Patents by Inventor Dragon Lu

Dragon Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • STORAGE AND SUB-ATMOSPHERIC DELIVERY OF DOPANT COMPOSITIONS FOR CARBON ION IMPLANTATION
    Publication number: 20170032967
    Abstract: A supply source for delivery of a CO-containing dopant gas composition is provided. The composition includes a controlled amount of a diluent gas mixture such as xenon and hydrogen, which are each provided at controlled volumetric ratios to ensure optimal carbon ion implantation performance. The composition can be packaged as a dopant gas kit consisting of a CO-containing supply source and a diluent mixture supply source. Alternatively, the composition can be pre-mixed and introduced from a single source that can be actuated in response to a sub-atmospheric condition achieved along the discharge flow path to allow a controlled flow of the dopant mixture from the interior volume of the device into an ion source apparatus.
    Type: Application
    Filed: October 14, 2016
    Publication date: February 2, 2017
    Inventors: Ashwini K. Sinha, Douglas C. Heiderman, Lloyd A. Brown, Serge M. Campeau, Robert Shih, Dragon Lu, Wen-Pin Chiu, Chien-Kang Kao
  • Storage and sub-atmospheric delivery of dopant compositions for carbon ion implantation
    Patent number: 9552990
    Abstract: A supply source for delivery of a CO-containing dopant gas composition is provided. The composition includes a controlled amount of a diluent gas mixture such as xenon and hydrogen, which are each provided at controlled volumetric ratios to ensure optimal carbon ion implantation performance. The composition can be packaged as a dopant gas kit consisting of a CO-containing supply source and a diluent mixture supply source. Alternatively, the composition can be pre-mixed and introduced from a single source that can be actuated in response to a sub-atmospheric condition achieved along the discharge flow path to allow a controlled flow of the dopant mixture from the interior volume of the device into an ion source apparatus.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: January 24, 2017
    Assignee: PRAXAIR TECHNOLOGY, INC.
    Inventors: Ashwini K. Sinha, Douglas C. Heiderman, Lloyd A. Brown, Serge M. Campeau, Robert Shih, Dragon Lu, Wen-Pin Chiu, Chien-Kang Kao
  • STORAGE AND SUB-ATMOSPHERIC DELIVERY OF DOPANT COMPOSITIONS FOR CARBON ION IMPLANTATION
    Publication number: 20140179090
    Abstract: A supply source for delivery of a CO-containing dopant gas composition is provided. The composition includes a controlled amount of a diluent gas mixture such as xenon and hydrogen, which are each provided at controlled volumetric ratios to ensure optimal carbon ion implantation performance. The composition can be packaged as a dopant gas kit consisting of a CO-containing supply source and a diluent mixture supply source. Alternatively, the composition can be pre-mixed and introduced from a single source that can be actuated in response to a sub-atmospheric condition achieved along the discharge flow path to allow a controlled flow of the dopant mixture from the interior volume of the device into an ion source apparatus.
    Type: Application
    Filed: December 20, 2013
    Publication date: June 26, 2014
    Inventors: Ashwini K. Sinha, Douglas C. Heiderman, Lloyd A. Brown, Serge M. Campeau, Robert Shih, Dragon Lu, Wen-Pin Chiu, Chien-Kang Kao