Abstract: A solar energy system (55) has aspects that can allow individualized control and analysis for overall field power control that can be used while harvesting maximum power from a solar energy source (1) and a string of solar panels (11) for a power grid (10). The invention provides control of power at high efficiency with aspects that can exist independently including: 1) power management with switch disconnect control (64), 2) sequenced start of a solar power system, 3) providing a safety output system that can be handled by installers and maintenance and advantageously controlled, 4) providing programmable power functionality controller (86) either on site or remotely from an administrative facility by radio transmission individual solar panel disconnect control (85), 5) a system with pattern analyzer (87) for operational, installation, and maintenance indications, and 6) systems with individual solar panel string power simulator (89) for disparate components.

Abstract: A solar energy system (55) has aspects that can allow individualized control and analysis for overall field power control that can be used while harvesting maximum power from a solar energy source (1) and a string of solar panels (11) for a power grid (10). The invention provides control of power at high efficiency with aspects that can exist independently including: 1) power management with switch disconnect control (64), 2) sequenced start of a solar power system, 3) providing a safety output system that can be handled by installers and maintenance and advantageously controlled, 4) providing programmable power functionality controller (86) either on site or remotely from an administrative facility by radio transmission individual solar panel disconnect control (85), 5) a system with pattern analyzer (87) for operational, installation, and maintenance indications, and 6) systems with individual solar panel string power simulator (89) for disparate components.

Abstract: An induction heating systems using a plurality of zones in a coil provides selective heating control for better uniformity especially for semiconductor and other thin film processing applications. By arranging the zones to have different resonance frequencies, the power supply may control the various zones by altering its frequency output. The power supply may also act to control the differential heating by switching among zones in conjunction with the frequency control, by sweeping through a variety of frequencies, by simultaneously providing power over different frequencies, by altering the residence time at each frequency, or by outputting different powers to each frequency or the like. Each zone may thus be tuned as appropriate to achieve the desired induction heating characteristic.

Abstract: A method and an apparatus are disclosed for sputter deposition of an insulating material on a substrate in a continuous mode of operation. A novel design for an anode assembly and driving power supply is disclosed to permit this. Single or multiple anodes are used, which at any given time may be biased negatively with respect to the plasma, so that any insulating material which may have been deposited thereupon may be sputtered away so as to provide a clean positive anode to the system, and at least for some period of time is biased positively so that it acts as an anode. The removal of any insulating material which may have formed on the anode structure permits its continuing effective use in collecting electrons from the plasma when it is biased positively, and therefore its continuing effective use as an anode for the system, permitting continuous operation of the system.

Abstract: A structure and method are disclosed which allow for a tighter control of the temperature across a wafer substrate. In accordance with the present invention, a wafer to be processed is heated to a constant and uniform temperature by an RF induction coil including a plurality of heating zones each of which being shunted by an associated capacitor tuned to a specific frequency. By adjusting the time during which current of a particular frequency is provided to the induction coil, current flow within, and thus the heat generated in, each of the zones may be independently controlled. Since the heat generated in the susceptor quickly changes in response to changes in current flow therein, both deviations of the wafer temperature from the processing temperature and temperature gradients across the surface of the wafer may be quickly corrected. This superior thermal response results in the present invention maintaining a wafer at a uniform temperature during heating and cooling with increased accuracy and precision.

Abstract: A method and an apparatus are disclosed for sputter deposition of an insulating material on a substrate in a continuous mode of operation. A novel design for an anode assembly and driving power supply is disclosed to permit this. Single or multiple anodes are used, which at any given time may be biased negatively with respect to the plasma, so that any insulating material which may have been deposited thereupon may be sputtered away so as to provide a clean positive anode to the system, and at least for some period of time is biased positively so that it acts as an anode. The removal of any insulating material which may have formed on the anode structure permits its continuing effective use in collecting electrons from the plasma when it is biased positively, and therefore its continuing effective use as an anode for the system, permitting continuous operation of the system.

Abstract: Techniques for removing an electrical short caused by a flake in a thin film sputtering system are disclosed. The flake typically bridges the dark space between target and anode or shield and is removed through manipulation of the power supply utilized for normal operations. Sensing of the flake and discrimination between recoverable arcs is accomplished by timing the duration of an over-current condition. Removal involves switching between power mode or some other initial mode of regulation and current modes and progressively increasing current to melt the flake. Circuitry automatically removes the flake and is easily adapted to power supplies particularly more sophisticated, high frequency, lower energy storage DC supplies.

Abstract: Techniques for removing an electrical short caused by a flake in a thin film sputtering system are disclosed. The flake typically bridges the dark space between target and anode or shield and is removed through manipulation of the power supply utilized for normal operations. Sensing of the flake and discrimination between recoverable arcs is accomplished by timing the duration of an over-current condition. Removal involves switching between power mode or some other initial mode of regulation and current modes and progressively increasing current to melt the flake. Circuitry automatically removes the flake and is easily adapted to power supplies particularly more sophisticated, high frequency, lower energy storage DC supplies.

Abstract: Techniques for recovery from a low impedance conditions during cathodic arc or electric vapor thin film processes are disclosed. Sensing of a low impedance condition is achieved followed automatically by active clearing of the cloud to return it to the proper impedance or resistance state. Active clearing is accomplished by a progressive increase in the output of bias voltage supply. Regulation of the bias voltage supply switches between voltage or power modes and a current mode of regulation. Circuitry disclosed is designed to readily modify existing power supplies to achieve the methods discussed and to linearly increase the current output by it.

Abstract: In a transformer power supply, a full wave rectifier is series connected in circuit with the primary winding of the transformer such that the current flowing through the primary winding of the transformer flows in series through the input of the full wave rectifier. An inductive load is connected across the output terminals of the full wave rectifier such that the rectified output current flows through the inductive load. The full wave rectifier preferably uses silicon controlled rectifiers which are phase triggered in such a manner so as to control their conduction angles so as to control the power flow from the source to the load connected to the secondary of the transformer. The inductance of the load for the rectifier preferably exceeds the critical inductance so as to minimize ripples in the secondary of the transformer. This type of power supply circuit is particularly useful for supplying power to an electron gun which is subject to arcing.

Abstract: Transmission line for RF power utilizing generally flat supply and return lines each comprising a plurality of flexible, insulated conductors connected together at their ends. The two lines are enclosed in a flexible sheath which holds the lines in close proximity to each other, and fields produced by the lines tend to cancel each other.

Abstract: Induction heated vapor source particularly suitable for vacuum deposition of thin films utililzing a flat wound work coil fabricated of a solid conductor enclosed in a hermetically sealed chamber. A cooling medium is circulated through the chamber about the coil, and the coolant is passed to and from the chamber through fittings which also serve to carry electric power to the coil. A crucible for holding the material to be vaporized is mounted on an adjustable pedestal outside the sealed chamber in the field produced by the coil.