Patents by Inventor Drew Arnold
Drew Arnold has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9649777Abstract: A log splitter where splitting force is generated by storing kinetic energy in a rotating flywheel. Rotational energy is converted to splitting force by means of a rack and pinion, which is coupled to the flywheels through a belt-driven clutch system. A belt rests around a driven sheave and a drive sheave. An idler pulley tensions the belt, causing the driven pulley to rotate. The idler pulley is attached to an actuation handle causing the idler to lock, by means of a latch, until the operator disengages the pulley, or until a component mounted to the rack forces the latch to disengage. The rack remains engaged to the pinion by a bearing mounting system. A spring bumper may be placed at the end of travel so that at the end of the stroke, the ram mechanism compresses the spring, and uses stored energy to reverse the ram, pinion and sheave.Type: GrantFiled: November 26, 2014Date of Patent: May 16, 2017Assignee: BLOUNT, INC.Inventors: Patrick Foley, Drew Arnold, Don Leliefeld, Emanuel Guzman, Ron Bowman
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Publication number: 20150151448Abstract: A log splitter where splitting force is generated by storing kinetic energy in a rotating flywheel. Rotational energy is converted to splitting force by means of a rack and pinion, which is coupled to the flywheels through a belt-driven clutch system. A belt rests around a driven sheave and a drive sheave. An idler pulley tensions the belt, causing the driven pulley to rotate. The idler pulley is attached to an actuation handle causing the idler to lock, by means of a latch, until the operator disengages the pulley, or until a component mounted to the rack forces the latch to disengage. The rack remains engaged to the pinion by a bearing mounting system. A spring bumper may be placed at the end of travel so that at the end of the stroke, the ram mechanism compresses the spring, and uses stored energy to reverse the ram, pinion and sheave.Type: ApplicationFiled: November 26, 2014Publication date: June 4, 2015Inventors: Patrick Foley, Drew Arnold, Don Leliefeld, Emanuel Guzman, Ron Bowman
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Patent number: 8759803Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.Type: GrantFiled: January 16, 2014Date of Patent: June 24, 2014Assignee: GTAT CorporationInventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, Jr., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
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Publication number: 20140130741Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.Type: ApplicationFiled: January 16, 2014Publication date: May 15, 2014Applicant: GTAT CORPORATIONInventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, JR., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
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Patent number: 8633458Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.Type: GrantFiled: November 15, 2011Date of Patent: January 21, 2014Assignee: GTAT CorporationInventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, Jr., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
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Publication number: 20130119263Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.Type: ApplicationFiled: November 15, 2011Publication date: May 16, 2013Applicant: Twin Creeks Technologies, Inc.Inventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, JR., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
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Patent number: 8426829Abstract: An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. The wafer carriers have wafer retaining fences formed as cylindrical rollers with axes in the respective wafer support planes of the wafer carriers. The cylindrical surfaces of the rollers provide wafer abutment surfaces which can move transversely to the wafer support surfaces so that no transverse loading is applied by the fences to wafer edges as the wafer is pushed against the heat sink by centrifugal force. The wafer support surfaces comprise layers of elastomeric material and the movable abutment surfaces of the fences allow even thermal coupling with the heat sink over the whole area of the wafer.Type: GrantFiled: September 30, 2010Date of Patent: April 23, 2013Assignee: GTAT CorporationInventors: William H Leavitt, Theodore H Smick, Joseph Daniel Gillespie, William H Park, Paul Eide, Drew Arnold, Geoffrey Ryding
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Patent number: 8324592Abstract: Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam.Type: GrantFiled: November 2, 2010Date of Patent: December 4, 2012Assignee: Twin Creeks Technologies, Inc.Inventors: Geoffrey Ryding, Drew Arnold, William H. Park, Ronald Horner
