Patents by Inventor Durairaj Baskaran

Durairaj Baskaran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240010865
    Abstract: The disclosed subject matter relates compounds of structure (I), and polymers of structure (II) having a polydispersity ranging from 1 to about 1.1, compositions comprising said polymers and a spin casting solvent, the process of forming a pinning layer el selectively on metal with said composition and the process of using said pinning layers to affect chemoepitaxy directed self-assembly of an overlying block copolymer, and the subsequent process of pattern transfer of this self-assembled layer into a substrate by etching.
    Type: Application
    Filed: October 18, 2021
    Publication date: January 11, 2024
    Inventors: EunJeong JEONG, Durairaj BASKARAN, Jihoon KIM
  • Publication number: 20240002571
    Abstract: The disclosed subject matter relates to a block polymer comprising structure (1): (A)-(C)-(B), wherein (A) is a first polymer block segment comprising a block segment selected from structure (1a), structure (1b), and a mixture of structures (1a) an (1b), (C) is a spacer moiety comprising structure (1c); and wherein B) is a second polymer block segment comprising repeat units derived from either an alkyl 2-methylenealkanoate, a lactone; a cyclic carbonate, an oxirane, or an oxetane. The disclose matter also pertains to a composition of said block polymer in a spin casting solvent and using this solution in a process of directed self-assembly.
    Type: Application
    Filed: December 15, 2021
    Publication date: January 4, 2024
    Inventors: Durairaj BASKARAN, Md S. RAHMAN, Sachin BOBADE, Edward W. NG, Victor MONREAL, EunJeong JEONG
  • Publication number: 20220389135
    Abstract: One aspect of this invention is a novel functional polymer having a polydispersity from 1 to about 1.12 comprising at least one reactive moiety, selected from a moiety comprising at least one N-coordinative functional group having at least one lone pair of electrons, a moiety comprising a dialkylsilyl group, or a mixture of both groups, wherein said reactive moiety is present in said functional styrenic polymer either on a repeat unit, on an end group or on both, and said N-coordinative functional group is either a monodentate N-coordinative functional group, a polydendate N-coordinative group or a mixture of thereof, and said monodentate coordinative functional group is an azide moiety (—N3) or a cyano moiety (—CN). Another aspect of this invention is the use of these novel polymer to selectively deposit a DSA directing layer on a metallic substrate.
    Type: Application
    Filed: November 24, 2020
    Publication date: December 8, 2022
    Inventors: Durairaj BASKARAN, MD S. RAHMAN, Sachin BOBADE
  • Publication number: 20220010125
    Abstract: The present invention relates to a composition comprising components a), b) and c). The component a) is a block copolymer or a blend of block copolymers. The component b) is a low Tg additive selected from the group consisting of an oligo random oligo random copolymer b-1), an oligo diblock copolymer b-2), an oligo diblock copolymer b-3) and a mixture of at least two of these. The component c) is a is a spin casting organic solvent. The invention also pertains to the use of said compositions in directed self-assembly. The invention further pertains to the novel oligo diblock copolymer b-2) which is an oligo diblock copolymer of block A-b) and block B-b), wherein block A-b) is a random copolymer of repeat units having structures (III), and (IV and block B-b) is a random copolymer of repeat units having structures (V), and (VI). Formulas (III), (IV), (V), (VI).
    Type: Application
    Filed: January 15, 2020
    Publication date: January 13, 2022
    Inventors: Durairaj BASKARAN, Victor MONREAL
  • Publication number: 20220002575
    Abstract: The present invention relates to a random copolymer comprising repeat units of structure (I), (II), (III), and (IV). The invention also pertains to a neutral layer composition comprised of said random copolymer and also pertains to the use of said neutral layer composition to make a crosslinked neutral layer film on a substrate, which can enable self-assembly of a film of a block copolymer overlying said crosslinked neutral layer, wherein said block copolymer contains etch resistant and etchable block, and whose self-assembled pattern is used, through etching, to create either an array of contact holes or posts in said substrate.
