 30 um/hr or less, and can be 3 um/hr or even less. The selectivity is also improved by the addition of non-etchant gaseous additives to the etchant gas. Preferably the non-etchant gaseous additives that have a molar-averaged formula weight that is below that of molecular nitrogen offer significant advantages over gaseous additives of higher formula weights by causing completion of the etch in a shorter period of time while still achieving the same improvement in selectivity. The etch process is also enhanced by the ability to accurately determine the end point of the removal step.

Abstract: A frame construction for an office partition panel system includes a pair of spaced-apart generally upright posts, and at least one generally horizontal member extending between and rigidly interconnecting the upright posts. The upright posts defme substantially parallel planes separated by a thickness of the upright posts, and the generally horizontal member lies between the parallel planes and has a thickness which is less than the thickness of the upright posts to permit vertical routing of utility lines.