Patents by Inventor Dries Hemschoote

Dries Hemschoote has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7478481
    Abstract: Laser interferometers and high-quality linear encoders both are competitive linear measurement systems used in high-precision machines. Plane laser interferometry allows measuring to a target that moves perpendicular to the measurement direction and to set up the laser beam in line with the functional point. In this way, a stacking of measurement systems can be avoided and a measurement configuration complying with the Abbe principle can be configured. On the other hand, laser interferometry is known to be sensitive to environmental changes. High-quality linear scales are used as an alternative. A disadvantage of linear scales is that the target is only allowed to move along the measurement axis. For targets translating in more than one direction with a range over several millimeters, this leads to a simple stacking of several linear scales together with the supporting slides. This indirect way of measuring introduces errors and partially destroys the accuracy provided by modern linear scales.
    Type: Grant
    Filed: May 27, 2005
    Date of Patent: January 20, 2009
    Assignee: K.U. Leuven Research & Development
    Inventors: Dominiek Reynaerts, Jun Qian, Dries Hemschoote, Hendrik Van Brussel
  • Publication number: 20080040941
    Abstract: Laser interferometers and high-quality linear encoders both are competitive linear measurement systems used in high-precision machines. Plane laser interferometry allows measuring to a target that moves perpendicular to the measurement direction and to set up the laser beam in line with the functional point. In this way, a stacking of measurement systems can be avoided and a measurement configuration complying with the Abbe principle can be configured. On the other hand, laser interferometry is known to be sensitive to environmental changes. High-quality linear scales are used as an alternative. A disadvantage of linear scales is that the target is only allowed to move along the measurement axis. For targets translating in more than one direction with a range over several millimetres, this leads to a simple stacking of several linear scales together with the supporting slides. This indirect way of measuring introduces errors and partially destroys the accuracy provided by modern linear scales.
    Type: Application
    Filed: May 27, 2005
    Publication date: February 21, 2008
    Inventors: Dominiek Reynaerts, Jun Qian, Dries Hemschoote, Hendrik Van Brussel