Patents by Inventor Duygu AKBULUT
Duygu AKBULUT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11940739Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: December 27, 2021Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Patent number: 11927891Abstract: A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.Type: GrantFiled: December 20, 2018Date of Patent: March 12, 2024Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Duygu Akbulut, Alessandro Polo, Sebastianus Adrianus Goorden
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Patent number: 11333985Abstract: The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.Type: GrantFiled: June 5, 2019Date of Patent: May 17, 2022Assignee: ASML Netherlands B.V.Inventors: Sebastianus Adrianus Goorden, Simon Reinald Huisman, Duygu Akbulut, Alessandro Polo, Johannes Antonius Gerardus Akkermans, Arie Jeffrey Den Boef
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Publication number: 20220121127Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: December 27, 2021Publication date: April 21, 2022Applicant: ASML Netherlands B.V.Inventors: Nitesh PANDEY, Arie Jeffrey DEN BOEF, Duygu AKBULUT, Marimus Johannes Maria VAN DAM, Hans BUTLER, Hugo Augustinus Joseph CRAMER, Engelbertus Antonius Franciscus VAN DER PASCH, Ferry ZIJP, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Marinus Petrus REIJNDERS
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Patent number: 11262661Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: June 5, 2019Date of Patent: March 1, 2022Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Patent number: 11243470Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.Type: GrantFiled: August 21, 2017Date of Patent: February 8, 2022Assignee: ASML Netherlands B.V.Inventors: Nitish Kumar, Adrianus Johannes Hendrikus Schellekens, Sietse Thijmen Van Der Post, Ferry Zijp, Willem Maria Julia Marcel Coene, Peter Danny Van Voorst, Duygu Akbulut, Sarathi Roy
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Publication number: 20210364936Abstract: A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.Type: ApplicationFiled: December 20, 2018Publication date: November 25, 2021Applicant: ASML Netherlands B.V.Inventors: Nitesh PANDEY, Duygu AKBULUT, Alessandro POLO, Sebastianus Adrianus GOORDEN
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Patent number: 11086240Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.Type: GrantFiled: November 15, 2017Date of Patent: August 10, 2021Assignee: ASML Netherlands B.V.Inventors: Sebastianus Adrianus Goorden, Nitesh Pandey, Duygu Akbulut, Alessandro Polo, Simon Reinaid Huisman
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Patent number: 11042100Abstract: The disclosure relates to measuring a target. In one arrangement, a measurement apparatus is provided that has an optical system configured to illuminate a target with radiation and direct reflected radiation from the target to a sensor. A programmable spatial light modulator in a pupil plane of the optical system is programmed to redirect light in each of a plurality of pupil plane zones in such a way as to form a corresponding plurality of images at different locations on the sensor. Each image is formed by radiation passing through a different respective one of the pupil plane zones.Type: GrantFiled: May 13, 2019Date of Patent: June 22, 2021Assignee: ASML Netherlands B.V.Inventors: Jin Lian, Zili Zhou, Duygu Akbulut, Sergey Tarabrin
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Publication number: 20210124276Abstract: The invention provides a position sensor (300) which comprises an optical system (305, 306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.Type: ApplicationFiled: June 5, 2019Publication date: April 29, 2021Inventors: Sebastianus Adrianus Goorden, Simon Reinald Huisman, Duygu Akbulut, Alessandro Polo, Johannes Antonius Gerardus Akkermans, Arie Jeffrey Den Boef
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Patent number: 10908514Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.Type: GrantFiled: September 6, 2019Date of Patent: February 2, 2021Assignee: ASML Netherlands B.V.Inventors: Janneke Ravensbergen, Duygu Akbulut, Nitesh Pandey, Jin Lian
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Patent number: 10788766Abstract: Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation.Type: GrantFiled: March 6, 2018Date of Patent: September 29, 2020Assignee: ASML Netherlands B.V.Inventors: Sebastianus Adrianus Goorden, Simon Reinald Huisman, Duygu Akbulut, Alessandro Polo, Simon Gijsbert Josephus Mathijssen
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Publication number: 20200103772Abstract: Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation.Type: ApplicationFiled: March 6, 2018Publication date: April 2, 2020Applicant: ASML Netherlands B.V.Inventors: Sebastianus Adrianus GOORDEN, Simon Reinald HUISMAN, Duygu AKBULUT, Alessandro POLO, Simon Gijsbert Josephus MATHIJSSEN
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Publication number: 20200089135Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.Type: ApplicationFiled: November 15, 2017Publication date: March 19, 2020Inventors: Sebastianus Adrianus GOORDEN, Nitesh PANDEY, Duygu AKBULUT, Alessandro POLO, Simon Reinald HUISMAN
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Patent number: 10527959Abstract: An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.Type: GrantFiled: June 30, 2017Date of Patent: January 7, 2020Assignee: ASML Netherlands B.V.Inventors: Simon Reinald Huisman, Simon Gijsbert Josephus Mathijssen, Sebastianus Adrianus Goorden, Duygu Akbulut, Alessandro Polo
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Publication number: 20200004165Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.Type: ApplicationFiled: September 6, 2019Publication date: January 2, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Janneke RAVENSBERGEN, Duygu AKBULUT, Nitesh PANDEY, Jin LIAN
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Publication number: 20190384184Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: June 5, 2019Publication date: December 19, 2019Applicant: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscu Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Raaymakers, Marinus Petrus Reijnders
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Publication number: 20190369505Abstract: The disclosure relates to measuring a target. In one arrangement, a measurement apparatus is provided that has an optical system configured to illuminate a target with radiation and direct reflected radiation from the target to a sensor. A programmable spatial light modulator in a pupil plane of the optical system is programmed to redirect light in each of a plurality of pupil plane zones in such a way as to form a corresponding plurality of images at different locations on the sensor. Each image is formed by radiation passing through a different respective one of the pupil plane zones.Type: ApplicationFiled: May 13, 2019Publication date: December 5, 2019Applicant: ASML Netherlands B.V.Inventors: Jin LIAN, Zili ZHOU, Duygu AKBULUT, Sergey TARABRIN
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Patent number: 10444640Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.Type: GrantFiled: October 12, 2018Date of Patent: October 15, 2019Assignee: ASML Netherlands B.V.Inventors: Janneke Ravensbergen, Duygu Akbulut, Nitesh Pandey, Jin Lian
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Publication number: 20190212658Abstract: An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.Type: ApplicationFiled: June 30, 2017Publication date: July 11, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Simon Reinald HUISMAN, Simon Gijsbert Josephus MATHIJSSEN, Sebastianus Adrianus GOORDEN, Duygu AKBULUT, Alessandro POLO