Patents by Inventor Dubravka Bilic

Dubravka Bilic has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9926187
    Abstract: Methods for fabricating crack resistant Microelectromechanical (MEMS) devices are provided, as are MEMS devices produced pursuant to such methods. In one embodiment, the method includes forming a sacrificial body over a substrate, producing a multi-layer membrane structure on the substrate, and removing at least a portion of the sacrificial body to form an inner cavity within the multi-layer membrane structure. The multi-layer membrane structure is produced by first forming a base membrane layer over and around the sacrificial body such that the base membrane layer has a non-planar upper surface. A predetermined thickness of the base membrane layer is then removed to impart the base membrane layer with a planar upper surface. A cap membrane layer is formed over the planar upper surface of the base membrane layer. The cap membrane layer is composed of a material having a substantially parallel grain orientation.
    Type: Grant
    Filed: November 10, 2014
    Date of Patent: March 27, 2018
    Assignee: NXP USA, Inc.
    Inventors: Chad S Dawson, Dubravka Bilic, Lianjun Liu, Andrew C McNeil
  • Publication number: 20170341926
    Abstract: Methods for fabricating crack resistant Microelectromechanical (MEMS) devices are provided, as are MEMS devices produced pursuant to such methods. In one embodiment, the method includes forming a sacrificial body over a substrate, producing a multi-layer membrane structure on the substrate, and removing at least a portion of the sacrificial body to form an inner cavity within the multi-layer membrane structure. The multi-layer membrane structure is produced by first forming a base membrane layer over and around the sacrificial body such that the base membrane layer has a non-planar upper surface. A predetermined thickness of the base membrane layer is then removed to impart the base membrane layer with a planar upper surface. A cap membrane layer is formed over the planar upper surface of the base membrane layer. The cap membrane layer is composed of a material having a substantially parallel grain orientation.
    Type: Application
    Filed: November 10, 2014
    Publication date: November 30, 2017
    Inventors: Chad S Dawson, Dubravka Bilic, Lianjun Liu, Andrew C McNeil
  • Patent number: 9829406
    Abstract: A differential capacitive output pressure sensor device includes a pressure sensor diaphragm layer comprising a pressure sensing diaphragm portion, a movable electrode on the pressure sensing diaphragm portion, a fixed electrode, and a device layer electrode. The pressure sensor device further includes a device layer including a fixed element connected to the device layer electrode and a movable element connected to the movable electrode. As the pressure changes, the pressure sensing diaphragm portion including the movable electrode and the movable element move. This changes the capacitance between the movable electrode and the fixed element inversely to the change in capacitance between the fixed electrode and the moveable element. Accordingly, a differential capacitive output is provided that has improved linearity with respect to the pressure change and increased sensitivity allowing the change in pressure to be measured readily and accurately.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: November 28, 2017
    Assignee: NXP USA, Inc.
    Inventors: Aaron A Geisberger, Dubravka Bilic, Chad S Dawson, Fengyuan Li
  • Patent number: 9790085
    Abstract: A structure for preventing charge induced leakage of a semiconductor device includes a shield separated from a first interconnect by at least a first lateral spacing and separated from a second interconnect by at least a second lateral spacing. The first interconnect is connected to a first junction and the second interconnect is connected to a second junction. A shield bias is connected to the shield to terminate an electromagnetic field on the shield. The shield between the first and second lateral spacings has a minimum width to substantially prevent formation of a conductive channel between the first and second junctions. The shield may be formed over a portion of the first junction and over a portion of the second junction to substantially prevent formation of another conductive channel between the first and second junctions at a location that does not have the first and second lateral spacings.
    Type: Grant
    Filed: June 16, 2016
    Date of Patent: October 17, 2017
    Assignee: NXP USA, Inc.
    Inventors: Dubravka Bilic, Andrew C. McNeil, Lianjun Liu, Margaret Kniffin, Chad Dawson, Colin Stevens
  • Patent number: 9791340
    Abstract: During a first cycle of operation, first and second bottom electrodes of a split bottom electrode are electrically connected together. A total capacitance between the split bottom electrode and a top electrode layer is measured to determine the ambient pressure. Accordingly, pressure, e.g., tire pressure, is measured during the first cycle of operation. In a second cycle of operation, the first and second bottom electrodes are electrically disconnected. A first capacitance between the first bottom electrode and top electrode layer and a second capacitance between second bottom electrode and top electrode layer are measured. The difference between the first capacitance and the second capacitance is calculated and compared to a fault indicating capacitance variation to determine if the pressure sensor device is operating normally or malfunctioning. Accordingly, a self-test of the pressure sensor device is performed during the second cycle of operation.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: October 17, 2017
    Assignee: NXP USA, Inc.