    Type: Application
    Filed: December 4, 2019
    Publication date: January 6, 2022
    Inventors: Durairaj BASKARAN, MD S. RAHMAN, Victor MONREAL
  • Patent number: 11067893
    Abstract: The present invention relates to a novel styrenic polymer and to the novel composition comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity from 1 to 1.3 and further wherein each polymer chain of the styrenic polymer is capped with one end group of structure 1), wherein, and L is a linking group selected from the group consisting of a direct valence bond, oxy (—O—), carbonyloxy, (—(C?O)—O—), carbonate (—O—(C?O)—O—); L2 is a C-1 to C-20 substituted or unsubstituted alkylene spacer, an arylene spacer or a direct valence bond, R, is hydrogen, a halide, a C-1 to C-20 alkyl moiety, or a C-1 to C-20 alkyloxy moiety, m is an integer from 1 to 3; and (I) represent the direct valence bond attaching the end group 1) to the end of the polymer chain of the styrenic polymer. In another aspect of this invention it pertains to the use of this composition to create self-assembly process.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: July 20, 2021
    Assignee: Merck Patent GMbH
    Inventors: Hengpeng Wu, JiHoon Kim, Jianhui Shan, Durairaj Baskaran, Md S. Rahman
  • Patent number: 11031237
    Abstract: The present invention relates to new aromatic-amino functional siloxanes, which are compounds comprising one or two tail groups X2, and a linking group L of structure (2) linking each said tail group to said head group, wherein the head group X has structure (1), containing an optional organic moiety Y, wherein the attachment point of said tail group X2 through said linking group L to the head group X1, may be, at positions a, b, c, d, or e. Another aspect of this invention are compositions containing these novel aromatic amino functional siloxane. A further aspect of this invention are compositions comprised of the above novel aromatic-amino functional siloxanes, and also the composition resulting from the aging of these compositions at room temperature for about 1 day to about 4 weeks.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: June 8, 2021
    Assignee: Merck Patent GMbH
    Inventors: Sachin Bobade, Orest Polishchuk, Munirathna Padmanaban, Durairaj Baskaran
  • Publication number: 20200273701
    Abstract: The present invention relates to new aromatic-amino functional siloxanes, which are compounds comprising one or two tail groups X2, and a linking group L of structure (2) linking each said tail group to said head group, wherein the head group X has structure (1), containing an optional organic moiety Y, wherein the attachment point of said tail group X2 through said linking group L to the head group X1, may be, at positions a, b, c, d, or e. Another aspect of this invention are compositions containing these novel aromatic amino functional siloxane. A further aspect of this invention are compositions comprised of the above novel aromatic-amino functional siloxanes, and also the composition resulting from the aging of these compositions at room temperature for about 1 day to about 4 weeks.
    Type: Application
    Filed: October 23, 2018
    Publication date: August 27, 2020
    Inventors: Sachin BOBADE, Orest POLISHCHUK, Munirathna PADMANABAN, Durairaj BASKARAN
  • Publication number: 20200019062
    Abstract: The present invention relates to a novel styrenic polymer and to the novel composition comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity from 1 to 1.3 and further wherein each polymer chain of the styrenic polymer is capped with one end group of structure 1), wherein, and L is a linking group selected from the group consisting of a direct valence bond, oxy (—O—), carbonyloxy, (—(C?O)—O—), carbonate (—O—(C?O)—O—); L2 is a C-1 to C-20 substituted or unsubstituted alkylene spacer, an arylene spacer or a direct valence bond, R, is hydrogen, a halide, a C-1 to C-20 alkyl moiety, or a C-1 to C-20 alkyloxy moiety, m is an integer from 1 to 3; and (I) represent the direct valence bond attaching the end group 1) to the end of the polymer chain of the styrenic polymer. In another aspect of this invention it pertains to the use of this composition to create self-assembly process.
    Type: Application
    Filed: December 19, 2017
    Publication date: January 16, 2020
    Inventors: Hengpeng Wu, JiHoon Kim, Jianhui Shan, Durairaj Baskaran, Md S. Rahman
  • Patent number: 10259907
    Abstract: The present invention relates to a novel block copolymer of structure 1, wherein, A- is a block polymer chain, B is a block polymer chain, wherein, A- and B- are chemically different, covalently connected polymer chains, which are phase separable and the moiety X(Y(Z)b)a is a junction group, which comprises a surface active pendant moiety Y(Z)b wherein: a is an integer from 1 to 4 denoting the number of surface active pendant moieties Y(Z)b on X, b is an integer from 1 to 5 denoting the number of Z moieties on the linking moiety Y, X is a linking group between the A polymer block, the B polymer block and the moiety Y, Y is a linking group or a direct valence bond between X and Z; and Z is a moiety independently selected from, a fluorine containing moiety, a Si1-Si8 siloxane containing moiety or a hydrocarbon moiety with at least 18 carbons, and further wherein the junction group X(Y(Z)b)a has a surface energy less than that that of the block A and less than that of the block B.
