Patents by Inventor Durk Oeds Van Der Ploeg

Durk Oeds Van Der Ploeg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
    Patent number: 7916927
    Abstract: Building of a model profile for a target is disclosed. An embodiment of the method includes importing an image of a known object and superimposing, on this image, either by hand or automatically, an estimated profile. The estimated profile is defined mathematically and adjusted segment by segment in order to match the image such that the adjusted estimated profile may be stored alongside a diffraction spectrum associated with the image. Alternatively or additionally, a user may trace (or free-draw) the profile of a known image and subsequently map a shape-definer of a mathematical function such as a polynomial equation, a spline or a vector onto the estimated profile in order to obtain a profile and one or more variables of that profile that may be used to reconstruct the profile of an unknown object from its diffraction pattern.
    Type: Grant
    Filed: January 16, 2007
    Date of Patent: March 29, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Hugo Augustinus Joseph Cramer, Antoine Gaston Marie Kiers, Durk Oeds Van Der Ploeg, Goce Naumoski, Roland Mark Van Weel
  • Inspection method and apparatus,lithographic apparatus, lithographic processing cell and device manufacturing method
    Publication number: 20080170780
    Abstract: Building of a model profile for a target is disclosed. An embodiment of the method includes importing an image of a known object and superimposing, on this image, either by hand or automatically, an estimated profile. The estimated profile is defined mathematically and adjusted segment by segment in order to match the image such that the adjusted estimated profile may be stored alongside a diffraction spectrum associated with the image. Alternatively or additionally, a user may trace (or free-draw) the profile of a known image and subsequently map a shape-definer of a mathematical function such as a polynomial equation, a spline or a vector onto the estimated profile in order to obtain a profile and one or more variables of that profile that may be used to reconstruct the profile of an unknown object from its diffraction pattern.
    Type: Application
    Filed: January 16, 2007
    Publication date: July 17, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hugo Augustinus Joseph Cramer, Antoine Gaston Marie Kiers, Durk Oeds Van Der Ploeg, Goce Naumoski, Roland Mark Van Weel