Abstract: Containers including internal mixers and actuators assemblies and related methods are generally described. In some embodiments, a container may include a mixer and an actuator, at least one of which may be located inside of the container. The actuator may actuate the mixer to induce flow within the container and mix the contents of the container with a low volumetric footprint and high mixing efficiency. In some embodiments, the actuator may be configured to deform the mixer, which may include one or more features which may be deformed out of plane in a Kirigami or Origami fashion. The actuator and mixer may be arranged in series or in parallel. The actuator may be used without a mixer to induce flow within the container. The actuator may be driven pneumatically, hydraulically, electrically, and/or in any other suitable manner.

Abstract: Kirigami mixing systems and related methods are generally described. In some embodiments, a mixing system includes one or more grippers configured to deform a portion of a flexible container containing fluid when undergoing axial deformation. The grippers may include features including slots, hinges, and spines to aid in the transition of the grippers between a closed and retracted configuration when the one or more grippers are deformed. The compression of the container subsequently result in fluid flow within the container which may mix or agitate the fluid. In some embodiments, the described grippers may be formed integrally with the flexible containers. In some embodiments, the mixing system may include a plurality of grippers arranged around the flexible container.

Abstract: Valves, systems, articles, and methods for controlling fluid flow are generally described. According to some aspects, valves that can move between an open configuration and a closed configuration in response to a change in magnetic field and/or voltage potential are provided. According to certain aspects, valves comprising elastic diaphragms comprising magnetic materials (e.g., an elastic composite material including magnetic nanoparticles or other magnetic materials dispersed in a matrix) and/or electroactive polymers are provided. In some aspects, magnetically actuated systems and/or voltage potential actuated systems comprising elastomeric valves are described. In some embodiments, valves and systems described herein are useful for liquid handling, dosing, and regulation of fluid flow, though embodiments in which the disclosed valves are used in different applications are also contemplated.

Abstract: A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

Abstract: The present invention relates to dilute aqueous solutions containing phosphoric acid and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The solution according to the invention may advantageous contain an alkaline compound, one or more other acid compounds, and/or a fluoride-containing compound and may optionally contain additional components such as organic solvents, chelating agents, amines, and/or surfactants.

Abstract: A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: R1 and R3 are each independently selected from H, OH, CO2H, halogen, C1–C3 alkyl, C1–C3 alkoxy or (CH2)nOH wherein n is 1, 2 or 3; and R2 is selected from C9–C16 alkyl, or C9–C16 alkoxy

Abstract: A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

Abstract: A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

Abstract: The present invention relates to dilute aqueous solutions containing phosphoric acid and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The solution according to the invention may advantageous contain an alkaline compound, one or more other acid compounds, and/or a fluoride-containing compound and may optionally contain additional components such as organic solvents, chelating agents, amines, and/or surfactants.

Abstract: A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: R1 and R3 are each independently selected from H, OH, CO2H, halogen, C1-C3 alkyl, C1-C3 alkoxy or (CH2)nOH wherein n is 1, 2 or 3; and R2 is selected from C9-C16 alkyl, or C9-C16 alkoxy.

Abstract: A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

Abstract: A linear accelerator drift tube is formed by a casting technique. Coolant circualting grooves are integrally formed in the central body of the drift tube as well as face plates. This minimizes the temperature of the drift tube in an operating environment thereby maximizing the R.F. efficiency of the unit. The face plates are attached to the central body of the drift tube by means of a solder/electroform joining. The stem of the drift tube includes concentric passages integrally formed in the cast central body which enables efficient circulation of coolant through the drift tube.

Abstract: A first embodiment of an ammunition clip reloading device comprises an L-shaped member attachable to the pin associated with the spring of a conventional clip. An outwardly extending portion of the member is designed to receive the thumb of a user so as to depress the clip spring to thus make the loading of ammunition substantially easier. A second embodiment of the invention comprises a thumb manipulated slide member positionable over a conventional ammunition clip. An adjustable guide extends above the body portion of the member and is operable to push a bullet into the clip in response to a downward pressure by the user's thumb.