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Publication number: 20120104273Abstract: Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam.Type: ApplicationFiled: November 2, 2010Publication date: May 3, 2012Applicant: TWIN CREEKS TECHNOLOGIES, INC.Inventors: Geoffrey Ryding, Drew Arnold, William H. Park, Ronald Horner
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Publication number: 20120036725Abstract: In various embodiments, a cutting tool such as a chainsaw may include a cutting member that is movable by an engine, one or more sensors configured to detect one or more of acceleration in a direction parallel to one or more axes of the cutting tool and rotational velocity about one or more axes of the cutting tool, and a microprocessor configured to cause movement of the cutting member to stop in response to receiving one or more signals from the one or more sensors. In various embodiments, a method may include receiving, by a microprocessor of a chainsaw, a signal from a gyroscope configured to detect rotational velocity about one or more axes of the cutting tool, and actuating, by the microprocessor, a braking system of the chainsaw to stop movement of a cutting chain around a perimeter of a guide bar in response to the signal.Type: ApplicationFiled: August 11, 2011Publication date: February 16, 2012Applicant: BLOUNT, INC.Inventors: Ian Osborne, Drew Arnold, Gale Hall
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Publication number: 20110073781Abstract: An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. The wafer carriers have wafer retaining fences formed as cylindrical rollers with axes in the respective wafer support planes of the wafer carriers. The cylindrical surfaces of the rollers provide wafer abutment surfaces which can move transversely to the wafer support surfaces so that no transverse loading is applied by the fences to wafer edges as the wafer is pushed against the heat sink by centrifugal force. The wafer support surfaces comprise layers of elastomeric material and the movable abutment surfaces of the fences allow even thermal coupling with the heat sink over the whole area of the wafer.Type: ApplicationFiled: September 30, 2010Publication date: March 31, 2011Applicant: TWIN CREEKS TECHNOLOGIES, INC.Inventors: William H. Leavitt, Theodore H. Smick, Joseph Daniel Gillespie, William H. Park, Paul Eide, Drew Arnold, Geoffrey Ryding
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Patent number: 6897457Abstract: An ion implanter has an ion source (10) and an ion beam extraction assembly (50) for extracting the ions. The extraction assembly (50) is a tetrode structure and one of the pairs of extraction electrodes (51) has left and right ports (54, 55) located in opposite sides of the ion beam emerging from the ion source (10). The left and right electrode ports (54, 55) are electrically isolated from each other and connected to independent voltage sources (210, 230). The ion implanter also has a baffle plate (60) at the entrance to a mass analyser (90) downstream of the extraction assembly (50). The baffle plate (60) is also split into two halves (60? and 60?). By measuring the beam current incident on the two halves (60?, 60?) of the baffle (60), the relative voltages supplied to the left and right electrode parts (54, 55) may be adjusted so as to steer the ion beam and adjust the angle of incidence of the longitudinal axis thereof relative to the input of the analysing magnet (90).Type: GrantFiled: December 23, 1999Date of Patent: May 24, 2005Assignee: Applied Materials, Inc.Inventors: Andrew James Timothy Holmes, David Richard Burgin, Simon Povall, David George Armour, Drew Arnold
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Patent number: 6559454Abstract: An ion beam generation apparatus comprising an ion source (20) for generating ions, and a tetrode extraction assembly (11) comprising four electrodes for extracting and accelerating ions from the ion source. The extraction assembly comprises a source electrode (22) at the potential of the ion source, an extraction electrode (23) adjacent to the source electrode to extract ions from the ion source (20), a ground electrode (25), and a suppression electrode (24) between the extraction electrode and the ground electrode. Each electrode has an aperture to allow the ion beam to pass therethrough. The gap between the extraction (23) and suppression (24) electrodes is variable in the direction of ion beam travel.Type: GrantFiled: May 29, 2001Date of Patent: May 6, 2003Assignee: Applied Materials, Inc.Inventors: Adrian John Murrell, Erik Jan Hilda Collart, Bernard Francis Harrison, Amir Al-Bayati, Chris James Burgess, David Armour, Andrew Holmes, Simon Povall, Drew Arnold, Paul Anthony Burfield