Abstract: Disclosed herein are a solvent composition and methods of using the solvent composition. The solvent composition includes at least 80 wt. % of trans-1,2-dichloroetheylene (t-DCE), and 0.1 to 20 wt. % of at least one organic compound. The organic compound may be a hydrocarbon and/or an oxygenated solvent. The solvent composition may be used to clean a surface by contacting the surface with the composition to dissolve a contaminant on the surface. The composition may be used to remove a coating from a surface of a substrate by contacting the surface with the solvent composition to dissolve the coating and removing the composition containing the coating from the surface. The composition may also be used to deposit material on a substrate by dissolving the material in the solvent composition, applying the composition containing the material onto the substrate, and evaporating the composition from the substrate.

Abstract: Disclosed herein are solvent compositions and methods of using the solvent compositions. The solvent composition includes at least trans-1,2-dichloroethylene (t-DCE) and 1,1,2,2-tetrafluoroethyl-2,2,3,3-tetrafluoropropyl ether (TFE-TFPE). The solvent composition may also include an oxygenated solvent, such as an alcohol or fluorinated ether. A method of cleaning the surface of an article includes contacting the surface with the solvent composition to dissolve, disperse, or displace a contaminant on the surface, and removing the solvent composition containing the contaminant from the surface.

Abstract: Disclosed herein are a solvent composition and methods of using the solvent composition. The solvent composition includes at least 80 wt. % of trans-1,2-dichloroetheylene (t-DCE), and 0.1 to 20 wt. % of at least one organic compound. The organic compound may be a hydrocarbon and/or an oxygenated solvent. The solvent composition may be used to clean a surface by contacting the surface with the composition to dissolve a contaminant on the surface. The composition may be used to remove a coating from a surface of a substrate by contacting the surface with the solvent composition to dissolve the coating and removing the composition containing the coating from the surface. The composition may also be used to deposit material on a substrate by dissolving the material in the solvent composition, applying the composition containing the material onto the substrate, and evaporating the composition from the substrate.

Abstract: Disclosed herein are a solvent composition and methods of using the solvent composition. The solvent composition includes at least 80 wt. % of trans-1,2-dichloroetheylene (t-DCE), and 0.1 to 20 wt. % of at least one organic compound. The organic compound may be a hydrocarbon and/or an oxygenated solvent. The solvent composition may be used to clean a surface by contacting the surface with the composition to dissolve a contaminant on the surface. The composition may be used to remove a coating from a surface of a substrate by contacting the surface with the solvent composition to dissolve the coating and removing the composition containing the coating from the surface. The composition may also be used to deposit material on a substrate by dissolving the material in the solvent composition, applying the composition containing the material onto the substrate, and evaporating the composition from the substrate.

Abstract: Disclosed herein are a solvent composition and methods of using the solvent composition. The solvent composition includes at least 80 wt. % of trans-1,2-dichloroetheylene (t-DCE), and 0.1 to 20 wt. % of at least one organic compound. The organic compound may be a hydrocarbon and/or an oxygenated solvent. The solvent composition may be used to clean a surface by contacting the surface with the composition to dissolve a contaminant on the surface. The composition may be used to remove a coating from a surface of a substrate by contacting the surface with the solvent composition to dissolve the coating and removing the composition containing the coating from the surface. The composition may also be used to deposit material on a substrate by dissolving the material in the solvent composition, applying the composition containing the material onto the substrate, and evaporating the composition from the substrate.

Abstract: Disclosed herein are solvent compositions and methods of using the solvent compositions. The solvent composition includes at least trans-1,2-dichloroethylene (t-DCE) and 1,1,2,2-tetrafluoroethyl-2,2,3,3-tetrafluoropropyl ether (TFE-TFPE). The solvent composition may also include an oxygenated solvent, such as an alcohol or fluorinated ether. A method of cleaning the surface of an article includes contacting the surface with the solvent composition to dissolve, disperse, or displace a contaminant on the surface, and removing the solvent composition containing the contaminant from the surface.

Abstract: A nonflammable solvent composition, a method of cleaning an article, and a method of depositing a material on a substrate are disclosed. The nonflammable solvent composition includes a fluorocyclopentane in which 3 to 9 hydrogen atoms have each been replaced by a fluorine atom; trans-1,2-dichloroethylene (t-DCE); and at least one organic compound, such as a C2-C6 alcohol, a C1-C6 alkane, and a C3-C6 cycloalkane. Amounts of the fluorocyclopentane, t-DCE, and the organic compound in the nonflammable composition are selected so that the composition is an azeotrope or is azeotrope-like. The method of cleaning an article includes contacting the article with the nonflammable composition via vapor degreasing or wet cleaning. The method of depositing a material on a substrate includes dissolving the material in the nonflammable solvent composition, applying the composition containing the material to the substrate, and evaporating the composition from the substrate.

