Abstract: An elevator safety gear actuation device for actuating an elevator safety gear comprises a first member and a second member. The first and second members are arranged opposite to each other defining a gap configured for accommodating a guide member extending in a longitudinal direction. At least one of the members is movable in a direction transverse to the longitudinal direction between a disengaged position and an engaged position. The first member comprises at least one permanent magnet which is configured for being magnetically attracted and attaching to the guide member extending through the gap when the first member is arranged in the engaged position the second member comprises at least one roller and/or at least one low friction element configured for providing low friction between the second member and the guide member extending through the gap.

Abstract: A generator and a method for generating far infrared polarized light are related. The generator includes a far infrared light source configured to emit a far infrared light; a polarizer located on a light emitting surface of the far infrared light source, wherein the polarizer includes a carbon nanotube structure including a plurality of carbon nanotubes arranged substantially along the same direction, and the far infrared light passes through the polarizer to form a far infrared polarized light; and a heater configured to heat the carbon nanotube structure. The method includes allowing the far infrared to pass through the carbon nanotube structure and heating the carbon nanotube structure as the far infrared passes through the carbon nanotube structure.

Abstract: A far infrared imaging system includes a first far infrared polarized light generator, a second far infrared polarized light generator, a first receiving device, a second receiving device, and a computer. The first far infrared polarized light generator emits a first far infrared polarized light, and the second far infrared polarized light generator emits a second far infrared polarized light. The first receiving device receives a first far infrared reflected polarized light, and the second receiving device receives a second far infrared reflected polarized light. The computer processes information received by the first receiver and the second receiver. The polarizer of the first far infrared polarized light generator and the second far infrared polarized light generator includes a carbon nanotube structure including a plurality of carbon nanotubes arranged substantially along the same direction.

Abstract: The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.

Abstract: The disclosure relates to a method for characterizing a two-dimensional nanomaterial sample. The two-dimensional nanomaterial sample is placed in a vacuum chamber. An electron beam passes through the two-dimensional nanomaterial sample to form a diffraction electron beam and a transmission electron beam to form an image on an imaging device. An angle ? between the diffraction electron beam and the transmission electron is obtained. A lattice period d of the two-dimensional nanomaterial sample is calculated according to a formula d sin ??d?=?, where ? represents a wavelength of the electron beam.

Abstract: The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.

Abstract: The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.

Abstract: The disclosure relates to a photolithography method based on electronic beam. The method includes: providing an electronic beam; making the electron beam transmit a two dimensional nanomaterial to form a transmission electron beam and a number of diffraction electron beams; shielding the transmission electron beam; and radiating a surface of an object by the plurality of diffraction electron beams. The photolithography method is high efficiency and has low cost.

Abstract: The disclosure relates to a low energy electron microscopy. The electron microscopy includes a vacuum chamber; an electron gun used to emit electron beam; a diffraction chamber; an imaging device; a sample holder used to fix two-dimensional nanomaterial sample; a vacuum pumping device; and a control computer. The electron beam transmits the sample to form a transmission electron beam and diffraction electron beam. The control computer includes a switching module to switch the work mode between a large beam spot diffraction imaging mode and small beam spot diffraction imaging mode.

Abstract: The disclosure relates to a detecting system including a terahertz wave source, a detector and a controlling computer. The terahertz wave source includes a terahertz reflection klystron including an electron emission unit, a resonance unit, an output unit. The electron emission unit is configured to emit electrons. The resonance unit includes a resonant cavity communicated with the electron emission unit so that the electron emission unit emit electrons into the resonant cavity. The resonant cavity of the electron emission unit opposite the cavity wall has an output aperture coupled. The output unit is communicated with the resonance unit by the output aperture coupled. The resonance unit generate terahertz wave transmit to the output unit by the output aperture coupled.

Abstract: The disclosure relates to a method for characterizing a two-dimensional nanomaterial sample. The two-dimensional nanomaterial sample is placed in a vacuum chamber. An electron beam passes through the two-dimensional nanomaterial sample to form a diffraction electron beam and a transmission electron beam to form an image on an imaging device. An angle ? between the diffraction electron beam and the transmission electron is obtained. A lattice period d of the two-dimensional nanomaterial sample is calculated according to a formula d sin ??d?=?, where ? represents a wavelength of the electron beam.

