Patents by Inventor Douglas O. Powell

Douglas O. Powell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10685919
    Abstract: A laminate structure includes a conductive layer and a dielectric layer in contact with the conductive layer, the dielectric layer comprises a selectively patterned high-modulus dielectric material that balances a differential stress between the conductive layer and the dielectric layer to mechanically stiffen the laminate structure and reduce warpage.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: June 16, 2020
    Assignee: International Business Machines Corporation
    Inventors: Mark C. Lamorey, Shidong Li, Janak G. Patel, Douglas O. Powell, David J. Russell, Peter Slota, Jr., David B. Stone
  • Publication number: 20170148749
    Abstract: A laminate structure includes a conductive layer and a dielectric layer in contact with the conductive layer, the dielectric layer comprises a selectively patterned high-modulus dielectric material that balances a differential stress between the conductive layer and the dielectric layer to mechanically stiffen the laminate structure and reduce warpage.
    Type: Application
    Filed: February 7, 2017
    Publication date: May 25, 2017
    Inventors: Mark C. Lamorey, Shidong Li, Janak G. Patel, Douglas O. Powell, David J. Russell, Peter Slota, JR., David B. Stone
  • Patent number: 9613915
    Abstract: A laminate structure includes a conductive layer and a dielectric layer in contact with the conductive layer, the dielectric layer comprises a selectively patterned high-modulus dielectric material that balances a differential stress between the conductive layer and the dielectric layer to mechanically stiffen the laminate structure and reduce warpage.
    Type: Grant
    Filed: December 2, 2014
    Date of Patent: April 4, 2017
    Assignee: International Business Machines Corporation
    Inventors: Mark C. Lamorey, Shidong Li, Janak G. Patel, Douglas O. Powell, David J. Russell, Peter Slota, Jr., David B. Stone
  • Patent number: 9543255
    Abstract: A laminate structure includes a conductive layer and a dielectric layer in contact with the conductive layer, the dielectric layer comprises a selectively patterned high-modulus dielectric material that balances a differential stress between the conductive layer and the dielectric layer to mechanically stiffen the laminate structure and reduce warpage.
    Type: Grant
    Filed: February 15, 2016
    Date of Patent: January 10, 2017
    Assignee: International Business Machines Corporation
    Inventors: Mark C. Lamorey, Shidong Li, Janak G. Patel, Douglas O. Powell, David J. Russell, Peter Slota, Jr., David B. Stone
  • Patent number: 9484239
    Abstract: Mechanisms are provided for sacrificial carrier dicing of semiconductor wafers. A bottom layer of a semiconductor wafer is bonded to a top layer of a sacrificial carrier. The semiconductor wafer is diced into a set of chips, such that the dicing cuts through the semiconductor wafer and into the sacrificial carrier and such that the sacrificial carrier dresses a diamond blade of a saw so as to expose one or more new, sharp layers of diamonds on the diamond blade.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: November 1, 2016
    Assignee: International Business Machines Corporation
    Inventors: Richard S. Graf, Douglas O. Powell, David J. Russell, David J. West
  • Patent number: 9478453
    Abstract: Mechanisms are provided for sacrificial carrier dicing of semiconductor wafers. A bottom layer of a semiconductor wafer is bonded to a top layer of a sacrificial carrier. The semiconductor wafer is diced into a set of chips, such that the dicing cuts through the semiconductor wafer and into the sacrificial carrier and such that the sacrificial carrier dresses a diamond blade of a saw so as to expose one or more new, sharp layers of diamonds on the diamond blade.
    Type: Grant
    Filed: September 17, 2014
    Date of Patent: October 25, 2016
    Assignee: International Business Machines Corporation
    Inventors: Richard S. Graf, Douglas O. Powell, David J. Russell, David J. West
  • Publication number: 20160155708
    Abstract: A laminate structure includes a conductive layer and a dielectric layer in contact with the conductive layer, the dielectric layer comprises a selectively patterned high-modulus dielectric material that balances a differential stress between the conductive layer and the dielectric layer to mechanically stiffen the laminate structure and reduce warpage.
    Type: Application
    Filed: December 2, 2014
    Publication date: June 2, 2016
    Inventors: Mark C. Lamorey, Shidong Li, Janak G. Patel, Douglas O. Powell, David J. Russell, Peter Slota, JR., David B. Stone
  • Publication number: 20160157357
    Abstract: A laminate structure includes a conductive layer and a dielectric layer in contact with the conductive layer, the dielectric layer comprises a selectively patterned high-modulus dielectric material that balances a differential stress between the conductive layer and the dielectric layer to mechanically stiffen the laminate structure and reduce warpage.
