Abstract: A display device includes a substrate; an auxiliary electrode including metal layers stacked in an undercut structure; and a light-emitting element layer. The light-emitting element layer includes a second common layer; and a common electrode which extend to the non-emission area. A side surface of the auxiliary electrode includes a first bonding portion in contact with the second common layer, and a second bonding portion in contact with the common electrode. The auxiliary electrode includes a first side and a second side facing each other in one direction, and a third side and a fourth side facing each other in other direction crossing the one direction. The first bonding portion has a first width at a first point of the first side and has a second width smaller than the first width at a second point of the third side.

Abstract: An organic light-emitting display device includes a first pattern electrode, a second pattern electrode, and a third pattern electrode, each being electrically connected to a driving electrode, an organic light-emitting structure disposed on the first to third pattern electrodes, a common electrode disposed on the organic light-emitting structure, and a resonance-adjusting pattern disposed between the first pattern electrode and the organic light-emitting structure, the resonance-adjusting pattern overlapping a first light-emitting area in a plan view and including a conductive oxide. The organic light-emitting structure includes a hole-transporting layer, a light-emitting layer, and an electron-transporting layer. The light-emitting layer includes a common light-emitting layer continuously extending in the organic light-emitting structure, and a light-emitting pattern overlapping the third pattern electrode in a plan view.

Abstract: A deposition mask for making a display device, the deposition mask includes: a frame including a first opening; a first member disposed above the first opening of the frame and including a first portion surrounding at least one second opening and a second portion disposed in the second opening and physically separated from the first portion; and a second member disposed on the first member and including a first connecting portion connected to the frame and a second mesh portion overlapping the second portion.

Abstract: A display device may include a first electrode, a second electrode, an emission layer, an intervening layer, and a first encapsulation layer. The second electrode may overlap the first electrode. The emission layer may be disposed between the first electrode and the second electrode, may overlap the first electrode, and may include a light emitting material. The intervening layer may directly contact the second electrode, may be spaced from each of the first electrode and the emission layer, and may include a fluorine compound. A first section of the first encapsulation layer may overlap the emission layer. The intervening layer may be positioned between the second electrode and a second section of the first encapsulation layer.

Abstract: A deposition mask for making a display device, the deposition mask includes: a frame including a first opening; a first member disposed above the first opening of the frame and including a first portion surrounding at least one second opening and a second portion disposed in the second opening and physically separated from the first portion; and a second member disposed on the first member and including a first connecting portion connected to the frame and a second mesh portion overlapping the second portion.

Abstract: A deposition mask including a resin film including first holes, a non-resin layer disposed on the resin film and including second holes corresponding to the first holes, and a protective layer disposed on the non-resin layer and including third holes corresponding to the first holes, wherein the protective layer includes a first portion disposed on a top surface of the non-resin layer, and a second portion covering a side surface of the second holes of the non-resin layer.

Abstract: A display device may include a first electrode, a second electrode, an emission layer, an intervening layer, and a first encapsulation layer. The second electrode may overlap the first electrode. The emission layer may be disposed between the first electrode and the second electrode, may overlap the first electrode, and may include a light emitting material. The intervening layer may directly contact the second electrode, may be spaced from each of the first electrode and the emission layer, and may include a fluorine compound. A first section of the first encapsulation layer may overlap the emission layer. The intervening layer may be positioned between the second electrode and a second section of the first encapsulation layer.

Abstract: Provided are an exposure apparatus including a light source unit which provides light for exposure and comprises micro light emitting diodes arranged in a matrix form; a substrate transfer unit which transfers a target substrate; and a control unit which controls at least one of the light source unit and the substrate transfer unit. The control unit allocates coordinates or an address to each micro light emitting diode and individually controls an amount of light of each micro light emitting diode according to a preset pattern based on the coordinates or the address.

Abstract: A deposition mask for making a display device, the deposition mask includes: a frame including a first opening; a first member disposed above the first opening of the frame and including a first portion surrounding at least one second opening and a second portion disposed in the second opening and physically separated from the first portion; and a second member disposed on the first member and including a first connecting portion connected to the frame and a second mesh portion overlapping the second portion.

Abstract: Provided is a method of manufacturing a light-emitting display device. The method of manufacturing a light-emitting display device may comprise: forming a first electrode on a substrate, the substrate having a plurality of first pixel areas and a plurality of second pixel areas, the first electrode being formed in each of the first and second pixel areas such that corresponding first and second pixels are formed; forming a pixel defining layer on the substrate, the pixel defining layer having an opening exposing the first electrode of each of the first and second pixels; forming a first photoresist pattern on the pixel defining layer, the first photoresist pattern having a first pattern opening exposing the first electrode of each of the first pixels; forming a light-emitting layer on the first electrode exposed through the first pattern opening; and removing the first photoresist pattern.

