Patents by Inventor Douglas Holmgren

Douglas Holmgren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6724002
    Abstract: An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.
    Type: Grant
    Filed: January 22, 2002
    Date of Patent: April 20, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Marian Mankos, Steven T. Coyle, Andres Fernandez, Allan L. Sagle, Paul C. Allen, Xiaolan Chen, Douglas Holmgren, Windsor Owens, Jeffrey Sullivan, Tim Thomas, Mark A. Gesley
  • Publication number: 20030042434
    Abstract: An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.
    Type: Application
    Filed: January 22, 2002
    Publication date: March 6, 2003
    Inventors: Marian Mankos, Steven T. Coyle, Andres Fernandez, Allan L. Sagle, Paul C. Allen, Xiaolan Chen, Douglas Holmgren, Windsor Owens, Jeffrey Sullivan, Tim Thomas, Mark A. Gesley