    Type: Application
    Filed: February 15, 2016
    Publication date: June 2, 2016
    Inventors: Mark C. Lamorey, Shidong Li, Janak G. Patel, Douglas O. Powell, David J. Russell, Peter Slota, JR., David B. Stone
  • Publication number: 20160079111
    Abstract: Mechanisms are provided for sacrificial carrier dicing of semiconductor wafers. A bottom layer of a semiconductor wafer is bonded to a top layer of a sacrificial carrier. The semiconductor wafer is diced into a set of chips, such that the dicing cuts through the semiconductor wafer and into the sacrificial carrier and such that the sacrificial carrier dresses a diamond blade of a saw so as to expose one or more new, sharp layers of diamonds on the diamond blade.
    Type: Application
    Filed: September 18, 2015
    Publication date: March 17, 2016
    Inventors: Richard S. Graf, Douglas O. Powell, David J. Russell, David J. West
  • Publication number: 20160079117
    Abstract: Mechanisms are provided for sacrificial carrier dicing of semiconductor wafers. A bottom layer of a semiconductor wafer is bonded to a top layer of a sacrificial carrier. The semiconductor wafer is diced into a set of chips, such that the dicing cuts through the semiconductor wafer and into the sacrificial carrier and such that the sacrificial carrier dresses a diamond blade of a saw so as to expose one or more new, sharp layers of diamonds on the diamond blade.
    Type: Application
    Filed: September 17, 2014
    Publication date: March 17, 2016
    Inventors: Richard S. Graf, Douglas O. Powell, David J. Russell, David J. West
  • Patent number: 9099458
    Abstract: A stacked via structure for reducing vertical stiffness includes: a plurality of stacked vias, each via disposed on a disc-like structure. The disc-like structure includes a platted through hole landing supporting the plurality of stacked vias. The platted through hole landing includes an etched pattern.
    Type: Grant
    Filed: July 1, 2012
    Date of Patent: August 4, 2015
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Karan Kacker, Douglas O. Powell, David L. Questad, David J. Russell, Sri M. Sri-Jayantha
  • Patent number: 8866026
    Abstract: A stacked via structure for reducing vertical stiffness includes: a plurality of stacked vias, each via disposed on a disc-like structure. The disc-like structure includes a platted through hole landing with a thickness of substantially 3 ?m. The platted through hole landing includes an etched pattern and a copper top surface.
    Type: Grant
    Filed: August 8, 2012
    Date of Patent: October 21, 2014
    Assignee: International Business Machines Corporation
    Inventors: Karan Kacker, Douglas O. Powell, David L. Questad, David J. Russell, Sri M. Sri-Jayantha
  • Patent number: 8791372
    Abstract: A device and/or apparatus having plated through holes (PTHs) which are coated to reduce impedance discontinuity in electronic packages. PTH vias are imbedded in the core of a printed circuit board comprising a core layer, a plurality of buildup layers, a plurality of micro-vias, and a plurality of traces. Traces electrically interconnect each of the micro-vias to PTH vias, forming an electrically conductive path. PTHs are coated with a magnetic metal material, such as nickel, to increase the internal and external conductance of the PTHs, thereby providing decreased impedance discontinuity of the signals in electronic packages.
    Type: Grant
    Filed: March 22, 2012
    Date of Patent: July 29, 2014
    Assignee: International Business Machines Corporation
    Inventors: Paul M. Harvey, Douglas O. Powell, Wolfgang Sauter, Yaping Zhou
  • Patent number: 8756546
    Abstract: A computer-implemented method provides an elastic modulus map of a chip carrier of a flip chip package. Design data including dielectric and conductive design elements of each of vertically aligned sub-areas of each of the layers of the chip carrier are modeled as springs to provide the elastic modulus map. Determining the elastic modulus of the sub-areas of the chip carrier identifies probable mechanical failure sites during chip-join and cools down of the flip chip package. Modifying a footprint of solder bumps to the chip carrier reduces stresses applied to the identified probable mechanical failure sites. Modifying the chip carrier design to reduce a stiffness of sub-areas associated with identified probable mechanical failure sites also reduces stresses from chip-join and cool-down.
