Patents by Inventor Durga Prasanna Panda

Durga Prasanna Panda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography method and device
    Patent number: 9122168
    Abstract: Lithography methods and devices are shown that include a semiconductor structure such as a mask. Methods and devices are shown that include a pattern of mask features and a composite feature. Selected mask features include doubled mask features. Methods and devices shown may provide varied feature sizes (including sub-resolution) with a small number of processing steps.
    Type: Grant
    Filed: May 12, 2014
    Date of Patent: September 1, 2015
    Assignee: Micron Technology, Inc.
    Inventor: Durga Prasanna Panda
  • LITHOGRAPHY METHOD AND DEVICE
    Publication number: 20140246756
    Abstract: Lithography methods and devices are shown that include a semiconductor structure such as a mask. Methods and devices are shown that include a pattern of mask features and a composite feature. Selected mask features include doubled mask features. Methods and devices shown may provide varied feature sizes (including sub-resolution) with a small number of processing steps.
    Type: Application
    Filed: May 12, 2014
    Publication date: September 4, 2014
    Applicant: Micron Technology, Inc.
    Inventor: Durga Prasanna Panda
  • Lithography method and device
    Patent number: 8722320
    Abstract: Lithography methods and devices are shown that include a semiconductor structure such as a mask. Methods and devices are shown that include a pattern of mask features and a composite feature. Selected mask features include doubled mask features. Methods and devices shown may provide varied feature sizes (including sub-resolution) with a small number of processing steps.
    Type: Grant
    Filed: July 27, 2011
    Date of Patent: May 13, 2014
    Inventor: Durga Prasanna Panda
  • LITHOGRAPHY METHOD AND DEVICE
    Publication number: 20130026610
    Abstract: Lithography methods and devices are shown that include a semiconductor structure such as a mask. Methods and devices are shown that include a pattern of mask features and a composite feature. Selected mask features include doubled mask features. Methods and devices shown may provide varied feature sizes (including sub-resolution) with a small number of processing steps.
    Type: Application
    Filed: July 27, 2011
    Publication date: January 31, 2013
    Inventor: Durga Prasanna Panda