Patents by Inventor Dwight Sehler
Dwight Sehler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240230509Abstract: The present invention relates to interferometric detection of particles and optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided exhibiting enhanced alignment and stability for interferometric detection of particles and/or optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided that include compensation means for mitigating the impact of internal and external stimuli and changes in operating conditions that can degrade the sensitivity and reliability of particle detection via optical methods, including interferometric-based techniques and/or systems for optical detection of particles having size dimensions less than or equal to 100 nm.Type: ApplicationFiled: October 27, 2023Publication date: July 11, 2024Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: Timothy A. ELLIS, Chris BONINO, Brian A. KNOLLENBERG, James LUMPKIN, Daniel RODIER, Dwight SEHLER, Mehran Vahdani MOGHADDAM, Thomas RAMIN
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Patent number: 11988593Abstract: The present invention relates to interferometric detection of particles and optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided exhibiting enhanced alignment and stability for interferometric detection of particles and/or optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided that include compensation means for mitigating the impact of internal and external stimuli and changes in operating conditions that can degrade the sensitivity and reliability of particle detection via optical methods, including interferometric-based techniques and/or systems for optical detection of particles having size dimensions less than or equal to 100 nm.Type: GrantFiled: November 20, 2020Date of Patent: May 21, 2024Assignee: PARTICLE MEASURING SYSTEMS, INC.Inventors: Timothy A Ellis, Chris Bonino, Brian A. Knollenberg, James Lumpkin, Daniel Rodier, Dwight Sehler, Mehran Vahdani Moghaddam, Thomas Ramin
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Publication number: 20240133793Abstract: The present invention relates to interferometric detection of particles and optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided exhibiting enhanced alignment and stability for interferometric detection of particles and/or optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided that include compensation means for mitigating the impact of internal and external stimuli and changes in operating conditions that can degrade the sensitivity and reliability of particle detection via optical methods, including interferometric-based techniques and/or systems for optical detection of particles having size dimensions less than or equal to 100 nm.Type: ApplicationFiled: October 26, 2023Publication date: April 25, 2024Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: Timothy A. ELLIS, Chris BONINO, Brian A. KNOLLENBERG, James LUMPKIN, Daniel RODIER, Dwight SEHLER, Mehran Vahdani MOGHADDAM, Thomas RAMIN
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Patent number: 11946852Abstract: Provided herein are optical systems and methods for detecting and characterizing particles. Systems and method are provided which increase the sensitivity of an optical particle counter and allow for detection of smaller particles while analyzing a larger fluid volume. The described systems and methods allow for sensitive and accurate detection and size characterization of nanoscale particles (e.g., less than 50 nm, optionally less than 20 nm, optionally less than 10 nm) for large volumes of analyzed fluids.Type: GrantFiled: December 16, 2021Date of Patent: April 2, 2024Assignee: PARTICLE MEASURING SYSTEMS, INC.Inventors: Daniel Rodier, James Lumpkin, Dwight Sehler, Brian Knollenberg
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Publication number: 20230236107Abstract: A particle detection system may include a light source, a first beam splitter, a particle interrogation zone, a reflecting surface, a second beam splitter, a first photodetector, and a second photodetector. The first beam splitter may be configured to split the source beam into an interrogation beam and a reference beam. The particle interrogation zone may be disposed in the path of the interrogation beam. The reflecting surface may be configured to reflect the interrogation beam back on itself. The second beam splitter may be configured to: (i) receive the reference beam and side scattered light from one or more particles interacting with the interrogation beam in the particle interrogation zone; and (ii) produce a first component beam and second component beam. The first photodetector may be configured to detect the first component beam. The second photodetector may be configured to detect the second component beam.Type: ApplicationFiled: January 19, 2023Publication date: July 27, 2023Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: Mehran Vahdani MOGHADDAM, Brian A. KNOLLENBERG, Dwight SEHLER
