Abstract: An apparatus for detecting particles located on an object includes an emitter for irradiating lights to the particles. The object is disposed on a stage in a direction substantially parallel to a surface of the object. The apparatus further includes a driver for generating a relative motion between the emitter and the object for scanning the surface of the object with the lights and a detector for detecting the lights emitted from the emitter or lights scattered from the particle. With embodiments of the present invention, the particles can be quickly detected.

Abstract: Described is a method and system for measuring overlay of a semiconductor device. The method may include obtaining reference sample data and misaligned sample data from scattering data of a reference sample and misaligned samples, assigning reference fitting values based on the reference sample data and the misaligned sample data, collecting target wafer scattering data from a target wafer, evaluating a target wafer fitting value based on the reference sample data and the target wafer scattering data and comparing the target wafer fitting value with the reference fitting values to determine a target wafer misaligned value relating to the overlay between the first pattern and the second pattern of a target wafer.

Abstract: A reference value setting unit of a specimen inspection apparatus comprises a calibration specimen, a calibration light source for emitting a predetermined light to the calibration specimen, at least one detector for receiving a first light-scattering signal reflected through the calibration specimen as well as a second light-scattering signal reflected from an inspection specimen, and a detector calibration unit for comparing a measured value measured from the calibration specimen with a reference value for the detector, and for calculating an offset value for calibration based on the comparison to calibrate the detector.

Abstract: An apparatus for detecting particles located on an object includes an emitter for irradiating lights to the particles. The object is disposed on a stage in a direction substantially parallel to a surface of the object. The apparatus further includes a driver for generating a relative motion between the emitter and the object for scanning the surface of the object with the lights and a detector for detecting the lights emitted from the emitter or lights scattered from the particle. With embodiments of the present invention, the particles can be quickly detected.