Patents by Inventor Dusik BAE

Dusik BAE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pollutant detection devices and monitoring system having the same
    Patent number: 12153016
    Abstract: A detection device includes a transfer device to travel along a rail while gripping a carrier, and a detection structure mounted on the carrier. The detection structure includes a collector to suck in air, a detector connected to the collector, the detector including a plurality of sensors, a plurality of sensor control boards receiving electrical signals from the plurality of sensors, the plurality of sensor control boards generating, based on the electrical signals, type data and concentration data regarding pollutants included in the air sucked in by the collector, and a communication control board connected to the plurality of sensor control boards.
    Type: Grant
    Filed: October 12, 2021
    Date of Patent: November 26, 2024
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dusik Bae, Euihyun Roh, Sangyoon Shin, Yongjun Ahn, Youngwook Kim, Mira Park, Hyunwoo Lee, Jeonghun Lim, Wonil Choi, Sojung Park, Jiwoong Shin, Sangkyung Lee, Dongchol Choi
  • GAS PURIFYING FILTER AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME
    Publication number: 20230285897
    Abstract: A gas purifying filter includes a first gas permeable body having a gas inlet surface; a first adsorption layer disposed on the first gas permeable body and including activated carbon on which a phosphoric acid-based compound satisfying the following Formula 1 is supported; a second adsorption layer disposed on the first adsorption layer and including a hydrophobic zeolite having a SiO2/Al2O3 value of about 50 or more; and a second gas permeable body disposed on the second adsorption layer and having a gas outlet surface, where n is an integer greater than or equal to 1.
    Type: Application
    Filed: January 23, 2023
    Publication date: September 14, 2023
    Applicants: Samsung Electronics Co., Ltd., EcoPro HN Co., Ltd.
    Inventors: Mira Park, Hoigu Jang, Jiwoong Shin, Kieung Lee, Yeonju Ji, Jiyoung Kim, Joonseok Min, Dusik Bae, Dongil Shin, Sangyoon Shin, Minseon Lee, Seungbin Lee
  • POLLUTANT DETECTION DEVICES AND MONITORING SYSTEM HAVING THE SAME
    Publication number: 20220283119
    Abstract: A detection device includes a transfer device to travel along a rail while gripping a carrier, and a detection structure mounted on the carrier. The detection structure includes a collector to suck in air, a detector connected to the collector, the detector including a plurality of sensors, a plurality of sensor control boards receiving electrical signals from the plurality of sensors, the plurality of sensor control boards generating, based on the electrical signals, type data and concentration data regarding pollutants included in the air sucked in by the collector, and a communication control board connected to the plurality of sensor control boards.
    Type: Application
    Filed: October 12, 2021
    Publication date: September 8, 2022
    Inventors: Dusik BAE, Euihyun ROH, Sangyoon SHIN, Yongjun AHN, Youngwook KIM, Mira PARK, Hyunwoo LEE, Jeonghun LIM, Wonil CHOI, Sojung PARK, Jiwoong SHIN, Sangkyung LEE, Dongchol CHOI
  • Method of processing substrate and method of fabricating semiconductor device using the same
    Patent number: 10431506
    Abstract: Disclosed are a method of processing a substrate and a method of fabricating a semiconductor device using the same. The method of processing a substrate comprises forming a mask layer on a substrate, inspecting the mask layer, and forming a mask pattern based on an inspection result of the mask layer. The operation of inspecting the mask layer comprises using Raman spectrum analysis to detect defects in the mask layer.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: October 1, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dusik Bae, Yoonmi Lee, Hyeogki Kim, Kyoungsil Park, JungDae Park
  • METHOD OF PROCESSING SUBSTRATE AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20180204777
    Abstract: Disclosed are a method of processing a substrate and a method of fabricating a semiconductor device using the same. The method of processing a substrate comprises forming a mask layer on a substrate, inspecting the mask layer, and forming a mask pattern based on an inspection result of the mask layer. The operation of inspecting the mask layer comprises using Raman spectrum analysis to detect defects in the mask layer.
    Type: Application
    Filed: December 20, 2017
    Publication date: July 19, 2018
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dusik BAE, Yoonmi Lee, Hyeogki Kim, Kyoungsil Park, JungDae Park