Abstract: A nano-imprint mold and a method of manufacturing the same are provided, which can be used for replicating a nano-scaled structure to a polymer layer. The nano-imprint mold comprises: a substrate; a pattern portion having a prominence and depression pattern formed on the substrate; a hard layer formed of a material with a hardness higher than the pattern portion on a surface of the pattern portion; and a separation layer formed on a surface of the hard layer. In the nano-imprint mold of the present invention, an original pattern can be uniformly replicated even on a substrate with an irregular surface. Further, the pattern can be prevented from being damaged by pressure and being contaminated by synthetic resin, resulting in better accuracy and durability of the pattern.

Abstract: Provided are a method of manufacturing a magnetic layer, a patterned magnetic recording medium including magnetic layers formed using the method, and a method of manufacturing the patterned magnetic recording medium. The method of manufacturing the magnetic layers includes: forming a template provided with an opening; forming a seed layer on a bottom of the opening; and inserting a magnetic material onto the seed layer to form a magnetic layer. The patterned magnetic recording medium includes a lower layer formed on a substrate; a template formed on the lower layer and including a plurality of holes exposing the lower layer; seed layers covering the lower layer exposed through the holes; and magnetic layers formed on the seed layers to fill the holes.