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Publication number: 20230087059Abstract: A particle detection system may include a laser optical source providing a beam of electromagnetic radiation, one or more beam shaping elements for receiving the beam of electromagnetic radiation, an optical isolator disposed in the path of the beam, between the laser source and the one or more beam shaping elements, a particle interrogation zone disposed in the path of the beam, wherein particles in the particle interrogation zone interact with the beam of electromagnetic radiation, and a first photodetector configured to detect light scattered and/or transmitted from the particle interrogation zone, a second photodetector configured to monitor power of the beam, and a controller configured to adjust the beam power based on a signal from the second photodetector, wherein the optical isolator is configured to filter optical feedback from the particle detection system out of an optical path leading to the second photodetector.Type: ApplicationFiled: September 22, 2022Publication date: March 23, 2023Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: Brian A. KNOLLENBERG, Dwight SEHLER, Saeid ROSTAMI
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Publication number: 20220155212Abstract: Provided herein are optical systems and methods for detecting and characterizing particles. Systems and method are provided which increase the sensitivity of an optical particle counter and allow for detection of smaller particles while analyzing a larger fluid volume. The described systems and methods allow for sensitive and accurate detection and size characterization of nanoscale particles (e.g., less than 50 nm, optionally less than 20 nm, optionally less than 10 nm) for large volumes of analyzed fluids.Type: ApplicationFiled: December 16, 2021Publication date: May 19, 2022Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: Daniel RODIER, James LUMPKIN, Dwight SEHLER, Brian KNOLLENBERG
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Patent number: 11237095Abstract: Provided herein are optical systems and methods for detecting and characterizing particles. Systems and method are provided which increase the sensitivity of an optical particle counter and allow for detection of smaller particles while analyzing a larger fluid volume. The described systems and methods allow for sensitive and accurate detection and size characterization of nanoscale particles (e.g., less than 50 nm, optionally less than 20 nm, optionally less than 10 nm) for large volumes of analyzed fluids.Type: GrantFiled: April 24, 2020Date of Patent: February 1, 2022Assignee: PARTICLE MEASURING SYSTEMS, INC.Inventors: Daniel Rodier, James Lumpkin, Dwight Sehler, Brian Knollenberg
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Publication number: 20210208054Abstract: The present invention relates to interferometric detection of particles and optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided exhibiting enhanced alignment and stability for interferometric detection of particles and/or optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided that include compensation means for mitigating the impact of internal and external stimuli and changes in operating conditions that can degrade the sensitivity and reliability of particle detection via optical methods, including interferometric-based techniques and/or systems for optical detection of particles having size dimensions less than or equal to 100 nm.Type: ApplicationFiled: November 20, 2020Publication date: July 8, 2021Applicant: Particle Measuring Systems, Inc.Inventors: Timothy A. ELLIS, Chris BONINO, Brian A. KNOLLENBERG, James LUMPKIN, Daniel RODIER, Dwight SEHLER, Mehran Vahdani MOGHADDAM, Thomas RAMIN
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Publication number: 20200355599Abstract: Provided herein are optical systems and methods for detecting and characterizing particles. Systems and method are provided which increase the sensitivity of an optical particle counter and allow for detection of smaller particles while analyzing a larger fluid volume. The described systems and methods allow for sensitive and accurate detection and size characterization of nanoscale particles (e.g., less than 50 nm, optionally less than 20 nm, optionally less than 10 nm) for large volumes of analyzed fluids.Type: ApplicationFiled: April 24, 2020Publication date: November 12, 2020Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: Daniel RODIER, James LUMPKIN, Dwight SEHLER, Brian KNOLLENBERG
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Patent number: 8427642Abstract: The present invention provides methods and systems for particle detection and analysis using two-dimensional optical imaging to access enhanced detection sensitivity and expanded sensing functionality relative to conventional point and array detection-based optical particle counters. Methods and systems of the present invention provide a two-dimensional optical imaging-based particle sensing platform wherein system components and specifications are selected to generate reproducible and readily identifiable signals, including particle detection signatures, from optical scattering or emission from particles provided to the system. Systems and methods of the present invention are capable of accurately and sensitively detecting, identifying, and characterizing (e.g., determining the size of) particles in liquid phase or gas phase samples.Type: GrantFiled: February 14, 2012Date of Patent: April 23, 2013Assignee: Particle Measuring Systems, Inc.Inventors: John Mitchell, Dwight A. Sehler, Michael Williamson, David Rice, Karen R. Sandberg
