Abstract: Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer.

Abstract: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.

Abstract: Materials for forming an imprint lithography template may be etched at different rates based on physical properties of the layers. Additionally, reflectance of the materials may be monitored to provide substantially uniform erosion of the materials.

Abstract: Methods of determining relative spatial parameters between two substrates in a process of alignment are described. Generally, multiple alignment data may be collected from phase information using a pair of alignment marks.

Abstract: Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm.

Abstract: A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition.

Abstract: Fabricating a cross-point memory structure using two lithography steps with a top conductor and connector or memory element and a bottom conductor orthogonal to the top connector. A first lithography step followed by a series of depositions and etching steps patterns a first channel having a bottom conductor. A second lithography step followed by a series of depositions and etching steps patterns a second channel orthogonal to the first channel and having a memory element connecting the an upper conductor and the lower conductor at their overlaid intersections.

Abstract: Optical and optoelectronic articles incorporating an amorphous diamond-like film are disclosed. Specifically, the invention includes optical or optoelectronic articles containing an amorphous diamond-like film overlying two or more proximate substrates, and to methods of making optical and optoelectronic articles. In certain implementations, the film comprises at least about 30 atomic percent carbon, from about 0 to about 50 atomic percent silicon, and from about 0 to about 50 atomic percent oxygen on a hydrogen-free basis. Another embodiment includes optical or optoelectronic articles containing an amorphous diamond-like film that is further coated with a metallic or polymeric material for attachment to a device package.

Abstract: The present invention provides a method of patterning a substrate, the method including, inter alia, forming a multi-layered structure on the substrate formed from first, second and third materials. The first, second and third materials are exposed to an etch chemistry, with the first and second materials having a common etch rate along a first direction, defining a first etch rate, and the first and third materials having a similar etch rate along a second direction, transversely extending to the first direction, defining a second etch rate. Typically, the etch rate is selected to be different in furtherance of facilitating control of the dimensions of features formed during the etching process.

Abstract: Optical and optoelectronic articles incorporating an amorphous diamond-like film are disclosed. Specifically, the invention includes optical or optoelectronic articles containing an amorphous diamond-like film overlying two or more proximate substrates, and to methods of making optical and optoelectronic articles. In certain implementations, the film comprises at least about 30 atomic percent carbon, from about 0 to about 50 atomic percent silicon, and from about 0 to about 50 atomic percent oxygen on a hydrogen-free basis. Another embodiment includes optical or optoelectronic articles containing an amorphous diamond-like film that is further coated with a metallic or polymeric material for attachment to a device package.

Abstract: The invention relates to systems and methods for characterizing optical devices, and particularly to one that characterizes optical devices such as fiber Bragg gratings. In one embodiment, a system and method include the use of two light sources and four detectors to detect light transmitted through an optical device both before and after the light has been transmitted in each direction through the device.

Abstract: The invention relates to systems and methods for characterizing optical devices, and particularly to one that characterizes optical devices such as fiber Bragg gratings. In one embodiment, a system and method include the use of two light sources and four detectors to detect light transmitted through an optical device both before and after the light has been transmitted in each direction through the device.

Abstract: A method for manufacturing an optical waveguide refractive index grating having a desired grating pitch &Lgr;. The method includes the step of providing a photosensitive waveguide and a writing beam of actinic radiation, the writing beam having an intensity. The waveguide is translated relative to the writing beam at a velocity v(t). The intensity of the writing beam is modulated as a function of time at a frequency f(t), wherein v ⁢ ( t ) f ⁢ ( t ) ≈ Λ . The step of modulating the intensity of the writing beam as a function of time f(t) at a frequency f(t) including the step of varying &Lgr;.

Abstract: A filament organizer comprises a support having a first surface opposite a second surface and further includes a lockable spool and a rotary spool adjacent to the first surface of the support. The organizer has a tensioner attached to the second surface of the support for attachment to the rotary spool by a tension wire to apply tension thereto to transmit tension to a filament disposed between the lockable spool and the rotary spool. Selective reduction in tension on a filament is possible using a tension relief assembly attached to the support. A stacked configuration of a plurality of filament organizers may be formed by suitable alignment of supports.

Abstract: Optical devices using shaped optical fibers and methods for using shaped optical fibers.

Abstract: Optical and optoelectronic articles incorporating an amorphous diamond-like film are disclosed. Specifically, the invention includes optical or optoelectronic articles containing an amorphous diamond-like film overlying two or more proximate substrates, and to methods of making optical and optoelectronic articles. In certain implementations, the film comprises at least about 30 atomic percent carbon, from about 0 to about 50 atomic percent silicon, and from about 0 to about 50 atomic percent oxygen on a hydrogen-free basis. Another embodiment includes optical or optoelectronic articles containing an amorphous diamond-like film that is further coated with a metallic or polymeric material for attachment to a device package.

Abstract: A method for manufacturing an optical fiber refractive index grating. The method comprises the steps of, providing a substantially twist-free length of an optical fiber between a first spool and a second spool before attaching the first spool and the second spool to a support having a first surface opposite a second surface. The support and spools provide a filament organizer including the first spool as a lockable spool and the second spool as a rotary spool. The filament organizer further comprises a tensioner coupled to the rotary spool to apply tension to at least a central portion of the length of an optical fiber disposed between the lockable spool and the rotary spool.

Abstract: A method for manufacturing an optical fiber refractive index grating. The method comprises the steps of, providing a substantially twist-free length of an optical fiber between a first spool and a second spool before attaching the first spool and the second spool to a support having a first surface opposite a second surface. The support and spools provide a filament organizer including the first spool as a lockable spool and the second spool as a rotary spool. The filament organizer further comprises a tensioner coupled to the rotary spool to apply tension to at least a central portion of the length of an optical fiber disposed between the lockable spool and the rotary spool.

Abstract: A filament organizer comprises a support having a first surface opposite a second surface and further includes a lockable spool and a rotary spool adjacent to the first surface of the support. The organizer has a tensioner attached to the second surface of the support for attachment to the rotary spool by a tension wire to apply tension thereto to transmit tension to a filament disposed between the lockable spool and the rotary spool. Selective reduction in tension on a filament is possible using a tension relief assembly attached to the support. A stacked configuration of a plurality of filament organizers may be formed by suitable alignment of supports.

Abstract: A method for manufacturing an optical waveguide refractive index grating having a desired grating pitch A. The method includes the step of providing a photosensitive waveguide and a writing beam of actinic radiation, the writing beam having an intensity. The waveguide is translated relative to the writing beam at a velocity v(t). The intensity of the writing beam is modulated as a function of time at a frequency f(t), wherein 1 v ⁡ ( t ) f ⁡ ( t ) ≈ Λ .