Patents by Inventor Duen-Wu Hua

Duen-Wu Hua has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050092962
    Abstract: An aqueous chemical mechanical polishing slurry is provided that comprises precipitated amorphous silica abrasive particles treated with acidic aluminum. Also provided is a method of polishing an electronic component substrate comprising the steps of: a) obtaining an electronic component substrate, the electronic component substrate having an insulating film deposited over it, an interconnection pattern formed in the insulating film, and interconnection material deposited on the insulated film and in the interconnection pattern; and b) polishing the interconnection material until a surface of said insulating film is exposed by using an aqueous chemical mechanical polishing slurry comprising: precipitated amorphous silica abrasive particles treated with acidic aluminum.
    Type: Application
    Filed: December 14, 2004
    Publication date: May 5, 2005
    Inventors: Duen-Wu Hua, Frands Nielsen
  • Publication number: 20040202601
    Abstract: The present invention provides methods and compositions comprising inorganic solids for use as pigments in paints, papers and plastics.
    Type: Application
    Filed: April 30, 2004
    Publication date: October 14, 2004
    Applicant: Millennium Inorganic Chemicals, Inc.
    Inventors: Fu-Chu Wen, Duen-Wu Hua, Deborah E. Busch
  • Publication number: 20040162006
    Abstract: An aqueous chemical mechanical polishing slurry is provided that comprises precipitated amorphous silica abrasive particles treated with acidic aluminum. Also provided is a method of polishing an electronic component substrate comprising the steps of: a) obtaining an electronic component substrate, the electronic component substrate having an insulating film deposited over it, an interconnection pattern formed in the insulating film, and interconnection material deposited on the insulated film and in the interconnection pattern; and b) polishing the interconnection material until a surface of said insulating film is exposed by using an aqueous chemical mechanical polishing slurry comprising: precipitated amorphous silica abrasive particles treated with acidic aluminum.
    Type: Application
    Filed: February 14, 2003
    Publication date: August 19, 2004
    Inventors: Duen-Wu Hua, Frands Nielsen
  • Patent number: 6743286
    Abstract: The present invention provides methods and compositions comprising inorganic solids for use as pigments in paints, papers and plastics.
    Type: Grant
    Filed: August 1, 2001
    Date of Patent: June 1, 2004
    Assignee: Millennium Inorganic Chemicals, Inc.
    Inventors: Fu-Chu Wen, Duen-Wu Hua, Deborah E. Busch
  • Patent number: 6569920
    Abstract: The present invention provides slurries and methods of making slurries having improved stability comprising below about 78 weight-percent rutile titanium dioxide based on the total weight of the slurry, an amorphous alumina compound surface treated titanium dioxide, a polyacrylic acid dispersing agent having a molecular weight in the range of from about 2,000 to about 5,000 that is neutralized with a neutralizing agent having a monovalent group, and water; wherein the slurry has a pH of from about 6 to about 8. The slurries of the present invention resist gel formation.
    Type: Grant
    Filed: August 16, 2000
    Date of Patent: May 27, 2003
    Assignee: Millennium Inorganic Chemicals, Inc.
    Inventors: Fu-Chu Wen, Duen-Wu Hua
  • Publication number: 20030024437
    Abstract: The present invention provides methods and compositions comprising inorganic solids for use as pigments in paints, papers and plastics.
    Type: Application
    Filed: August 1, 2001
    Publication date: February 6, 2003
    Inventors: Fu-Chu Wen, Duen-Wu Hua, Deborah E. Busch