Abstract: A computer-implemented method of determining a position of a vehicle within a transport network comprises obtaining track geometry data indicating track geometry of at least a part of the transport network; receiving first sensor data from an inertial measurement unit mounted to the vehicle; executing a Bayesian estimation filter algorithm to predict a position of the vehicle, wherein the Bayesian estimation filter algorithm comprises a process model, the process model comprising a strapdown inertial navigation algorithm, and wherein the strapdown inertial navigation algorithm generates data indicative of the predicted position of the vehicle based at least upon the first sensor data and the track geometry data such that the predicted position of the vehicle lies on a track defined by the track geometry data; receiving second sensor data from a sensor other than an inertial measurement unit, wherein the sensor is mounted to the vehicle; executing the Bayesian estimation filter algorithm to update the predicte

Abstract: A computer-implemented method of determining a position of a vehicle 10 within a transport network comprises: obtaining track geometry data indicating track geometry of at least a part of the transport network; determining, based upon the track geometry data, that the vehicle is approaching a junction; determining, based upon the track geometry data, a plurality of route options from the junction; generating a plurality of Bayesian estimation filter algorithms each associated with a respective one of the plurality of route options and configured to estimate a position of the vehicle based upon the track geometry data indicative of the associated route option, wherein the plurality of Bayesian estimation filter algorithms are configured to output data indicative of probabilities of the vehicle taking the associated route options; monitoring the output of the plurality of Bayesian estimation filter algorithms as the vehicle passes through the junction; and determining the route option taken by the vehicle by se

Abstract: A computer-implemented method of determining a position of a vehicle within a transport network comprises obtaining track geometry data indicating track geometry of at least a part of the transport network; receiving first sensor data from an inertial measurement unit mounted to the vehicle; executing a Bayesian estimation filter algorithm to predict a position of the vehicle, wherein the Bayesian estimation filter algorithm comprises a process model, the process model comprising a strapdown inertial navigation algorithm, and wherein the strapdown inertial navigation algorithm generates data indicative of the predicted position of the vehicle based at least upon the first sensor data and the track geometry data such that the predicted position of the vehicle lies on a track defined by the track geometry data; receiving second sensor data from a sensor other than an inertial measurement unit, wherein the sensor is mounted to the vehicle; executing the Bayesian estimation filter algorithm to update the predicte

Abstract: A computer-implemented method of determining a position of a vehicle 10 within a transport network comprises: obtaining track geometry data indicating track geometry of at least a part of the transport network; determining, based upon the track geometry data, that the vehicle is approaching a junction; determining, based upon the track geometry data, a plurality of route options from the junction; generating a plurality of Bayesian estimation filter algorithms each associated with a respective one of the plurality of route options and configured to estimate a position of the vehicle based upon the track geometry data indicative of the associated route option, wherein the plurality of Bayesian estimation filter algorithms are configured to output data indicative of probabilities of the vehicle taking the associated route options; monitoring the output of the plurality of Bayesian estimation filter algorithms as the vehicle passes through the junction; and determining the route option taken by the vehicle by se

Abstract: An item finder system for situating in a retail environment for the purpose of assisting customers to find the items they wish to find has a touch-sensitive display screen. Customers enter the name of the sought item by touching letters displayed on the touch-sensitive surface which then displays a list of item names from what the customer can choose. An item name is selected from the list by touching a graphical symbol associated with the item name. The item finder system responds to the customer's touch by displaying a floor plan or layout of at least part of the store, a marker symbol representing the location of the item, for example, a section of shelf space that contains the item, and a path line extending from the customer's present location, i.e., the location of the touch-sensitive screen, to the location of the item in the store.

Abstract: A liquid immersion exposure apparatus includes an optical system via which a substrate is exposed with an exposure beam, and a cleaning device which performs a cleaning operation by filling a space adjacent the optical system with a liquid including bubbles.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a wick structure member through which a liquid is collected from a surface of an object opposite to the liquid collection member.

Abstract: A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.

Abstract: A stage assembly (18) that moves a work piece (200) includes a stage base (36), a stage (238), and a stage mover assembly (40) that moves the stage (238) relative to the stage base (36). The stage (238) includes a stage housing (244) and a device holder (242). The stage housing (244) is rigid. The device holder (242) selectively secures the work piece (200) to the stage housing (244). The device holder (242) can included one or more support pairs (250) that clamp the work piece (200) there between to couple the work piece (200) to the stage housing (244). The stage (238) can include one or more resilient supports (258) that support the work piece (200). Further, the support pairs (250) can retain the work piece (200) so that a small fluid gap exists between the work piece (200) and the stage (238) so that the work piece (200) experiences squeeze film damping.

Abstract: Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a movable support surface. A proximal region of a first membrane is mounted to the support surface. A distal region of the first membrane extends from the support surface and is coupled to the chuck such that the first membrane at least partially supports the chuck. The chuck includes a surface from which multiple pins extend. The surface is situated at the distal region. The pins are arrayed to contact and support a respective region of the body. The pin arrangement is configured such that, during movements of the chuck imparted by the support surface, body slippage relative to the pins due to forces caused by the movement is substantially uniform at each pin.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

Abstract: An electrically conductive yarn comprises stainless steel fibers with a specific stainless steel electrical resistance. The stainless steel fibers are coated with a metal coating, consisting of a metal material having a specific electrical resistance, smaller than the specific electrical resistance of stainless steel.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a mesh member through which a liquid is collected from a surface of an object opposite to the liquid collection member.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system having a liquid collection member having a liquid-permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member.

Abstract: An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid.

Abstract: An apparatus for rotating apertures from a storage position not in a desired plane to a “in use” position in a desired plane. The stored position of the apertures does not interfere with a radiation beam path of an optical system. The apparatus may compactly store multiple apertures and may position a smaller aperture in a desired plane without removing a larger aperture from the desired plane.

Abstract: Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.

Abstract: A precision assembly (210) for positioning a device (226) includes a stage (260) that retains the device (226), a dual mover assembly (228) that moves the stage (260), and the device (226) along a movement axis (266), a measurement system (222) and a control system (224). The dual mover assembly (228) includes a first mover (262) that moves the stage (260) along the movement axis (266) and a second mover (264) that moves the device (226) along the movement axis (266). The second mover (264) is rigidly coupled to the first mover (262) so that movement of the first mover (262) results in movement of the second mover (264). Further, the total output of the dual mover assembly (228) along the movement axis (266) is equal to the sum of the movement of the first mover (262) and the movement of the second mover (264). The measurement system (222) measures a movement position along the movement axis (266). The control system (224) controls the dual mover assembly (228) utilizing the movement position.

Abstract: An exemplary apparatus for filtering electromagnetic radiation includes a filter element, an actuator, and a filter-cooler. The filter element has multiple selectable regions situated so that electromagnetic radiation impinges on a selected filter region to transmit therethrough a first wavelength while limiting transmission of a second wavelength. Absorption of impinging radiation heats the filter element, but the actuator moves the filter element to select a particular filter region for impingement by the radiation while moving another region away from impingement by the radiation. The filter-cooler directs a heat-conduction medium (e.g., a gas) at, and thus cools, the moved-away region. By such ongoing refreshment of portions of the filter element being irradiated and portions being cooled, the filter element can be irradiated for extended periods without thermal damage. An important use is in optical systems for EUV lithography.

Abstract: A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module coupling with the lithography system is provided for cleaning the objective lens in a non-manual cleaning process.