    Inventors: Dubravka Bilic, Chad S Dawson
  • Publication number: 20170074738
    Abstract: A differential capacitive output pressure sensor device includes a pressure sensor diaphragm layer comprising a pressure sensing diaphragm portion, a movable electrode on the pressure sensing diaphragm portion, a fixed electrode, and a device layer electrode. The pressure sensor device further includes a device layer including a fixed element connected to the device layer electrode and a movable element connected to the movable electrode. As the pressure changes, the pressure sensing diaphragm portion including the movable electrode and the movable element move. This changes the capacitance between the movable electrode and the fixed element inversely to the change in capacitance between the fixed electrode and the moveable element. Accordingly, a differential capacitive output is provided that has improved linearity with respect to the pressure change and increased sensitivity allowing the change in pressure to be measured readily and accurately.
    Type: Application
    Filed: September 15, 2015
    Publication date: March 16, 2017
    Inventors: Aaron A. GEISBERGER, Dubravka BILIC, Chad S. DAWSON, Fengyuan LI
  • Publication number: 20170023427
    Abstract: During a first cycle of operation, first and second bottom electrodes of a split bottom electrode are electrically connected together. A total capacitance between the split bottom electrode and a top electrode layer is measured to determine the ambient pressure. Accordingly, pressure, e.g., tire pressure, is measured during the first cycle of operation. In a second cycle of operation, the first and second bottom electrodes are electrically disconnected. A first capacitance between the first bottom electrode and top electrode layer and a second capacitance between second bottom electrode and top electrode layer are measured. The difference between the first capacitance and the second capacitance is calculated and compared to a fault indicating capacitance variation to determine if the pressure sensor device is operating normally or malfunctioning. Accordingly, a self-test of the pressure sensor device is performed during the second cycle of operation.
    Type: Application
    Filed: July 22, 2015
    Publication date: January 26, 2017
    Inventors: Dubravka BILIC, Chad S. DAWSON
  • Patent number: 9425382
    Abstract: A microelectromechanical system (MEMS) sensor device includes a substrate, a support structure supported by the substrate, a membrane supported by the support structure and spaced from the substrate, and a polymer layer covering the membrane.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: August 23, 2016
    Assignee: FREESCALE SEMICONDUCTOR, INC.
    Inventors: Dubravka Bilic, Stephen R. Hooper
  • Publication number: 20160075553
    Abstract: A microelectromechanical system (MEMS) sensor device includes a substrate, a support structure supported by the substrate, a membrane supported by the support structure and spaced from the substrate, and a polymer layer covering the membrane.
    Type: Application
    Filed: November 23, 2015
    Publication date: March 17, 2016
    Applicant: Freescale Semiconductor, Inc.
    Inventors: Dubravka Bilic, Stephen R. Hooper
  • Patent number: 9199840
    Abstract: A method of fabricating a sensor device includes forming a plurality of sensor structures on a wafer, covering the plurality of sensor structures with a polymer layer, and dicing the wafer into a plurality of die while each sensor structure remains covered by the polymer layer.
    Type: Grant
    Filed: November 1, 2013
    Date of Patent: December 1, 2015
    Assignee: Freescale Semiconductor, Inc.
    Inventors: Dubravka Bilic, Stephen R. Hooper
  • Patent number: 9103705
    Abstract: A combination sensor and corresponding method of measuring a plurality of environmental parameters uses a pressure sensor disposed on an integrated circuit die; a humidity sensor disposed on the integrated circuit die; and a circuit coupled to and shared by the pressure sensor and the humidity sensor to facilitate pressure and humidity sensing.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: August 11, 2015
    Assignee: Freescale Semiconductor, Inc.
    Inventors: Dubravka Bilic, Andrew C. McNeil
  • Publication number: 20150123222
    Abstract: A method of fabricating a sensor device includes forming a plurality of sensor structures on a wafer, covering the plurality of sensor structures with a polymer layer, and dicing the wafer into a plurality of die while each sensor structure remains covered by the polymer layer.
    Type: Application
    Filed: November 1, 2013
    Publication date: May 7, 2015
    Applicant: FREESCALE SEMICONDUCTOR, INC.
    Inventors: Dubravka Bilic, Stephen R. Hooper
  • Publication number: 20150059484
    Abstract: Methods for fabricating crack resistant Microelectromechanical (MEMS) devices are provided, as are MEMS devices produced pursuant to such methods. In one embodiment, the method includes forming a sacrificial body over a substrate, producing a multi-layer membrane structure on the substrate, and removing at least a portion of the sacrificial body to form an inner cavity within the multi-layer membrane structure. The multi-layer membrane structure is produced by first forming a base membrane layer over and around the sacrificial body such that the base membrane layer has a non-planar upper surface. A predetermined thickness of the base membrane layer is then removed to impart the base membrane layer with a planar upper surface. A cap membrane layer is formed over the planar upper surface of the base membrane layer. The cap membrane layer is composed of a material having a substantially parallel grain orientation.
