Patents by Inventor Drew CHIEDA

Drew CHIEDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing a mirror of a microlithographic projection exposure apparatus
    Patent number: 12117731
    Abstract: This disclosure relates to a method for producing a mirror of a microlithographic projection exposure apparatus, a first mirror part and a second mirror part being provided, which are in contact in the region of a first connecting surface of the first mirror part and a second connecting surface of the second mirror part. For forming a durable connection between the first mirror part and the second mirror part, the first mirror part and the second mirror part are heated up to a holding temperature of at least 400° C. and are kept at the holding temperature during a holding time. After the holding time has elapsed, the first mirror part and the second mirror part are cooled down to a first cooling temperature at a first cooling rate of less than or equal to 100 K/h.
    Type: Grant
    Filed: December 13, 2022
    Date of Patent: October 15, 2024
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Christoph Zaczek, Erik Loopstra, Eric Eva, Drew Chieda, Matthew Lipson, Victor Perez-Falcon, Moshe Shemesh
  • METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20240192605
    Abstract: This disclosure relates to a method for producing a mirror of a microlithographic projection exposure apparatus, a first mirror part and a second mirror part being provided, which are in contact in the region of a first connecting surface of the first mirror part and a second connecting surface of the second mirror part. For forming a durable connection between the first mirror part and the second mirror part, the first mirror part and the second mirror part are heated up to a holding temperature of at least 400° C. and are kept at the holding temperature during a holding time. After the holding time has elapsed, the first mirror part and the second mirror part are cooled down to a first cooling temperature at a first cooling rate of less than or equal to 100 K/h.
    Type: Application
    Filed: December 13, 2022
    Publication date: June 13, 2024
    Inventors: Christoph ZACZEK, Erik LOOPSTRA, Eric EVA, Drew CHIEDA, Matthew LIPSON, Victor PEREZ-FALCON, Moshe SHEMESH