Patents by Inventor Duncan Walter Bromley

Duncan Walter Bromley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Determining position and curvature information directly from a surface of a patterning device
    Patent number: 9377700
    Abstract: Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: June 28, 2016
    Assignees: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Mark Josef Schuster, Santiago E. Del Puerto, Daniel Nathan Burbank, Duncan Walter Bromley, Franciscus Godefridus Casper Bijnen
  • DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURFACE OF A PATTERNING DEVICE
    Publication number: 20140307246
    Abstract: Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.
    Type: Application
    Filed: May 31, 2013
    Publication date: October 16, 2014
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Mark Josef Schuster, Santiago E Del Puerto, Daniel Nathan Burbank, Duncan Walter Bromley, Franciscus Godefridus Casper Bijnen