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Publication number: 20120140223Abstract: The present invention provides methods and systems for particle detection and analysis using two-dimensional optical imaging to access enhanced detection sensitivity and expanded sensing functionality relative to conventional point and array detection-based optical particle counters. Methods and systems of the present invention provide a two-dimensional optical imaging-based particle sensing platform wherein system components and specifications are selected to generate reproducible and readily identifiable signals, including particle detection signatures, from optical scattering or emission from particles provided to the system. Systems and methods of the present invention are capable of accurately and sensitively detecting, identifying, and characterizing (e.g., determining the size of) particles in liquid phase or gas phase samples.Type: ApplicationFiled: February 14, 2012Publication date: June 7, 2012Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: John MITCHELL, Dwight A. SEHLER, Michael WILLIAMSON, David RICE, Jon SANDBERG, Karen R. SANDBERG
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Patent number: 8174697Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: GrantFiled: September 26, 2011Date of Patent: May 8, 2012Assignee: Particle Measuring Systems, Inc.Inventors: John Mitchell, Jon Sandberg, Karen R. Sandberg, legal representative, Dwight A. Sehler
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Patent number: 8154724Abstract: The present invention provides methods and systems for particle detection and analysis using two-dimensional optical imaging to access enhanced detection sensitivity and expanded sensing functionality relative to conventional point and array detection-based optical particle counters. Methods and systems of the present invention provide a two-dimensional optical imaging-based particle sensing platform wherein system components and specifications are selected to generate reproducible and readily identifiable signals, including particle detection signatures, from optical scattering or emission from particles provided to the system. Systems and methods of the present invention are capable of accurately and sensitively detecting, identifying, and characterizing (e.g., determining the size of) particles in liquid phase or gas phase samples.Type: GrantFiled: December 2, 2008Date of Patent: April 10, 2012Assignee: Particle Measuring Systems, Inc.Inventors: John Mitchell, Dwight A. Sehler, Michael Williamson, David Rice, Jon Sandberg, Karen R. Sandberg, legal representative
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Publication number: 20120012757Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: ApplicationFiled: September 26, 2011Publication date: January 19, 2012Applicant: PARTICLE MEASURING SYSTEMS, INC.Inventors: John MITCHELL, Jon SANDBERG, Karen R. Sandberg, Dwight A. Sehler
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Patent number: 8027035Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: GrantFiled: March 8, 2011Date of Patent: September 27, 2011Assignee: Particle Measuring Systems, Inc.Inventors: John Mitchell, Jon Sandberg, Karen R. Sandberg, Legal Representative, Dwight A. Sehler
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Publication number: 20110155927Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: ApplicationFiled: March 8, 2011Publication date: June 30, 2011Applicant: Particle Measuring Systems, Inc.Inventors: John MITCHELL, Jon Sandberg, Dwight A. Sehler, Karen R. Sandberg
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Patent number: 7916293Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: GrantFiled: December 2, 2008Date of Patent: March 29, 2011Assignee: Particle Measuring Systems, Inc.Inventors: John Mitchell, Jon Sandberg, Karen R. Sandberg, legal representative, Dwight A. Sehler
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Publication number: 20090244536Abstract: The present invention provides methods and systems for particle detection and analysis using two-dimensional optical imaging to access enhanced detection sensitivity and expanded sensing functionality relative to conventional point and array detection-based optical particle counters. Methods and systems of the present invention provide a two-dimensional optical imaging-based particle sensing platform wherein system components and specifications are selected to generate reproducible and readily identifiable signals, including particle detection signatures, from optical scattering or emission from particles provided to the system. Systems and methods of the present invention are capable of accurately and sensitively detecting, identifying, and characterizing (e.g., determining the size of) particles in liquid phase or gas phase samples.Type: ApplicationFiled: December 2, 2008Publication date: October 1, 2009Inventors: John Mitchell, Dwight A. Sehler, Michael Williamson, David Rice, Jon Sandberg, Karen R. Sandberg
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Publication number: 20090219530Abstract: Described herein is a particle detection system capable of spatially resolving the interaction of particles with a beam of electromagnetic radiation. Using a specific electromagnetic beam cross sectional shape and orientation, the detection sensitivity of a particle detection system can be improved. Also provided are methods for detecting and sizing particles in a manner that has low background signal and allows for spatially resolving the scattering or emission of electromagnetic radiation from particles.Type: ApplicationFiled: December 2, 2008Publication date: September 3, 2009Inventors: John Mitchell, Jon Sandberg, David A. Turner, Dwight A. Sehler