Abstract: A nonflammable solvent composition, a method of cleaning a surface, and a method of coating a substrate with a material using the solvent composition are provided. The nonflammable solvent composition includes about 70 wt. % or more of trans-1,2-dichloroethylene (t-DCE) and about 0.1 to about 30 wt. % of one or more of hydrofluoroether (HFE) and n-propyl bromide. The method of cleaning a surface includes applying the solvent composition to the surface and spreading or rubbing the composition on the surface. The method of coating a substrate with a material includes dissolving one or more material in the solvent composition, applying the solvent composition containing the one or more material to a substrate, and evaporating the solvent composition from the substrate.

Abstract: Novel azeotrope compositions comprised of a mixture of a fluorocyclopentane with a solvent selected from the group consisting of 1-bromopropane, t-dichloroethylene, and methylene chloride. Such compositions are useful as solvents in refrigeration flushing, oxygen system cleaning, foam blowing, and cleaning operations such as cold cleaning, vapor degreasing, and aerosol cleaners.

Abstract: Disclosed is a composition comprised of n-propyl bromide and 1,1,1,3,3-pentafluorobutane. This invention also relates to cleaning solvent systems comprised of n-propyl bromide and 1,1,1,3,3-pentafluorobutane and methods for cleaning various solid substrates.

Abstract: A process for co-producing anhydrous hydrogen bromide and a purified bisulfate salt by (a) reacting a bromide salt with sulfuric acid to produce crude hydrogen bromide and crude bisulfate salt; (b) purifying the crude hydrogen bromide to produce anhydrous hydrogen bromide; and (c) removing bromide from the crude bisulfate salt to form a purified bisulfate salt. There are also provided improvements in the bisulfate purification and bromine removal, whereby bromine is removed from the system by a distillation process and the bromide is removed from the crude bisulfate via a spray drying process.

Abstract: A batch process for co-producing anhydrous hydrogen bromide and a purified bisulfate salt comprising: (a) charging a batch reactor with a bromide salt slurry, wherein the slurry is more than 50% by weight bromide salt; (b) reacting the slurry with sulfuric acid in a batch reaction wherein bromide salt is consumed to produce crude aqueous hydrogen bromide and crude bisulfate salt, the crude bisulfate salt containing bromine; (c) prior to or concurrently with step (b) adding hydrogen bromide to the reactor; (d) purifying the crude hydrogen bromide to produce anhydrous hydrogen bromide; and (e) removing bromine from the crude bisulfate salt to form a purified bisulfate salt.

Abstract: A batch process for co-producing anhydrous hydrogen bromide and a purified bisulfate salt comprising: (a) charging a batch reactor with a bromide salt slurry, wherein the slurry is more than 50% by weight bromide salt; (b) reacting the slurry with sulfuric acid in a batch reaction wherein bromide salt is consumed to produce crude aqueous hydrogen bromide and crude bisulfate salt, the crude bisulfate salt containing bromine; (c) prior to or concurrently with step (b) adding hydrogen bromide to the reactor; (d) purifying the crude hydrogen bromide to produce anhydrous hydrogen bromide; and (e) removing bromine from the crude bisulfate salt to form a purified bisulfate salt.

Abstract: A process for co-producing anhydrous hydrogen bromide and a purified bisulfate salt by (a) reacting a bromide salt with sulfuric acid to produce crude hydrogen bromide and crude bisulfate salt; (b) purifying the crude hydrogen bromide to produce anhydrous hydrogen bromide; and (c) removing bromide from the crude bisulfate salt to form a purified bisulfate salt. There are also provided improvements in the bisulfate purification and bromine removal, whereby bromine is removed from the system by a distillation process and the bromide is removed from the crude bisulfate via a spray drying process.

Abstract: Novel azeotrope compositions comprised of a mixture of a fluorocyclopentane with a solvent selected from the group consisting of 1-bromopropane, t-dichloroethylene, and methylene chloride. Such compositions are useful as solvents in refrigeration flushing, oxygen system cleaning, foam blowing, and cleaning operations such as cold cleaning, vapor degreasing, and aerosol cleaners.

Abstract: A solvent system for depositing a coating material onto a solid substrate surface, which solvent system is comprised of at least two organic solvents wherein at least one of the solvents has a substantially different vapor pressure that at least one other solvent in the solvent system. This invention also relates to a method for depositing thin films on substrate surfaces using a solvent system comprised of a blend of at least two organic solvents having substantially different vapor pressures. In a preferred embodiment the solvent system is comprised of effective amounts of n-propyl bromide and 1,1,1,3,3-pentafluorobutane.

Abstract: Disclosed is a composition comprised of n-propyl bromide and 1,1,1,3,3-pentafluorobutane. This invention also relates to cleaning solvent systems comprised of n-propyl bromide and 1,1,1,3,3-pentafluorobutane and methods for cleaning various solid substrates.