    Type: Application
    Filed: November 10, 2014
    Publication date: March 5, 2015
    Inventors: Chad S Dawson, Dubravka Bilic, Lianjun Liu, Andrew C McNeil
  • Patent number: 8921952
    Abstract: Methods for fabricating crack resistant Microelectromechanical (MEMS) devices are provided, as are MEMS devices produced pursuant to such methods. In one embodiment, the method includes forming a sacrificial body over a substrate, producing a multi-layer membrane structure on the substrate, and removing at least a portion of the sacrificial body to form an inner cavity within the multi-layer membrane structure. The multi-layer membrane structure is produced by first forming a base membrane layer over and around the sacrificial body such that the base membrane layer has a non-planar upper surface. A predetermined thickness of the base membrane layer is then removed to impart the base membrane layer with a planar upper surface. A cap membrane layer is formed over the planar upper surface of the base membrane layer. The cap membrane layer is composed of a material having a substantially parallel grain orientation.
    Type: Grant
    Filed: January 29, 2013
    Date of Patent: December 30, 2014
    Assignee: Freescale Semiconductor Inc.
    Inventors: Chad S Dawson, Dubravka Bilic, Lianjun Liu, Andrew C McNeil
  • Publication number: 20140210018
    Abstract: Methods for fabricating crack resistant Microelectromechanical (MEMS) devices are provided, as are MEMS devices produced pursuant to such methods. In one embodiment, the method includes forming a sacrificial body over a substrate, producing a multi-layer membrane structure on the substrate, and removing at least a portion of the sacrificial body to form an inner cavity within the multi-layer membrane structure. The multi-layer membrane structure is produced by first forming a base membrane layer over and around the sacrificial body such that the base membrane layer has a non-planar upper surface. A predetermined thickness of the base membrane layer is then removed to impart the base membrane layer with a planar upper surface. A cap membrane layer is formed over the planar upper surface of the base membrane layer. The cap membrane layer is composed of a material having a substantially parallel grain orientation.
    Type: Application
    Filed: January 29, 2013
    Publication date: July 31, 2014
    Inventors: Chad S. Dawson, Dubravka Bilic, Lianjun Liu, Andrew C. McNeil
  • Publication number: 20130219994
    Abstract: A combination sensor and corresponding method of measuring a plurality of environmental parameters uses a pressure sensor disposed on an integrated circuit die; a humidity sensor disposed on the integrated circuit die; and a circuit coupled to and shared by the pressure sensor and the humidity sensor to facilitate pressure and humidity sensing
    Type: Application
    Filed: February 27, 2012
    Publication date: August 29, 2013
    Inventors: Dubravka Bilic, Andrew D. McNeil
  • Patent number: 7673519
    Abstract: A pressure sensor includes a first set of electrodes, a second set of electrodes, and a common electrode. The first and second sets of electrodes overlie an insulative surface, wherein the first set of electrodes represent sense capacitor bottom electrodes and the second set of electrodes represent reference capacitor bottom electrodes. The second set of electrodes is configured in an interleaved arrangement with the first set of electrodes, wherein the geometry of individual electrodes of the first set of electrodes substantially matches the geometry of individual electrodes of the second set of electrodes.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: March 9, 2010
    Assignee: Freescale Semiconductor, Inc.
    Inventors: Marco Fuhrmann, Dubravka Bilic, Thomas D. Ohe
  • Publication number: 20100050776
    Abstract: A pressure sensor includes a first set of electrodes, a second set of electrodes, and a common electrode. The first and second sets of electrodes overlie an insulative surface, wherein the first set of electrodes represent sense capacitor bottom electrodes and the second set of electrodes represent reference capacitor bottom electrodes. The second set of electrodes is configured in an interleaved arrangement with the first set of electrodes, wherein the geometry of individual electrodes of the first set of electrodes substantially matches the geometry of individual electrodes of the second set of electrodes.
    Type: Application
    Filed: August 29, 2008
    Publication date: March 4, 2010
    Inventors: Marco Fuhrmann, Dubravka Bilic, Thomas D. Ohe
  • Patent number: 7528468
    Abstract: A capacitor assembly (82) is formed on a substrate (20). The capacitor assembly a first conductive plate (38) and a second conductive plate (60) formed over the substrate such that the second conductive plate is separated from the first conductive plate by a distance. A conductive trace (40) is formed over the substrate that is connected to the first conductive plate and extends away from the capacitor assembly. A conductive shield (62) is formed over at least a portion of the conductive trace that is separated from the first and second conductive plates to control a fringe capacitance between the second conductive plate and the conductive trace.
    Type: Grant
    Filed: September 25, 2006
    Date of Patent: May 5, 2009
    Assignee: Freescale Semiconductor, Inc.
    Inventors: Andrew C. McNeil, Dubravka Bilic, Stephen R. Hooper
  • Publication number: 20080073760
    Abstract: A capacitor assembly (82) is formed on a substrate (20). The capacitor assembly a first conductive plate (38) and a second conductive plate (60) formed over the substrate such that the second conductive plate is separated from the first conductive plate by a distance. A conductive trace (40) is formed over the substrate that is connected to the first conductive plate and extends away from the capacitor assembly. A conductive shield (62) is formed over at least a portion of the conductive trace that is separated from the first and second conductive plates to control a fringe capacitance between the second conductive plate and the conductive trace.
    Type: Application
    Filed: September 25, 2006
    Publication date: March 27, 2008
    Inventors: Andrew C. McNeil, Dubravka Bilic, Stephen R. Hooper