Abstract: The disclosure relates to a photolithography method based on electronic beam. The method includes: providing an electronic beam; making the electron beam transmit a two dimensional nanomaterial to form a transmission electron beam and a number of diffraction electron beams; shielding the transmission electron beam; and radiating a surface of an object by the plurality of diffraction electron beams. The photolithography method is high efficiency and has low cost.

Abstract: The disclosure relates to a low energy electron microscopy. The electron microscopy includes a vacuum chamber; an electron gun used to emit electron beam; a diffraction chamber; an imaging device; a sample holder used to fix two-dimensional nanomaterial sample; a vacuum pumping device; and a control computer. The electron beam transmits the sample to form a transmission electron beam and diffraction electron beam. The control computer includes a switching module to switch the work mode between a large beam spot diffraction imaging mode and small beam spot diffraction imaging mode.

Abstract: The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.

Abstract: The disclosure relates to a detecting system including a terahertz wave source, a detector and a controlling computer. The terahertz wave source includes a terahertz reflection klystron including an electron emission unit, a resonance unit, an output unit. The electron emission unit is configured to emit electrons. The resonance unit includes a resonant cavity communicated with the electron emission unit so that the electron emission unit emit electrons into the resonant cavity. The resonant cavity of the electron emission unit opposite the cavity wall has an output aperture coupled. The output unit is communicated with the resonance unit by the output aperture coupled. The resonance unit generate terahertz wave transmit to the output unit by the output aperture coupled.

Abstract: A Tera Hertz reflex klystron includes an electron emission unit, a resonant unit and an output unit. The electron emission is used to emit a plurality of electrons. The electron emission unit defines a first opening. The resonant unit comprises a resonant cavity frame. The resonant cavity frame comprises a top wall and a bottom wall and defines a resonant cavity. The top wall and the bottom wall faces with each other. The bottom wall comprises a bottom opening. The top wall comprises a top opening and at least one outputting hole. The bottom opening and the first opening are merged with each other. The output unit being configured to output Tera Hertz waves. The plurality of electrons are transferred to the output unit from the at least one outputting hole.

Abstract: A method of manufacturing an elevator safety spring is provided. The method includes determining a plurality of dimensional parameters of the elevator safety spring. The method also includes selecting a plurality of dimensions within the dimensional parameters. The method further includes manufacturing the elevator safety spring based on the selected parameters, the elevator safety spring having an I-beam cross-section.

Abstract: A Tera Hertz reflex klystron includes an electron emission unit, a resonant unit and an output unit. The electron emission is used to emit a plurality of electrons. The electron emission unit defines a first opening. The resonant unit comprises a resonant cavity frame. The resonant cavity frame comprises a top wall and a bottom wall and defines a resonant cavity. The top wall and the bottom wall faces with each other. The bottom wall comprises a bottom opening. The top wall comprises a top opening and at least one outputting hole. The bottom opening and the first opening are merged with each other. The output unit being configured to output Tera Hertz waves. The plurality of electrons are transferred to the output unit from the at least one outputting hole.

Abstract: An adjacent safety configuration for an elevator includes a second pair of safeties displaced from a first pair of safeties by at least 0.1 seconds of travel time at a rated speed of the elevator. An adjacent safety configuration for an elevator including a second pair of safeties displaced from the first pair of safeties to provide a predetermined time period before the second pair of safeties pass over a point on a guide rail previously passed over by the first pair of safeties to permit the guide rail surface to decrease by a predetermined temperature. A method of spacing an adjacent safety configuration for an elevator system including de-rating a pair of trailing safeties with respect to a pair of leading safeties as a function of a rated speed of the elevator and a spacing between the pair of trailing safeties and the pair of leading safeties.

Abstract: The disclosure relates to a field emission cathode. The field emission cathode includes a microchannel plate, a cathode electrode and a number of cathode emitters. The microchannel plate is an insulative plate and includes a first surface and a second surface opposite to the first surface. The microchannel plate defines a number of holes extending through the microchannel plate from the first surface to the second surface. The cathode electrode is located on the first surface. The number of cathode emitters are filled in the number of holes and electrically connected with the cathode electrode.