Abstract: Provided is a method of manufacturing a light-emitting display device. The method of manufacturing a light-emitting display device may comprise: forming a first electrode on a substrate, the substrate having a plurality of first pixel areas and a plurality of second pixel areas, the first electrode being formed in each of the first and second pixel areas such that corresponding first and second pixels are formed; forming a pixel defining layer on the substrate, the pixel defining layer having an opening exposing the first electrode of each of the first and second pixels; forming a first photoresist pattern on the pixel defining layer, the first photoresist pattern having a first pattern opening exposing the first electrode of each of the first pixels; forming a light-emitting layer on the first electrode exposed through the first pattern opening; and removing the first photoresist pattern.

Abstract: An organic light emitting display panel and associated methods, the panel including a substrate; an organic light emitting diode (OLED) on the substrate; and an encapsulation member to separate the OLED from an external environment, wherein the OLED includes a first electrode on the substrate; a pixel defining layer exposing the first electrode and including a flat planar surface and an inclined planar surface extending from the flat planar surface such that the inclined planar surface overlaps an edge of the first electrode; an organic layer, the organic layer including a first region on the first electrode and a second region on the inclined planar surface; and a second electrode on the organic layer, and wherein, in the second region, a thickness of the organic layer is decreased along a direction extending away from the first region.

Abstract: An organic light emitting display panel and associated methods, the panel including a substrate; an organic light emitting diode (OLED) on the substrate; and an encapsulation member to separate the OLED from an external environment, wherein the OLED includes a first electrode on the substrate; a pixel defining layer exposing the first electrode and including a flat planar surface and an inclined planar surface extending from the flat planar surface such that the inclined planar surface overlaps an edge of the first electrode; an organic layer, the organic layer including a first region on the first electrode and a second region on the inclined planar surface; and a second electrode on the organic layer, and wherein, in the second region, a thickness of the organic layer is decreased along a direction extending away from the first region.

Abstract: A method of manufacturing a thin film transistor (“TFT”) substrate includes forming a gate insulating film and an active layer on a substrate, forming a data metal layer including a first, second, and third metal layers on the active layer, forming a first photoresist pattern on the data metal layer, dry-etching the third metal layer by using the first photoresist pattern, simultaneously dry-etching the second and first metal layers by using the first photoresist pattern, dry-etching the active layer by using the first photoresist pattern, etching the first photoresist pattern to form a second photoresist pattern by which the channel region is removed and forming a source electrode and a drain electrode by dry-etching the channel region of the data metal layer by using the second photoresist pattern.

Abstract: An array substrate including a plurality of pixel regions transmitting light includes a switching element disposed in each of the pixel regions defined by gate and source lines, wherein the switching element is electrically connected to the gate and source lines, a pixel electrode electrically connected to the switching element, a first insulating layer disposed on the switching element, and a second insulating layer disposed under the first insulating layer, wherein a thickness of the second insulating layer is dependent on a peak wavelength of red light.

Abstract: A gate insulating layer, an active layer and a data metal film are sequentially formed on a substrate. A first photoresist pattern having a relatively small thickness in a channel forming area with respect to a thickness of the photoresist pattern not in the channel forming area is formed on the data metal film. The data metal film and the active layer are sequentially etched using the first photoresist pattern. The active layer is etched using the first photoresist pattern. The first photoresist pattern is dry etched using a gas mixture including a sulfur hexafluoride gas and an oxygen gas to form a second photoresist pattern with an opening formed in the channel forming area. The data metal film is then etched using the second photoresist pattern. Dry, wet or acid cleaning procedures used within the manufacturing method reduce formation of stringers in the substrate.

Abstract: A method of manufacturing a thin film transistor (“TFT”) substrate includes forming a gate insulating film and an active layer on a substrate, forming a data metal layer including a first, second, and third metal layers on the active layer, forming a first photoresist pattern on the data metal layer, dry-etching the third metal layer by using the first photoresist pattern, simultaneously dry-etching the second and first metal layers by using the first photoresist pattern, dry-etching the active layer by using the first photoresist pattern, etching the first photoresist pattern to form a second photoresist pattern by which the channel region is removed and forming a source electrode and a drain electrode by dry-etching the channel region of the data metal layer by using the second photoresist pattern.

Abstract: An array substrate including a plurality of pixel regions transmitting light includes a switching element disposed in each of the pixel regions defined by gate and source lines, wherein the switching element is electrically connected to the gate and source lines, a pixel electrode electrically connected to the switching element, a first insulating layer disposed on the switching element, and a second insulating layer disposed under the first insulating layer, wherein a thickness of the second insulating layer is dependent on a peak wavelength of red light.