Abstract: A method of calculating process conditions for performing optical and process correction (OPC) or other resolution enhancement techniques on a layout design. Process conditions are estimated on a layout database on a substantially uniform grid. Contour curves are created from the estimated process conditions. The contour curves are then compared against the features in the layout to determine edge placement errors. From the edge placement errors, OPC or other corrections for the features can be made.

Abstract: A computing system is provided that has a multiprocessor architecture. The processors are hierarchically organized so that one or more slave processors at a senior hierarchical level provide tasks to one or more slave processors at a junior hierarchical level. Further, the slave processors at the junior hierarchical level will have a different functional capability than the slave processors at the senior hierarchical level, such that the junior slave processors can perform some types of operations better than the senior slave processors. A master computing process distributes operation sets among one or more computing processes running on a processor at the senior hierarchical level, which will begin executing operations in the operation set.

Abstract: A method of calculating process conditions for performing optical and process correction (OPC) or other resolution enhancement techniques on a layout design. Process conditions are estimated on a layout database on a substantially uniform grid. Contour curves are created from the estimated process conditions. The contour curves are then compared against the features in the layout to determine edge placement errors. From the edge placement errors, OPC or other corrections for the features can be made.