Patents by Inventor Douglas Charles LaTulipe, Jr.

Douglas Charles LaTulipe, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation sensitive silicon-containing resists
    Patent number: 6344305
    Abstract: A high-performance radiation sensitive silicon-containing negative-tone resist is provided along with a method of using the silicon-containing resist in multilayer, including bilayer, imaging for manufacturing semiconductor devices. The negative-tone silicon-containing resist is based on an acid catalyzed high-contrast crosslinking of aqueous base soluble silicon-containing phenolic polymers through reaction of a carbocation of the crosslinking agent with the hydroxyl site of the phenolic group in the silicon-containing polymers. A chemically amplified silicon-containing negative-tone resist composition comprising said silicon-containing polymer resin; at least one crosslinking agent; one acid generator; and a solvent is provided. The silicon-containing resist composition has high silicon content and provide excellent resolution and a means of patterning high aspect ratio resist patterns.
    Type: Grant
    Filed: September 1, 2000
    Date of Patent: February 5, 2002
    Assignee: International Business Machines Corporation
    Inventors: Qinghuang Lin, Ahmad D. Katnani, Douglas Charles LaTulipe, Jr., David E. Seeger, William Ross Brunsvold, Ali Afzali-Ardakani
  • Radiation sensitive silicon-containing resists
    Patent number: 6187505
    Abstract: A high-performance radiation sensitive silicon-containing negative-tone resist is provided along with a method of using the silicon-containing resist in multilayer, including bilayer, imaging for manufacturing semiconductor devices. The negative-tone silicon-containing resist is based on an acid catalyzed high-contrast crosslinking of aqueous base soluble silicon-containing phenolic polymers through reaction of a carbocation of the crosslinking agent with the hydroxyl site of the phenolic group in the silicon-containing polymers. A chemically amplified silicon-containing negative-tone resist composition comprising said silicon-containing polymer resin; at least one crosslinking agent; one acid generator; and a solvent is provided. The silicon-containing resist composition has high silicon content and provide excellent resolution and a means of patterning high aspect ratio resist patterns.
    Type: Grant
    Filed: February 2, 1999
    Date of Patent: February 13, 2001
    Assignee: International Business Machines Corporation
    Inventors: Qinghuang Lin, Ahmad D. Katnani, Douglas Charles LaTulipe, Jr., David E. Seeger, William Ross Brunsvold, Ali Afzali-Ardakani