Patents by Inventor Duan-Fu Hsu

Duan-Fu Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
    Publication number: 20040209170
    Abstract: A method of generating a mask design having optical proximity correction features disposed therein. The methods includes the steps of obtaining a desired target pattern having features to be imaged on a substrate; determining an interference map based on the target pattern, the interference map defining areas of constructive interference and areas of destructive interference between at least one of the features to be imaged and a field area adjacent the at least one feature; and placing assist features in the mask design based on the areas of constructive interference and the areas of destructive interference.
    Type: Application
    Filed: January 14, 2004
    Publication date: October 21, 2004
    Inventors: Douglas Van Den Broeke, Jang Fung Chen, Thomas Laidig, Kurt E. Wampler, Stephen Duan-Fu Hsu