    Type: Grant
    Filed: February 20, 2015
    Date of Patent: April 16, 2019
    Assignees: AZ Electronic Materials (Luxembourg) S.à r.l., IBM Corporation
    Inventors: Ankit Vora, Eri Hirahara, Joy Cheng, Durairaj Baskaran, Orest Polishchuk, Melia Tjio, Margareta Paunescu, Daniel Sanders, Guanyang Lin
  • Patent number: 10155879
    Abstract: The present invention relates to non aqueous, graftable coating composition comprised of a homogenous solution of a polymer and a spin casting organic solvent, where the composition does not contain acidic compounds, coloring particles, pigments or dyes, and the polymer has a linear polymer chain structure which is comprised of repeat units derived from monomers containing a single polymerizable olefinic carbon double bond, and the polymer contains at least one triarylmethyl chalcogenide containing moiety which is selected from the group consisting of repeat units having structure (I) an end chain group unit of structure (II) and mixtures thereof, and the polymer does not contain any repeat units or end groups containing water ionizable groups, ionic groups, free thiol groups, or free hydroxy groups, and where A1, A2, and A3 are independently an Aryl or a substituted Aryl; Y is a chalcogen selected from O, S, Se or Te; X1 and X2 are individually selected organic spacers; P1 is an organic polymer repeat unit m
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: December 18, 2018
    Assignee: AZ Electronic Materials (Luxembourg) S.à.r.l.
    Inventors: Guanyang Lin, Hengpeng Wu, JiHoon Kim, Jian Yin, Durairaj Baskaran, Jianhui Shan
  • Publication number: 20170174931
    Abstract: The present invention relates to non aqueous, graftable coating composition comprised of a homogenous solution of a polymer and a spin casting organic solvent, where the composition does not contain acidic compounds, coloring particles, pigments or dyes, and the polymer has a linear polymer chain structure which is comprised of repeat units derived from monomers containing a single polymerizable olefinic carbon double bond, and the polymer contains at least one triarylmethyl chalcogenide containing moiety which is selected from the group consisting of repeat units having structure (I) an end chain group unit of structure (II) and mixtures thereof, and the polymer does not contain any repeat units or end groups containing water ionizable groups, ionic groups, free thiol groups, or free hydroxy groups, and where A1, A2, and A3 are independently an Aryl or a substituted Aryl; Y is a chalcogen selected from O, S, Se or Te; X1 and X2 are individually selected organic spacers; P1 is an organic polymer repeat unit m
    Type: Application
    Filed: December 21, 2015
    Publication date: June 22, 2017
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Guanyang Lin, Hengpeng Wu, JiHoon Kim, Jian Yin, Durairaj Baskaran, Jianhui Shan
  • Publication number: 20160244557
    Abstract: The present invention relates to a novel block copolymer of structure 1, wherein, A- is a block polymer chain, B is a block polymer chain, wherein, A- and B- are chemically different, covalently connected polymer chains, which are phase separable and the moiety X(Y(Z)b)a is a junction group, which comprises a surface active pendant moiety Y(Z)b wherein: a is an integer from 1 to 4 denoting the number of surface active pendant moieties Y(Z)b on X, b is an integer from 1 to 5 denoting the number of Z moieties on the linking moiety Y, X is a linking group between the A polymer block, the B polymer block and the moiety Y, Y is a linking group or a direct valence bond between X and Z; and Z is a moiety independently selected from, a fluorine containing moiety, a Si1-Si8 siloxane containing moiety or a hydrocarbon moiety with at least 18 carbons, and further wherein the junction group X(Y(Z)b)a has a surface energy less than that that of the block A and less than that of the block B.
    Type: Application
    Filed: February 20, 2015
    Publication date: August 25, 2016
    Applicants: International Business Machines Corporation
    Inventors: Ankit VORA, Eri HIRAHARA, Joy CHENG, Durairaj BASKARAN, Orest POLISHCHUK, Melia TJIO, Margareta PAUNESCU, Daniel SANDERS, Guanyang LIN
  • Publication number: 20150011446
    Abstract: The present invention relates (per)fluoropolyether compounds comprising a (per)fluoropolyether chain (Rf) having at least two chain ends, wherein at least one of said chain ends have a bi- or ter-phenyl group bearing at least one nitro group and, optionally one or more further substituents. The invention also relates to processes for the preparation of such compounds and to their use for the preparation of lubricant compositions in the form of oils or greases.
    Type: Application
    Filed: February 12, 2013
    Publication date: January 8, 2015
    Inventors: Durairaj Baskaran, Prakash Wadgaonkar, Shamal Menon, Claudio Adolfo Pietro Tonelli
  • Patent number: 5973086
    Abstract: A process for the living anionic polymerization of alkyl(meth)acrylic monomers, involving polymerizing the monomers in the presence of an initiator comprising a carbanion and a metal or nonmetal salt of perchloric acid. The initiator has the formula (I): ##STR1## wherein R.sub.1 =a linear or branched alkyl group having one to six carbon atoms, R.sub.2 =a phenyl or alkyl group having one to six carbon atoms, R.sub.3 =a phenyl or an ester group and M.sup.+ is an alkali, alkaline earth metal or quarternary ammonium cation containing 1-8 carbon atoms in an alkyl group thereof.
    Type: Grant
    Filed: December 27, 1996
    Date of Patent: October 26, 1999
    Assignee: Council of Scientific & Industrial Research
    Inventors: Durairaj Baskaran, Swaminathan Sivaram