Patents by Inventor Duane E. Johnson

Duane E. Johnson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Organ-specific targeting of cationic amphiphile / DNA complexes for gene therapy
    Patent number: 6331524
    Abstract: Novel cationic amphiphiles are provided that facilitate transport of biologically active (therapeutic) molecules into cells. The amphiphiles contain lipophilic groups derived from steroids, from mono or dialkylamines, or from alkyl or acyl groups; and cationic groups, protonatable at physiological pH, derived from amines, alkylamines or polyalkylamines. There are provided also therapeutic compositions prepared typically by contacting a dispersion of one or more cationic amphiphiles with the therapeutic molecules. Therapeutic molecules that can be delivered into cells according to the practice of the invention include DNA, RNA, and polypeptides. Representative uses of the therapeutic compositions of the invention include providing gene therapy, and delivery of antisense polynucleotides or biologically active polypeptides to cells. With respect to therapeutic compositions for gene therapy, the DNA is provided typically in the form of a plasmid for complexing with the cationic amphiphile.
    Type: Grant
    Filed: April 7, 1997
    Date of Patent: December 18, 2001
    Assignee: Genzyme Corporation
    Inventors: Ronald K. Scheule, Rebecca G. Bagley, Simon J. Eastman, Seng H. Cheng, John Marshall, David J. Harris, Edward R. Lee, Craig S. Siegel, Chau-Dung Chang, S. Catherine Hubbard, Duane E. Johnson, Daniel C. Maneval, H. Michael Shepard, Richard J. Gregory
  • Process for preparing electron beam resists
    Patent number: 4074031
    Abstract: Positive electron beam resists are prepared by reacting a film which is a copolymer of methyl methacrylate and methacrylic acid with a tertiary amine.
    Type: Grant
    Filed: September 8, 1976
    Date of Patent: February 14, 1978
    Assignee: International Business Machines Corporation
    Inventors: Duane E. Johnson, Lester A. Pederson
  • Positive polymeric electron beam resists of very great sensitivity
    Patent number: 3996393
    Abstract: It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 .times. 10.sup..sup.-6 coulombs/cm.sup.2.
    Type: Grant
    Filed: March 25, 1974
    Date of Patent: December 7, 1976
    Assignee: International Business Machines Corporation
    Inventors: Charles A. Cortellino, Edward Gipstein, William A. Hewett, Duane E. Johnson, Wayne M. Moreau