Patents by Inventor Douglas Edwin Ward

Douglas Edwin Ward has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Oxidizing fluid for the chemical-mechanical polishing of ceramic materials
    Patent number: 10655035
    Abstract: The present disclosure is directed to a fluid composition that can be used in chemical-mechanical polishing processes of inorganic material. The fluid composition can include at least one oxidizing agent and a multivalent cation component. Using the fluid composition during a chemical-mechanical polishing process can facilitate a relatively defect free material surface after polishing while achieving a suitable material removal rate.
    Type: Grant
    Filed: May 24, 2018
    Date of Patent: May 19, 2020
    Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Douglas Edwin Ward, Jason A. Sherlock, Angela Wamina Kwapong
  • OXIDIZING FLUID FOR THE CHEMICAL-MECHANICAL POLISHING OF CERAMIC MATERIALS
    Publication number: 20180340095
    Abstract: The present disclosure is directed to a fluid composition that can be used in chemical-mechanical polishing processes of inorganic material. The fluid composition can include at least one oxidizing agent and a multivalent cation component. Using the fluid composition during a chemical-mechanical polishing process can facilitate a relatively defect free material surface after polishing while achieving a suitable material removal rate.
    Type: Application
    Filed: May 24, 2018
    Publication date: November 29, 2018
    Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Douglas Edwin WARD, Jason A. SHERLOCK, Angela Wamina KWAPONG
  • CMP formulations
    Publication number: 20050279030
    Abstract: CMP formulations for use on nickel/phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.
    Type: Application
    Filed: August 5, 2005
    Publication date: December 22, 2005
    Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Douglas Edwin Ward, David Peter Solomos
  • Chemical mechanical polishing of nickel phosphorous alloys
    Patent number: 6755721
    Abstract: CMP formulations for use on nickel/phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.
    Type: Grant
    Filed: February 22, 2002
    Date of Patent: June 29, 2004
    Assignee: Saint-Gobain Ceramics and Plastics, Inc.
    Inventors: Douglas Edwin Ward, David Peter Solomos
  • Improved chemical mechanical polishing of nickel phoshorous alloys
    Publication number: 20030171072
    Abstract: CMP formulations for use on nickel/phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.
    Type: Application
    Filed: February 22, 2002
    Publication date: September 11, 2003
    Inventors: Douglas Edwin Ward, David Peter Solomos