    Type: Grant
    Filed: July 25, 2012
    Date of Patent: June 17, 2014
    Assignee: International Business Machines Corporation
    Inventors: Erwin B. Cohen, Mark C. H. Lamorey, Marek A. Orlowski, Douglas O. Powell, David L. Questad, David B. Stone, Paul R. Walling
  • Publication number: 20140033148
    Abstract: A computer-implemented method provides an elastic modulus map of a chip carrier of a flip chip package. Design data including dielectric and conductive design elements of each of vertically aligned sub-areas of each of the layers of the chip carrier are modeled as springs to provide the elastic modulus map. Determining the elastic modulus of the sub-areas of the chip carrier identifies probable mechanical failure sites during chip-join and cools down of the flip chip package. Modifying a footprint of solder bumps to the chip carrier reduces stresses applied to the identified probable mechanical failure sites. Modifying the chip carrier design to reduce a stiffness of sub-areas associated with identified probable mechanical failure sites also reduces stresses from chip-join and cool-down.
    Type: Application
    Filed: July 25, 2012
    Publication date: January 30, 2014
    Applicant: International Business Machines Corporation
    Inventors: Erwin B. Cohen, Mark C.H. Lamorey, Marek A. Orlowski, Douglas O. Powell, David L. Questad, David B. Stone, Paul R. Walling
  • Patent number: 8522430
    Abstract: A method of fabricating a substrate via structure in a substrate/chip assembly includes steps of: disposing a center via stack for electrical interconnects in the substrate/chip assembly; and providing a plurality of stacked vias surrounding the center via stack. The plurality of stacked vias encircle the center via stack, resulting in no isolated via stacks on the structure. The plurality of stacked vias have both functional and non-functional vias.
    Type: Grant
    Filed: July 14, 2012
    Date of Patent: September 3, 2013
    Assignee: International Business Macines Corporation
    Inventors: Karan Kacker, Douglas O. Powell, David L. Questad, David J. Russell, Sri M. Sri-Jayantha
  • Patent number: 8440917
    Abstract: A method, system and apparatus for coating plated through holes (PTHs) to reduce impedance discontinuity in electronic packages. PTH vias are imbedded in the core of a printed circuit board comprising a core layer, a plurality of buildup layers, a plurality of micro-vias, and a plurality of traces. Traces electrically interconnect each of the micro-vias to PTH vias, forming an electrically conductive path. PTHs are coated with a magnetic metal material, such as nickel, to increase the internal and external conductance of the PTHs, thereby providing decreased impedance discontinuity of the signals in electronic packages.
    Type: Grant
    Filed: November 19, 2007
    Date of Patent: May 14, 2013
    Assignee: International Business Machines Corporation
    Inventors: Paul M. Harvey, Douglas O. Powell, Wolfgang Sauter, Yaping Zhou
  • Publication number: 20130075148
    Abstract: A device and/or apparatus having plated through holes (PTHs) which are coated to reduce impedance discontinuity in electronic packages. PTH vias are imbedded in the core of a printed circuit board comprising a core layer, a plurality of buildup layers, a plurality of micro-vias, and a plurality of traces. Traces electrically interconnect each of the micro-vias to PTH vias, forming an electrically conductive path. PTHs are coated with a magnetic metal material, such as nickel, to increase the internal and external conductance of the PTHs, thereby providing decreased impedance discontinuity of the signals in electronic packages.
    Type: Application
    Filed: March 22, 2012
    Publication date: March 28, 2013
    Applicant: IBM CORPORATION
    Inventors: Paul M. Harvey, Douglas O. Powell, Wolfgang Sauter, Yaping Zhou
  • Publication number: 20120299195
    Abstract: A stacked via structure for reducing vertical stiffness includes: a plurality of stacked vias, each via disposed on a disc-like structure. The disc-like structure includes a platted through hole landing with a thickness of substantially 3 ?m. The platted through hole landing includes an etched pattern and a copper top surface.
    Type: Application
    Filed: August 8, 2012
    Publication date: November 29, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Karan Kacker, Douglas O. Powell, David L. Questad, David J. Russell, Sri M. Sri-Jayantha
  • Publication number: 20120279061
    Abstract: A method of fabricating a substrate via structure in a substrate/chip assembly includes steps of: disposing a center via stack for electrical interconnects in the substrate/chip assembly; and providing a plurality of stacked vias surrounding the center via stack. The plurality of stacked vias encircle the center via stack, resulting in no isolated via stacks on the structure. The plurality of stacked vias have both functional and non-functional vias.
    Type: Application
    Filed: July 14, 2012
    Publication date: November 8, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Karan Kacker, Douglas O. Powell, David L. Questad, David J. Russell, Sri M. Sri-Jayantha