Abstract: Disclosed is a high-performance, RF-capable MIM capacitor structure and process for the manufacture thereof, which are compatible with discrete or integrated processes. The invention is compatible with standard semiconductor processing techniques and provides increased capacitance per unit area for a wide variety of capacitor requirements. The invention exploits vertical dimensions, reduces the chip area required for capacitors, and facilitates the use of advanced materials, such as high-k dielectric materials.

Abstract: A SRAM cell includes double-gated PMOS and NMOS transistors to form a latch and retain a value. The unique MOSFET transistor architecture provides a four terminal device for independent gate control, a floating body device, and a dynamic threshold device. The channel may have a U-shaped cross-sectional area to increase the channel length and gate control. First and second insulating spacers are disposed on opposing sides of the top gate such that the first spacer is between the source and the top gate, and the second spacer is between the drain and the top gate. The source and drain include extensions that extend proximate to the spacers and couple to the channel. The spacers shield the channel from the field effect of the source and drain, and further resist compression of the channel by the source and drain.