Patents by Inventor Duoduo WANG

Duoduo WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240188328
    Abstract: A display substrate and a display device are provided. The display substrate includes: a plurality of pixel units arranged on a base substrate; a first conductive layer, a semiconductor layer, a second conductive layer and a pixel definition layer sequentially arranged on the base substrate. A pixel driving circuit includes a sensing transistor, a storage capacitance and a capacitance wire. A source electrode and a drain electrode of the sensing transistor are located in the second conductive layer, a second capacitance electrode of the storage capacitance and the capacitance wire are located in the first conductive layer. The capacitance wire includes a capacitance wire body portion extending in a second direction. For one same sub-pixel, an orthographic projection of the capacitance wire body portion of the pixel driving circuit thereof on the base substrate is spaced apart from that of the light emitting region thereof on the base substrate.
    Type: Application
    Filed: April 28, 2022
    Publication date: June 6, 2024
    Inventors: Yang Zhang, Qinghe Wang, Haitao Wang, Duoduo Wang, Shan Liu, Xiaodong Zhang
  • Publication number: 20240164179
    Abstract: A light-emitting substrate includes: a substrate; and at least one coupling portion and at least one auxiliary cathode pattern disposed on the substrate. Each auxiliary cathode region is provided with a coupling portion and an auxiliary cathode pattern coupled to the coupling portion. The auxiliary cathode pattern includes at least one disconnection portion, and each disconnection portion includes first, second and third conductive pattern layers. An orthographic projection of an edge of the second conductive pattern layer on the substrate is located within orthographic projections of edges of the third and first conductive pattern layers on the substrate. A total perimeter of at least one orthographic projection, on the substrate, of at least one edge of at least one third conductive pattern layer in the at least one disconnection portion is greater than a perimeter of an orthographic projection of an edge of the auxiliary cathode region on the substrate.
    Type: Application
    Filed: November 23, 2021
    Publication date: May 16, 2024
    Applicants: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Yang ZHANG, Bin ZHOU, Ning LIU, Jun LIU, Peng WANG, Lei ZHOU, Duoduo WANG