Abstract: In one embodiment, a method of fabricating an integrated circuit includes the steps of: (i) forming composite spacers on sidewalls of a transistor gate, each of the composite spacers comprising a first liner having a stepped portion and a disposable spacer material over the stepped portion; (ii) forming a source/drain region by performing ion implantation through a portion of the first liner over the source/drain region; (iii) replacing the disposable spacer material with a second liner formed over the first liner after forming the source/drain region; (iv) forming a pre-metal dielectric over the second liner; and (v) forming a self-aligned contact through the pre-metal dielectric. Among other advantages, the method allows for an increased contact area for a self-aligned contact.